Akira Kagoshima

Person

Kudamatsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing system
- Patent number 12,014,909
- Issue date Jun 18, 2024
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,643,727
- Issue date May 9, 2023
- HITACHI HIGH-TECH CORPORATION
- Akira Kagoshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and data analysis apparatus
- Patent number 11,538,671
- Issue date Dec 27, 2022
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Analysis method and semiconductor etching apparatus
- Patent number 11,410,836
- Issue date Aug 9, 2022
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Plasma processing apparatus and analysis method for analyzing plasm...
- Patent number 11,404,253
- Issue date Aug 2, 2022
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,289,313
- Issue date Mar 29, 2022
- HITACHI HIGH-TECH CORPORATION
- Shota Umeda
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus and plasma processing system
- Patent number 10,872,750
- Issue date Dec 22, 2020
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and analysis method for analyzing plasm...
- Patent number 10,734,207
- Issue date Aug 4, 2020
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and data analysis apparatus
- Patent number 10,510,519
- Issue date Dec 17, 2019
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, plasma processing method and plasma pr...
- Patent number 10,408,762
- Issue date Sep 10, 2019
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,262,840
- Issue date Apr 16, 2019
- Hitachi High-Technologies Corporation
- Akira Kagoshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Analysis method and semiconductor etching apparatus
- Patent number 10,262,842
- Issue date Apr 16, 2019
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Plasma processing apparatus
- Patent number 10,184,182
- Issue date Jan 22, 2019
- Hitachi High-Technologies Corporation
- Akira Kagoshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,153,217
- Issue date Dec 11, 2018
- Hitachi High-Technologies Corporation
- Daisuke Shiraishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 9,824,866
- Issue date Nov 21, 2017
- Hitachi High-Technologies Corporation
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Grant
Plasma processing apparatus and analyzing apparatus
- Patent number 9,464,936
- Issue date Oct 11, 2016
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- G01 - MEASURING TESTING
Information Patent Grant
Data analysis method for plasma processing apparatus, plasma proces...
- Patent number 9,443,704
- Issue date Sep 13, 2016
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data analysis method for plasma processing apparatus, plasma proces...
- Patent number 9,324,588
- Issue date Apr 26, 2016
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor manufacturing equipment
- Patent number 9,110,461
- Issue date Aug 18, 2015
- Hitachi High-Technologies Corporation
- Toshihiro Morisawa
- G05 - CONTROLLING REGULATING
Information Patent Grant
Analysis method, analysis device, and etching processing system
- Patent number 9,091,595
- Issue date Jul 28, 2015
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus
- Patent number 8,992,721
- Issue date Mar 31, 2015
- Hitachi High-Technologies Corporation
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Grant
Etching apparatus, control simulator, and semiconductor device manu...
- Patent number 8,924,001
- Issue date Dec 30, 2014
- Hitachi High-Technologies Corporation
- Toshihiro Morisawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,828,184
- Issue date Sep 9, 2014
- Hitachi High-Technologies Corporation
- Akira Kagoshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,784,677
- Issue date Jul 22, 2014
- Hitachi High-Technologies Corporation
- Daisuke Shiraishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus
- Patent number 8,731,706
- Issue date May 20, 2014
- Hitachi High-Technologies Corporation
- Shingo Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching process state judgment method and system therefor
- Patent number 8,282,849
- Issue date Oct 9, 2012
- Hitachi High-Technologies Corporation
- Toshihiro Morisawa
- G01 - MEASURING TESTING
Information Patent Grant
Etching endpoint determination method
- Patent number 8,083,960
- Issue date Dec 27, 2011
- Hitachi High-Technologies Corporation
- Hiroshige Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Disturbance-free, recipe-controlled plasma processing system and me...
- Patent number 7,601,240
- Issue date Oct 13, 2009
- Hitachi, Ltd.
- Akira Kagoshima
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method for processing semiconductor
- Patent number 7,473,332
- Issue date Jan 6, 2009
- Hitachi High-Technologies Corporation
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for monitoring and controlling a semiconductor manufacturing...
- Patent number 7,343,217
- Issue date Mar 11, 2008
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS DIAGNOSTIC APPARATUS, SEMICONDUCTOR MANUFACTURING APPARAT...
- Publication number 20240339308
- Publication date Oct 10, 2024
- Satoru Matsukura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS DIAGNOSTIC SYSTEM, APPARATUS DIAGNOSTIC APPARATUS, SEMICO...
- Publication number 20240310827
- Publication date Sep 19, 2024
- Hitachi High-Tech Corporation
- Nanako Tamari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, DATA ANALYSIS APPARATUS, AND SEMICONDU...
- Publication number 20240203712
- Publication date Jun 20, 2024
- Hitachi High-Tech Corporation
- Shunta NOSAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANALYSIS METHOD AND SEMICONDUCTOR ETCHING APPARATUS
- Publication number 20220328286
- Publication date Oct 13, 2022
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING SYSTEM
- Publication number 20210074528
- Publication date Mar 11, 2021
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND ANALYSIS METHOD FOR ANALYZING PLASM...
- Publication number 20200328067
- Publication date Oct 15, 2020
- HITACHI HIGH-TECH CORPORATION
- Ryoji ASAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND DATA ANALYSIS APPARATUS
- Publication number 20200066500
- Publication date Feb 27, 2020
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190221407
- Publication date Jul 18, 2019
- Hitachi High-Technologies Corporation
- Shota UMEDA
- G01 - MEASURING TESTING
Information Patent Application
ANALYSIS METHOD AND SEMICONDUCTOR ETCHING APPARATUS
- Publication number 20190189397
- Publication date Jun 20, 2019
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND PLASMA PR...
- Publication number 20190170653
- Publication date Jun 6, 2019
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190100840
- Publication date Apr 4, 2019
- Hitachi High-Technologies Corporation
- Akira KAGOSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING SYSTEM
- Publication number 20190051502
- Publication date Feb 14, 2019
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180068909
- Publication date Mar 8, 2018
- Hitachi High-Technologies Corporation
- Daisuke SHIRAISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND ANALYSIS METHOD FOR ANALYZING PLASM...
- Publication number 20180025894
- Publication date Jan 25, 2018
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
DATA MANAGEMENT APPARATUS AND MONITORING METHOD OF SAME
- Publication number 20170230271
- Publication date Aug 10, 2017
- Hitachi High-Technologies Corporation
- Akira KAGOSHIMA
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
PLASMA PROCESSING APPARATUS AND DATA ANALYSIS APPARATUS
- Publication number 20160379896
- Publication date Dec 29, 2016
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND PLASMA PR...
- Publication number 20160225681
- Publication date Aug 4, 2016
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
DATA ANALYSIS METHOD FOR PLASMA PROCESSING APPARATUS, PLASMA PROCES...
- Publication number 20160203957
- Publication date Jul 14, 2016
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160155611
- Publication date Jun 2, 2016
- Hitachi High-Technologies Corporation
- Akira KAGOSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DATA ANALYSIS METHOD FOR PLASMA PROCESSING APPARATUS, PLASMA PROCES...
- Publication number 20160020123
- Publication date Jan 21, 2016
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
ANALYSIS METHOD AND SEMICONDUCTOR ETCHING APPARATUS
- Publication number 20150083328
- Publication date Mar 26, 2015
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
Plasma Processing Method
- Publication number 20140339193
- Publication date Nov 20, 2014
- Akira Kagoshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR ETCHING APPARATUS AND ANALYZING APPARATUS
- Publication number 20140262029
- Publication date Sep 18, 2014
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20140277626
- Publication date Sep 18, 2014
- Hitachi High-Technologies Corporation
- Akira KAGOSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANALYSIS METHOD, ANALYSIS DEVICE, AND ETCHING PROCESSING SYSTEM
- Publication number 20140022540
- Publication date Jan 23, 2014
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
SEMICONDUCTOR MANUFACTURING EQUIPMENT
- Publication number 20130173042
- Publication date Jul 4, 2013
- Hitachi High-Technologies Corporation
- Toshihiro Morisawa
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20130119016
- Publication date May 16, 2013
- Hitachi High-Technologies Corporation
- Akira KAGOSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS, CONTROL SIMULATOR,AND SEMICONDUCTOR DEVICE MANUF...
- Publication number 20120310403
- Publication date Dec 6, 2012
- Toshihiro Morisawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Etching Apparatus
- Publication number 20120085494
- Publication date Apr 12, 2012
- Hiroshige Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20120018094
- Publication date Jan 26, 2012
- Daisuke SHIRAISHI
- H01 - BASIC ELECTRIC ELEMENTS

