Akira Isobe

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Fluorinated ether compound, fluorinated ether composition, coating...
- Patent number 12,071,563
- Issue date Aug 27, 2024
- AGC Inc.
- Taiki Hoshino
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fluorinated ether compound, fluorinated ether composition, coating...
- Patent number 11,643,572
- Issue date May 9, 2023
- AGC Inc.
- Taiki Hoshino
- B32 - LAYERED PRODUCTS
Information Patent Grant
Fluorinated ether compound, fluorinated ether composition, coating...
- Patent number 10,829,666
- Issue date Nov 10, 2020
- AGC Inc.
- Taiki Hoshino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorinated ether compound, fluorinated ether composition, coating...
- Patent number 10,550,288
- Issue date Feb 4, 2020
- AGC Inc.
- Taiki Hoshino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Water/oil repellent composition, method for its production, and art...
- Patent number 10,378,146
- Issue date Aug 13, 2019
- AGC Inc.
- Akira Isobe
- D06 - TREATMENT OF TEXTILES OR THE LIKE LAUNDERING FLEXIBLE MATERIALS NOT OTH...
Information Patent Grant
Substrate with antireflection layer
- Patent number 10,324,234
- Issue date Jun 18, 2019
- AGC Inc.
- Kenji Ishizeki
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Fluorinated ether composition, method for its production, coating l...
- Patent number 10,233,331
- Issue date Mar 19, 2019
- AGC Inc.
- Taiki Hoshino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for producing silicon compound
- Patent number 9,738,789
- Issue date Aug 22, 2017
- Asahi Glass Company, Limited
- Taiki Hoshino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fluorinated ether compound, fluorinated ether composition and coati...
- Patent number 9,637,650
- Issue date May 2, 2017
- Asahi Glass Company, Limited
- Eisuke Murotani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fluorinated polyether compound, lubricant, liquid composition and a...
- Patent number 9,598,657
- Issue date Mar 21, 2017
- Asahi Glass Company, Limited
- Akira Isobe
- C10 - PETROLEUM, GAS OR COKE INDUSTRIES TECHNICAL GASES CONTAINING CARBON MON...
Information Patent Grant
Polishing apparatus having retainer ring rounded along outer periph...
- Patent number 5,944,590
- Issue date Aug 31, 1999
- NEC Corporation
- Akira Isobe
- B24 - GRINDING POLISHING
Information Patent Grant
Structure for wiring reliability evaluation test and semiconductor...
- Patent number 5,801,394
- Issue date Sep 1, 1998
- NEC Corporation
- Akira Isobe
- G01 - MEASURING TESTING
Information Patent Grant
Polishing apparatus for finishing semiconductor wafer at high polis...
- Patent number 5,749,771
- Issue date May 12, 1998
- NEC Corporation
- Akira Isobe
- B24 - GRINDING POLISHING
Information Patent Grant
Method of manufacturing multilayer interconnection structure having...
- Patent number 5,716,872
- Issue date Feb 10, 1998
- NEC Corporation
- Akira Isobe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer polishing method and wafer polishing apparatus
- Patent number 5,702,291
- Issue date Dec 30, 1997
- NEC Corporation
- Akira Isobe
- B24 - GRINDING POLISHING
Information Patent Grant
Method for fabricating multi-level interconnection structure for se...
- Patent number 5,677,239
- Issue date Oct 14, 1997
- NEC Corporation
- Akira Isobe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for polishing a wafer by supplying surfactant to the rear su...
- Patent number 5,616,212
- Issue date Apr 1, 1997
- NEC Corporation
- Akira Isobe
- B24 - GRINDING POLISHING
Information Patent Grant
Contact hole filling in a semiconductor device by irradiation with...
- Patent number 5,512,512
- Issue date Apr 30, 1996
- NEC Corporation
- Akira Isobe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lens cap applicable to a video camera
- Patent number 5,255,120
- Issue date Oct 19, 1993
- Sony Corporation
- Tsutomu Anzai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lens cap applicable to a video camera
- Patent number 5,162,942
- Issue date Nov 10, 1992
- Sony Corporation
- Tsutomu Anzai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cable adapter with switch
- Patent number 4,855,611
- Issue date Aug 8, 1989
- Sony Corporation
- Akira Isobe
- H04 - ELECTRIC COMMUNICATION TECHNIQUE

Patents Applicationslast 30 patents

Information Patent Application
FLUORINATED ETHER COMPOUND, FLUORINATED ETHER COMPOSITION, COATING...
- Publication number 20240352278
- Publication date Oct 24, 2024
- AGC Inc.
- Taiki HOSHINO
- B32 - LAYERED PRODUCTS
Information Patent Application
FLUORINATED ETHER COMPOUND, FLUORINATED ETHER COMPOSITION, COATING...
- Publication number 20210095160
- Publication date Apr 1, 2021
- AGC Inc.
- Taiki HOSHINO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINATED ETHER COMPOUND, FLUORINATED ETHER COMPOSITION, COATING...
- Publication number 20210047540
- Publication date Feb 18, 2021
- AGC Inc.
- Taiki HOSHINO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINATED ETHER COMPOUND, FLUORINATED ETHER COMPOSITION, COATING...
- Publication number 20200115589
- Publication date Apr 16, 2020
- AGC Inc.
- Taiki HOSHINO
- B32 - LAYERED PRODUCTS
Information Patent Application
WATER/OIL REPELLENT ARTICLE, METHOD FOR ITS PRODUCTION AND WATER/OI...
- Publication number 20190283080
- Publication date Sep 19, 2019
- AGC Inc.
- Yukiko SHIOTA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FLUORINATED ETHER COMPOUND, FLUORINATED ETHER COMPOSITION, COATING...
- Publication number 20180148606
- Publication date May 31, 2018
- Asahi Glass Company, Limited
- Taiki Hoshino
- B32 - LAYERED PRODUCTS
Information Patent Application
WATER/OIL REPELLENT COMPOSITION, METHOD FOR ITS PRODUCTION, AND ART...
- Publication number 20170275813
- Publication date Sep 28, 2017
- Asahi Glass Company, Limited
- Akira Isobe
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FLUORINATED ETHER COMPOSITION, METHOD FOR ITS PRODUCTION, COATING L...
- Publication number 20160264788
- Publication date Sep 15, 2016
- Asahi Glass Company, Limited
- Taiki HOSHINO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PRODUCING SILICON COMPOUND
- Publication number 20160264600
- Publication date Sep 15, 2016
- Asahi Glass Company, Limited
- Taiki HOSHINO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINATED POLYETHER COMPOUND, LUBRICANT, LIQUID COMPOSITION AND A...
- Publication number 20160137947
- Publication date May 19, 2016
- Asahi Glass Company, Limited
- Akira ISOBE
- C10 - PETROLEUM, GAS OR COKE INDUSTRIES TECHNICAL GASES CONTAINING CARBON MON...
Information Patent Application
SUBSTRATE WITH ANTIREFLECTION LAYER
- Publication number 20160025899
- Publication date Jan 28, 2016
- ASAHI GLASS COMPANY, LIMITED
- Kenji ISHIZEKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FLUORINATED ETHER COMPOSITION, SURFACE MODIFIER, SURFACTANT, LIQUID...
- Publication number 20150337228
- Publication date Nov 26, 2015
- ASAHI GLASS COMPANY, LIMITED
- Akira Isobe
- C10 - PETROLEUM, GAS OR COKE INDUSTRIES TECHNICAL GASES CONTAINING CARBON MON...
Information Patent Application
FLUORINATED ETHER COMPOUND, FLUORINATED ETHER COMPOSITION AND COATI...
- Publication number 20140287240
- Publication date Sep 25, 2014
- Asahi Glass Company, Limited
- Eisuke MUROTANI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...

Akira Isobe

Person

Patents Grantslast 30 patents

Fluorinated ether compound, fluorinated ether composition, coating...

Fluorinated ether compound, fluorinated ether composition, coating...

Fluorinated ether compound, fluorinated ether composition, coating...

Fluorinated ether compound, fluorinated ether composition, coating...

Water/oil repellent composition, method for its production, and art...

Substrate with antireflection layer

Fluorinated ether composition, method for its production, coating l...

Method for producing silicon compound

Fluorinated ether compound, fluorinated ether composition and coati...

Fluorinated polyether compound, lubricant, liquid composition and a...

Polishing apparatus having retainer ring rounded along outer periph...

Structure for wiring reliability evaluation test and semiconductor...

Polishing apparatus for finishing semiconductor wafer at high polis...

Method of manufacturing multilayer interconnection structure having...

Wafer polishing method and wafer polishing apparatus

Method for fabricating multi-level interconnection structure for se...

Method for polishing a wafer by supplying surfactant to the rear su...

Contact hole filling in a semiconductor device by irradiation with...

Lens cap applicable to a video camera

Lens cap applicable to a video camera

Cable adapter with switch

Patents Applicationslast 30 patents

FLUORINATED ETHER COMPOUND, FLUORINATED ETHER COMPOSITION, COATING...

FLUORINATED ETHER COMPOUND, FLUORINATED ETHER COMPOSITION, COATING...

FLUORINATED ETHER COMPOUND, FLUORINATED ETHER COMPOSITION, COATING...

FLUORINATED ETHER COMPOUND, FLUORINATED ETHER COMPOSITION, COATING...

WATER/OIL REPELLENT ARTICLE, METHOD FOR ITS PRODUCTION AND WATER/OI...

FLUORINATED ETHER COMPOUND, FLUORINATED ETHER COMPOSITION, COATING...

WATER/OIL REPELLENT COMPOSITION, METHOD FOR ITS PRODUCTION, AND ART...

FLUORINATED ETHER COMPOSITION, METHOD FOR ITS PRODUCTION, COATING L...

METHOD FOR PRODUCING SILICON COMPOUND

FLUORINATED POLYETHER COMPOUND, LUBRICANT, LIQUID COMPOSITION AND A...

SUBSTRATE WITH ANTIREFLECTION LAYER

FLUORINATED ETHER COMPOSITION, SURFACE MODIFIER, SURFACTANT, LIQUID...

FLUORINATED ETHER COMPOUND, FLUORINATED ETHER COMPOSITION AND COATI...