Akira Kamabuchi

Person

Ashiya-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photoresist composition
- Patent number 10,377,692
- Issue date Aug 13, 2019
- Sumitomo Chemical Company, Limited
- Akira Kamabuchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin and photoresist composition comprising the same
- Patent number 9,360,754
- Issue date Jun 7, 2016
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 9,268,226
- Issue date Feb 23, 2016
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,859,182
- Issue date Oct 14, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resin and photoresist composition
- Patent number 8,697,882
- Issue date Apr 15, 2014
- Sumitomo Chemical Company, Limited
- Hyungjoo Kim
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,685,618
- Issue date Apr 1, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 8,592,129
- Issue date Nov 26, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,563,217
- Issue date Oct 22, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resin and photoresist composition comprising the same
- Patent number 8,481,243
- Issue date Jul 9, 2013
- Sumitomo Chemical Company, Limited
- Hyungjoo Kim
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 8,298,746
- Issue date Oct 30, 2012
- Sumitomo Chemical Company, Limited
- Junji Shigematsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical amplification type resist composition
- Patent number 7,576,223
- Issue date Aug 18, 2009
- Sumitomo Chemical Company, Limited
- Airi Yamada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemical amplification type resist composition
- Patent number 7,396,899
- Issue date Jul 8, 2008
- Sumitomo Chemical Co., Ltd.
- Airi Yamada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemical amplification type resist composition
- Patent number 7,160,669
- Issue date Jan 9, 2007
- Sumitomo Chemical Company, Limited
- Airi Yamada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Amplification type positive resist composition
- Patent number 7,135,268
- Issue date Nov 14, 2006
- Sumitomo Chemical Company, Limited
- Akira Kamabuchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Sulfonium salt and use thereof
- Patent number 6,818,379
- Issue date Nov 16, 2004
- Sumitomo Chemical Company, Limited
- Akira Kamabuchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for producing poly (meth) acrylates having reduced metal co...
- Patent number 6,777,511
- Issue date Aug 17, 2004
- Sumitomo Chemical Company, Limited
- Koshiro Ochiai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemical amplification type positive resist composition
- Patent number 6,627,381
- Issue date Sep 30, 2003
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical amplifying type positive resist composition and sulfonium...
- Patent number 6,548,220
- Issue date Apr 15, 2003
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Succinimide derivative, process for production and use thereof
- Patent number 5,965,748
- Issue date Oct 12, 1999
- Sumitomo Chemical Company, Limited
- Akira Kamabuchi
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20140038105
- Publication date Feb 6, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20130022910
- Publication date Jan 24, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219898
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219907
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME
- Publication number 20120178021
- Publication date Jul 12, 2012
- Sumitomo Chemical Company, Limited
- Hyungjoo KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME
- Publication number 20120122034
- Publication date May 17, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, RESIN AND PHOTORESIST COMPOSITION
- Publication number 20120009519
- Publication date Jan 12, 2012
- Sumitomo Chemical Company, Limited
- Hyungjoo KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST PROCESSING METHOD
- Publication number 20110189618
- Publication date Aug 4, 2011
- Sumitomo Chemical Company, Limited
- Mitsuhiro Hata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20110059400
- Publication date Mar 10, 2011
- Sumitomo Chemical Company, Limited
- Akira KAMABUCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20110053082
- Publication date Mar 3, 2011
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PROCESS FOR PRODUCING PHOTORESIST PATTERN
- Publication number 20100273113
- Publication date Oct 28, 2010
- Sumitomo Chemical Company, Limited
- Mitsuhiro HATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
- Publication number 20100010129
- Publication date Jan 14, 2010
- Sumitomo Chemical Company, Limited
- Junji Shigematsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
- Publication number 20090286937
- Publication date Nov 19, 2009
- Sumitomo Chemical Company, Limited
- Akira Kamabuchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical amplification type resist composition
- Publication number 20080269506
- Publication date Oct 30, 2008
- Airi Yamada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Chemical amplification type resist composition
- Publication number 20070123674
- Publication date May 31, 2007
- Airi Yamada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Luminescent-polymer composition
- Publication number 20070020479
- Publication date Jan 25, 2007
- Yasunori Uetani
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Chemical amplification type resist composition
- Publication number 20040138353
- Publication date Jul 15, 2004
- Airi Yamada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Amplification type positive resist composition
- Publication number 20040029037
- Publication date Feb 12, 2004
- Akira Kamabuchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Sulfonium salt and use thereof
- Publication number 20030148211
- Publication date Aug 7, 2003
- Akira Kamabuchi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Process for producing poly (meth) acrylates having reduced metal co...
- Publication number 20020055569
- Publication date May 9, 2002
- Koshiro Ochiai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Chemical amplifying type positive resist composition and sulfonium...
- Publication number 20020015913
- Publication date Feb 7, 2002
- Yasunori Uetani
- C07 - ORGANIC CHEMISTRY

Akira Kamabuchi

Person

Patents Grantslast 30 patents

Photoresist composition

Resin and photoresist composition comprising the same

Resin, resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Compound, resin and photoresist composition

Resist composition and method for producing resist pattern

Resin, resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Resin and photoresist composition comprising the same

Chemically amplified positive resist composition

Chemical amplification type resist composition

Chemical amplification type resist composition

Chemical amplification type resist composition

Amplification type positive resist composition

Sulfonium salt and use thereof

Process for producing poly (meth) acrylates having reduced metal co...

Chemical amplification type positive resist composition

Chemical amplifying type positive resist composition and sulfonium...

Succinimide derivative, process for production and use thereof

Patents Applicationslast 30 patents

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME

RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME

COMPOUND, RESIN AND PHOTORESIST COMPOSITION

RESIST PROCESSING METHOD

PHOTORESIST COMPOSITION

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

PROCESS FOR PRODUCING PHOTORESIST PATTERN

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION

Chemical amplification type resist composition

Chemical amplification type resist composition

Luminescent-polymer composition

Chemical amplification type resist composition

Amplification type positive resist composition

Sulfonium salt and use thereof

Process for producing poly (meth) acrylates having reduced metal co...

Chemical amplifying type positive resist composition and sulfonium...