AKIRA KOSHIISHI

Person

NIRASAKI-SHI, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma etching apparatus and method
- Patent number 10,861,678
- Issue date Dec 8, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,854,431
- Issue date Dec 1, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,546,727
- Issue date Jan 28, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 10,529,539
- Issue date Jan 7, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitive coupling plasma processing apparatus and method for usin...
- Patent number 10,529,596
- Issue date Jan 7, 2020
- Tokyo Electron Limited
- Naoki Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etching layer to be etched
- Patent number 10,347,499
- Issue date Jul 9, 2019
- Tokyo Electron Limited
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus and method
- Patent number 10,229,815
- Issue date Mar 12, 2019
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,685,305
- Issue date Jun 20, 2017
- Tokyo Electron Limited
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitive coupling plasma processing apparatus and method for usin...
- Patent number 9,607,866
- Issue date Mar 28, 2017
- Tokyo Electron Limited
- Naoki Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method
- Patent number 9,490,105
- Issue date Nov 8, 2016
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus and method
- Patent number 8,852,385
- Issue date Oct 7, 2014
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 8,790,490
- Issue date Jul 29, 2014
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Table for use in plasma processing system and plasma processing system
- Patent number 8,741,098
- Issue date Jun 3, 2014
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 8,603,293
- Issue date Dec 10, 2013
- Tokyo Electron Limited
- Akira Koshiishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing method and apparatus
- Patent number 8,512,510
- Issue date Aug 20, 2013
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitive coupling plasma processing apparatus and method for usin...
- Patent number 8,506,753
- Issue date Aug 13, 2013
- Tokyo Electron Limited
- Naoki Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method
- Patent number 8,137,471
- Issue date Mar 20, 2012
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,080,126
- Issue date Dec 20, 2011
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method thereof
- Patent number 8,048,327
- Issue date Nov 1, 2011
- Tokyo Electron Limited
- Akira Koshiishi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and electrode used therein
- Patent number 8,008,596
- Issue date Aug 30, 2011
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitive coupling plasma processing apparatus and method for usin...
- Patent number 7,993,489
- Issue date Aug 9, 2011
- Tokyo Electron Limited
- Naoki Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, plasma processing method, focus ring,...
- Patent number 7,988,814
- Issue date Aug 2, 2011
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,988,816
- Issue date Aug 2, 2011
- Tokyo Electron Limited
- Akira Koshiishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,951,262
- Issue date May 31, 2011
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ring mechanism, and plasma processing device using the ring mechanism
- Patent number 7,882,800
- Issue date Feb 8, 2011
- Tokyo Electron Limited
- Akira Koshiishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,740,737
- Issue date Jun 22, 2010
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring and plasma processing apparatus
- Patent number 7,658,816
- Issue date Feb 9, 2010
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of treating a mask layer prior to performing an etching process
- Patent number 7,642,193
- Issue date Jan 5, 2010
- Tokyo Electron Limited
- Peter L.G. Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of treating a mask layer prior to performing an etching process
- Patent number 7,572,386
- Issue date Aug 11, 2009
- Tokyo Electron Limited
- Peter L.G. Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma processing
- Patent number 7,537,672
- Issue date May 26, 2009
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20210082669
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20200111645
- Publication date Apr 9, 2020
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND METHOD
- Publication number 20190115192
- Publication date Apr 18, 2019
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING LAYER TO BE ETCHED
- Publication number 20180144948
- Publication date May 24, 2018
- TOKYO ELECTRON LIMITED
- Koji MARUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SELECTIVE SILICON OXIDE ETCHING
- Publication number 20170345673
- Publication date Nov 30, 2017
- TOKYO ELECTRON LIMITED
- Alok Ranjan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVE COUPLING PLASMA PROCESSING APPARATUS AND METHOD FOR USIN...
- Publication number 20170162406
- Publication date Jun 8, 2017
- TOKYO ELECTRON LIMITED
- NAOKI MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20170032936
- Publication date Feb 2, 2017
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20160379805
- Publication date Dec 29, 2016
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20160358753
- Publication date Dec 8, 2016
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160163515
- Publication date Jun 9, 2016
- TOKYO ELECTRON LIMITED
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND METHOD
- Publication number 20150000843
- Publication date Jan 1, 2015
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20140326409
- Publication date Nov 6, 2014
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20140124139
- Publication date May 8, 2014
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVE COUPLING PLASMA PROCESSING APPARATUS AND METHOD FOR USIN...
- Publication number 20130284371
- Publication date Oct 31, 2013
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20130112666
- Publication date May 9, 2013
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20120145324
- Publication date Jun 14, 2012
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, FOCUS RING,...
- Publication number 20110272100
- Publication date Nov 10, 2011
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20110272097
- Publication date Nov 10, 2011
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVE COUPLING PLASMA PROCESSING APPARATUS AND METHOD FOR USIN...
- Publication number 20110259524
- Publication date Oct 27, 2011
- Naoki Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20110214813
- Publication date Sep 8, 2011
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20110214815
- Publication date Sep 8, 2011
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20100326601
- Publication date Dec 30, 2010
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20100126668
- Publication date May 27, 2010
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20100043974
- Publication date Feb 25, 2010
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20080308041
- Publication date Dec 18, 2008
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20080135519
- Publication date Jun 12, 2008
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA ETCHING APPARATUS AND METHOD
- Publication number 20080110859
- Publication date May 15, 2008
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Stage for plasma processing apparatus, and plasma processing apparatus
- Publication number 20080073032
- Publication date Mar 27, 2008
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of treating a mask layer prior to performing an etching process
- Publication number 20080038926
- Publication date Feb 14, 2008
- TOKYO ELECTRON LIMITED
- Peter L.G. Ventzek
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Table for use in plasma processing system and plasma processing system
- Publication number 20080038162
- Publication date Feb 14, 2008
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS

