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Akira Katano
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Kanagawa, JP
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Patents Grants
last 30 patents
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Patent Grant
Solvent for cleaning
Patent number
7,932,221
Issue date
Apr 26, 2011
Tokyo Ohka Kogyo Co., Ltd.
Akira Katano
C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information
Patent Grant
Positive photoresist composition
Patent number
6,869,742
Issue date
Mar 22, 2005
Tokyo Ohka Kogyo Co., Ltd.
Jyunichi Mizuta
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive photoresist composition and method of patterning resist th...
Patent number
6,762,005
Issue date
Jul 13, 2004
Tokyo Ohka Kogyo Co., Ltd.
Akira Katano
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive photoresist composition and method of patterning resist th...
Patent number
6,756,178
Issue date
Jun 29, 2004
Tokyo Ohka Kogyo Co., Ltd.
Akira Katano
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Novolak resin, production process thereof and positive photoresist...
Patent number
6,730,769
Issue date
May 4, 2004
Tokyo Ohka Kogyo Co., Ltd.
Akira Katano
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Patents Applications
last 30 patents
Information
Patent Application
Solvent for Cleaning
Publication number
20080039355
Publication date
Feb 14, 2008
Tokyo Ohka Kogyo Co., Ltd.
Akira Katano
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Positive photoresist composition and method of patterning resist th...
Publication number
20030143479
Publication date
Jul 31, 2003
Tokyo Ohka Kogyo Co., Ltd.
Akira Katano
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Positive photoresist composition and method of patterning resist th...
Publication number
20030134223
Publication date
Jul 17, 2003
Tokyo Ohka Kogyo Co., Ltd.
Akira Katano
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Novolak resin, production process thereof and positive photoresist...
Publication number
20030065126
Publication date
Apr 3, 2003
Tokyo Ohka Kogyo Co., Ltd.
Akira Katano
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Positive photoresist composition
Publication number
20020182531
Publication date
Dec 5, 2002
Tokyo Ohka Kogyo Co., Ltd.
Jyunichi Mizuta
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY