Akira Koshiishi

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Confinement ring for use in a plasma processing system
- Patent number 11,791,140
- Issue date Oct 17, 2023
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Confinement ring for use in a plasma processing system
- Patent number 11,342,166
- Issue date May 24, 2022
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Confinement ring for use in a plasma processing system
- Patent number 10,720,314
- Issue date Jul 21, 2020
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
E-beam enhanced decoupled source for semiconductor processing
- Patent number 9,177,756
- Issue date Nov 3, 2015
- Lam Research Corporation
- John Patrick Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
E-beam enhanced decoupled source for semiconductor processing
- Patent number 9,111,728
- Issue date Aug 18, 2015
- Lam Research Corporation
- John Patrick Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing system with source for decoupled ion and r...
- Patent number 8,980,046
- Issue date Mar 17, 2015
- Lam Research Corporation
- Akira Koshiishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Combined wafer area pressure control and plasma confinement assembly
- Patent number 8,627,783
- Issue date Jan 14, 2014
- Lam Research Corporation
- Andreas Fischer
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Hot edge ring with sloped upper surface
- Patent number 8,084,375
- Issue date Dec 27, 2011
- Lam Research Corporation
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Confinement Ring for Use in a Plasma Processing System
- Publication number 20220254614
- Publication date Aug 11, 2022
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Confinement Ring for Use in a Plasma Processing System
- Publication number 20200303171
- Publication date Sep 24, 2020
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIFREQUENCY CAPACITIVELY COUPLED PLASMA ETCH CHAMBER
- Publication number 20170213734
- Publication date Jul 27, 2017
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Processing System with Source for Decoupled Ion and R...
- Publication number 20130157469
- Publication date Jun 20, 2013
- LAM RESEARCH CORPORATION
- Akira Koshiishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
E-Beam Enhanced Decoupled Source for Semiconductor Processing
- Publication number 20120258601
- Publication date Oct 11, 2012
- LAM RESEARCH CORPORATION
- John Patrick Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
E-Beam Enhanced Decoupled Source for Semiconductor Processing
- Publication number 20120258607
- Publication date Oct 11, 2012
- LAM RESEARCH CORPORATION
- John Patrick Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
E-Beam Enhanced Decoupled Source for Semiconductor Processing
- Publication number 20120258606
- Publication date Oct 11, 2012
- LAM RESEARCH CORPORATION
- John Patrick Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HOT EDGE RING WITH SLOPED UPPER SURFACE
- Publication number 20110104884
- Publication date May 5, 2011
- LAM RESEARCH CORPORATION
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIFREQUENCY CAPACITIVELY COUPLED PLASMA ETCH CHAMBER
- Publication number 20100252199
- Publication date Oct 7, 2010
- Alexei Marakhtanov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMBINED WAFER AREA PRESSURE CONTROL AND PLASMA CONFINEMENT ASSEMBLY
- Publication number 20100154709
- Publication date Jun 24, 2010
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS

Akira Koshiishi

Person

Patents Grantslast 30 patents

Confinement ring for use in a plasma processing system

Confinement ring for use in a plasma processing system

Confinement ring for use in a plasma processing system

E-beam enhanced decoupled source for semiconductor processing

E-beam enhanced decoupled source for semiconductor processing

Semiconductor processing system with source for decoupled ion and r...

Combined wafer area pressure control and plasma confinement assembly

Hot edge ring with sloped upper surface

Patents Applicationslast 30 patents

Confinement Ring for Use in a Plasma Processing System

Confinement Ring for Use in a Plasma Processing System

MULTIFREQUENCY CAPACITIVELY COUPLED PLASMA ETCH CHAMBER

Semiconductor Processing System with Source for Decoupled Ion and R...

E-Beam Enhanced Decoupled Source for Semiconductor Processing

E-Beam Enhanced Decoupled Source for Semiconductor Processing

E-Beam Enhanced Decoupled Source for Semiconductor Processing

HOT EDGE RING WITH SLOPED UPPER SURFACE

MULTIFREQUENCY CAPACITIVELY COUPLED PLASMA ETCH CHAMBER

COMBINED WAFER AREA PRESSURE CONTROL AND PLASMA CONFINEMENT ASSEMBLY