AKIRA KOSHIISHI

Person

Patents Grantslast 30 patents

Plasma etching apparatus and method

Plasma processing apparatus and method

Plasma processing apparatus and method

Plasma processing apparatus and method

Capacitive coupling plasma processing apparatus and method for usin...

Method for etching layer to be etched

Plasma etching apparatus and method

Plasma processing apparatus and plasma processing method

Capacitive coupling plasma processing apparatus and method for usin...

Plasma processing apparatus and method

Plasma etching apparatus and method

Plasma processing apparatus and method

Table for use in plasma processing system and plasma processing system

Plasma processing apparatus and method

Plasma processing method and apparatus

Capacitive coupling plasma processing apparatus and method for usin...

Plasma processing apparatus and method

Plasma processing apparatus

Plasma processing apparatus and control method thereof

Plasma processing apparatus and electrode used therein

Capacitive coupling plasma processing apparatus and method for usin...

Plasma processing apparatus, plasma processing method, focus ring,...

Plasma processing apparatus and method

Plasma processing apparatus and method

Ring mechanism, and plasma processing device using the ring mechanism

Plasma processing apparatus and method

Focus ring and plasma processing apparatus

Method of treating a mask layer prior to performing an etching process

Method of treating a mask layer prior to performing an etching process

Apparatus for plasma processing

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA ETCHING APPARATUS AND METHOD

METHOD FOR ETCHING LAYER TO BE ETCHED

METHOD OF SELECTIVE SILICON OXIDE ETCHING

CAPACITIVE COUPLING PLASMA PROCESSING APPARATUS AND METHOD FOR USIN...

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA ETCHING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND METHOD

CAPACITIVE COUPLING PLASMA PROCESSING APPARATUS AND METHOD FOR USIN...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, FOCUS RING,...

PLASMA PROCESSING APPARATUS AND METHOD

CAPACITIVE COUPLING PLASMA PROCESSING APPARATUS AND METHOD FOR USIN...

PLASMA PROCESSING METHOD AND APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING METHOD AND APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND CONTROL METHOD THEREOF

PLASMA ETCHING APPARATUS AND METHOD

Stage for plasma processing apparatus, and plasma processing apparatus

Method of treating a mask layer prior to performing an etching process

Table for use in plasma processing system and plasma processing system