Akira Kagoshima

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing system

Plasma processing apparatus

Plasma processing apparatus and data analysis apparatus

Analysis method and semiconductor etching apparatus

Plasma processing apparatus and analysis method for analyzing plasm...

Plasma processing apparatus

Plasma processing apparatus and plasma processing system

Plasma processing apparatus and analysis method for analyzing plasm...

Plasma processing apparatus and data analysis apparatus

Plasma processing apparatus, plasma processing method and plasma pr...

Plasma processing apparatus

Analysis method and semiconductor etching apparatus

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing method

Plasma processing apparatus and analyzing apparatus

Data analysis method for plasma processing apparatus, plasma proces...

Data analysis method for plasma processing apparatus, plasma proces...

Semiconductor manufacturing equipment

Analysis method, analysis device, and etching processing system

Plasma processing apparatus

Etching apparatus, control simulator, and semiconductor device manu...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Vacuum processing apparatus

Etching process state judgment method and system therefor

Etching endpoint determination method

Disturbance-free, recipe-controlled plasma processing system and me...

Method for processing semiconductor

System for monitoring and controlling a semiconductor manufacturing...

Patents Applicationslast 30 patents

APPARATUS DIAGNOSTIC APPARATUS, SEMICONDUCTOR MANUFACTURING APPARAT...

APPARATUS DIAGNOSTIC SYSTEM, APPARATUS DIAGNOSTIC APPARATUS, SEMICO...

PLASMA PROCESSING APPARATUS, DATA ANALYSIS APPARATUS, AND SEMICONDU...

ANALYSIS METHOD AND SEMICONDUCTOR ETCHING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING SYSTEM

PLASMA PROCESSING APPARATUS AND ANALYSIS METHOD FOR ANALYZING PLASM...

PLASMA PROCESSING APPARATUS AND DATA ANALYSIS APPARATUS

PLASMA PROCESSING APPARATUS

ANALYSIS METHOD AND SEMICONDUCTOR ETCHING APPARATUS

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND PLASMA PR...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING SYSTEM

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND ANALYSIS METHOD FOR ANALYZING PLASM...

DATA MANAGEMENT APPARATUS AND MONITORING METHOD OF SAME

PLASMA PROCESSING APPARATUS AND DATA ANALYSIS APPARATUS

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND PLASMA PR...

DATA ANALYSIS METHOD FOR PLASMA PROCESSING APPARATUS, PLASMA PROCES...

PLASMA PROCESSING APPARATUS

DATA ANALYSIS METHOD FOR PLASMA PROCESSING APPARATUS, PLASMA PROCES...

ANALYSIS METHOD AND SEMICONDUCTOR ETCHING APPARATUS

Plasma Processing Method

SEMICONDUCTOR ETCHING APPARATUS AND ANALYZING APPARATUS

PLASMA PROCESSING APPARATUS

ANALYSIS METHOD, ANALYSIS DEVICE, AND ETCHING PROCESSING SYSTEM

SEMICONDUCTOR MANUFACTURING EQUIPMENT

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

ETCHING APPARATUS, CONTROL SIMULATOR,AND SEMICONDUCTOR DEVICE MANUF...

Plasma Etching Apparatus

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD