Akira MIYAKE

Person

Nasukarasuyama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Exposure apparatus with irradiation device for irradiating optical...
- Patent number 9,568,835
- Issue date Feb 14, 2017
- Canon Kabushiki Kaisha
- Takahiro Nakayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective original, exposure method, and device manufacturing method
- Patent number 9,213,231
- Issue date Dec 15, 2015
- Canon Kabushiki Kaisha
- Masami Yonekawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror, method of manufacturing the same, exposure apparatus, and d...
- Patent number 9,063,277
- Issue date Jun 23, 2015
- Canon Kabushiki Kaisha
- Fumitaro Masaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
X-ray apparatus and its adjusting method
- Patent number 9,036,789
- Issue date May 19, 2015
- Canon Kabushiki Kaisha
- Fumitaro Masaki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
X-ray optical apparatus
- Patent number 9,020,102
- Issue date Apr 28, 2015
- Canon Kabushiki Kaisha
- Mitsuaki Amemiya
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
X-ray optical apparatus and adjusting method thereof
- Patent number 9,020,104
- Issue date Apr 28, 2015
- Canon Kabushiki Kaisha
- Naoya Iizuka
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Radiation imaging apparatus
- Patent number 9,020,098
- Issue date Apr 28, 2015
- Canon Kabushiki Kaisha
- Takeo Tsukamoto
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus, and article manufacturing method
- Patent number 8,981,323
- Issue date Mar 17, 2015
- Canon Kabushiki Kaisha
- Ichiro Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ cleaning device for lithographic apparatus
- Patent number 8,921,807
- Issue date Dec 30, 2014
- Canon Kabushiki Kaisha
- Hiromitsu Takase
- B08 - CLEANING
Information Patent Grant
Filter, exposure apparatus, and method of manufacturing device
- Patent number 8,760,628
- Issue date Jun 24, 2014
- Canon Kabushiki Kaisha
- Naoya Iizuka
- G02 - OPTICS
Information Patent Grant
Optical device and device manufacturing method
- Patent number 8,730,449
- Issue date May 20, 2014
- Canon Kabushiki Kaisha
- Naoya Iizuka
- G02 - OPTICS
Information Patent Grant
Charged particle optical system, drawing apparatus, and method of m...
- Patent number 8,716,672
- Issue date May 6, 2014
- Canon Kabushiki Kaisha
- Kentaro Sano
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam drawing apparatus and article manufacturing m...
- Patent number 8,698,095
- Issue date Apr 15, 2014
- Canon Kabushiki Kaisha
- Ichiro Tanaka
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Evaluation method and fabrication method of optical element having...
- Patent number 7,858,958
- Issue date Dec 28, 2010
- Canon Kabushiki Kaisha
- Takeshi Miyachi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multilayer mirror, evaluation method, exposure apparatus, device ma...
- Patent number 7,771,898
- Issue date Aug 10, 2010
- Canon Kabushiki Kaisha
- Fumitaro Masaki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Evaluation method and fabrication method of optical element having...
- Patent number 7,544,960
- Issue date Jun 9, 2009
- Canon Kabushiki Kaisha
- Takeshi Miyachi
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multilayer mirror manufacturing method, optical system manufacturin...
- Patent number 7,543,948
- Issue date Jun 9, 2009
- Canon Kabushiki Kaisha
- Akira Miyake
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method of evaluating optical element
- Patent number 7,453,560
- Issue date Nov 18, 2008
- Canon Kabushiki Kaisha
- Akira Miyake
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus using blaze type diffraction grating to diffract...
- Patent number 7,436,490
- Issue date Oct 14, 2008
- Canon Kabushiki Kaisha
- Akira Miyake
- B82 - NANO-TECHNOLOGY
Information Patent Grant
X-ray generator and exposure apparatus
- Patent number 7,433,447
- Issue date Oct 7, 2008
- Canon Kabushiki Kaisha
- Fumitaro Masaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
X-ray generator and exposure apparatus having the same
- Patent number 7,352,842
- Issue date Apr 1, 2008
- Canon Kabushiki Kaisha
- Akira Miyake
- B82 - NANO-TECHNOLOGY
Information Patent Grant
X-ray generator and exposure apparatus
- Patent number 7,349,524
- Issue date Mar 25, 2008
- Canon Kabushiki Kaisha
- Fumitaro Masaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus for evaluating EUV light source, and evaluation method us...
- Patent number 7,312,459
- Issue date Dec 25, 2007
- Canon Kabushiki Kaisha
- Mitsuaki Amemiya
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Mirror unit, method of producing the same, and exposure apparatus a...
- Patent number 7,311,407
- Issue date Dec 25, 2007
- Canon Kabushiki Kaisha
- Takeshi Yamamoto
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Assembly and adjusting method of optical system, exposure apparatus...
- Patent number 7,280,184
- Issue date Oct 9, 2007
- Canon Kabushiki Kaisha
- Takayuki Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light source unit and exposure apparatus having the same
- Patent number 7,276,710
- Issue date Oct 2, 2007
- Canon Kabushiki Kaisha
- Takeshi Yamamoto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light spectrum measuring apparatus and calculating method of EU...
- Patent number 7,189,974
- Issue date Mar 13, 2007
- Canon Kabushiki Kaisha
- Hajime Kanazawa
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
X-ray illumination optical system and X-ray reduction exposure appa...
- Patent number 7,133,489
- Issue date Nov 7, 2006
- Canon Kabushiki Kaisha
- Akira Miyake
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Light generator and exposure apparatus
- Patent number 7,091,507
- Issue date Aug 15, 2006
- Canon Kabushiki Kaisha
- Fumitaro Masaki
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Adjustment method and apparatus of optical system, and exposure app...
- Patent number 7,083,290
- Issue date Aug 1, 2006
- Canon Kabushiki Kaisha
- Fumitaro Masaki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE ORIGINAL, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
- Publication number 20150017573
- Publication date Jan 15, 2015
- Canon Kabushiki Kaisha
- Masami Yonekawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING AR...
- Publication number 20140055765
- Publication date Feb 27, 2014
- Canon Kabushiki Kaisha
- Takahiro Nakayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILTER, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE
- Publication number 20130286469
- Publication date Oct 31, 2013
- Naoya IIZUKA
- G02 - OPTICS
Information Patent Application
CHARGED PARTICLE OPTICAL SYSTEM, DRAWING APPARATUS, AND METHOD OF M...
- Publication number 20130273478
- Publication date Oct 17, 2013
- Canon Kabushiki Kaisha
- Kentaro Sano
- B82 - NANO-TECHNOLOGY
Information Patent Application
RADIATION IMAGING APPARATUS
- Publication number 20130243156
- Publication date Sep 19, 2013
- Canon Kabushiki Kaisha
- Takeo Tsukamoto
- G01 - MEASURING TESTING
Information Patent Application
X-RAY APPARATUS AND ITS ADJUSTING METHOD
- Publication number 20130243163
- Publication date Sep 19, 2013
- Canon Kabushiki Kaisha
- Fumitaro Masaki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
X-RAY OPTICAL APPARATUS AND ADJUSTING METHOD THEREOF
- Publication number 20130243164
- Publication date Sep 19, 2013
- Canon Kabushiki Kaisha
- Naoya Iizuka
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
X-RAY OPTICAL APPARATUS
- Publication number 20130235980
- Publication date Sep 12, 2013
- Canon Kabushiki Kaisha
- Mitsuaki Amemiya
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS, AND ARTICLE MANUFACTURING METHOD
- Publication number 20130216959
- Publication date Aug 22, 2013
- Canon Kabushiki Kaisha
- Ichiro TANAKA
- B82 - NANO-TECHNOLOGY
Information Patent Application
X-RAY IMAGING APPARATUS AND METHOD OF CAPTURING IMAGES WITH SAME
- Publication number 20130077747
- Publication date Mar 28, 2013
- Canon Kabushiki Kaisha
- Takashi Kamono
- G01 - MEASURING TESTING
Information Patent Application
CHARGED-PARTICLE BEAM LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACT...
- Publication number 20120288799
- Publication date Nov 15, 2012
- Canon Kabushiki Kaisha
- Hiromitsu TAKASE
- B08 - CLEANING
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS AND ARTICLE MANUFACTURING M...
- Publication number 20120178025
- Publication date Jul 12, 2012
- Canon Kabushiki Kaisha
- Ichiro TANAKA
- B82 - NANO-TECHNOLOGY
Information Patent Application
MIRROR, METHOD OF MANUFACTURING THE SAME, EXPOSURE APPARATUS, AND D...
- Publication number 20120170012
- Publication date Jul 5, 2012
- Canon Kabushiki Kaisha
- Fumitaro Masaki
- G02 - OPTICS
Information Patent Application
FILTER, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE
- Publication number 20120171622
- Publication date Jul 5, 2012
- Canon Kabushiki Kaisha
- Naoya Iizuka
- G02 - OPTICS
Information Patent Application
OPTICAL DEVICE AND DEVICE MANUFACTURING METHOD
- Publication number 20110222042
- Publication date Sep 15, 2011
- Canon Kabushiki Kaisha
- Naoya Iizuka
- G02 - OPTICS
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20100182583
- Publication date Jul 22, 2010
- Canon Kabushiki Kaisha
- Naoya Iizuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EVALUATION METHOD AND FABRICATION METHOD OF OPTICAL ELEMENT HAVING...
- Publication number 20090218505
- Publication date Sep 3, 2009
- Canon Kabushiki Kaisha
- Takeshi MIYACHI
- G02 - OPTICS
Information Patent Application
EXPOSURE MIRROR AND EXPOSURE APPARATUS HAVING SAME
- Publication number 20090147364
- Publication date Jun 11, 2009
- Canon Kabushiki Kaisha
- Masashi Kotoku
- B82 - NANO-TECHNOLOGY
Information Patent Application
OPTICAL ELEMENT, AND LIGHT SOURCE UNIT AND EXPOSURE APPARATUS HAVIN...
- Publication number 20090141356
- Publication date Jun 4, 2009
- Fumitaro Masaki
- G02 - OPTICS
Information Patent Application
MIRROR UNIT, METHOD OF PRODUCING THE SAME, AND EXPOSURE APPARATUS A...
- Publication number 20080117512
- Publication date May 22, 2008
- Takeshi Yamamoto
- G02 - OPTICS
Information Patent Application
X-RAY GENERATOR AND EXPOSURE APPARATUS
- Publication number 20080043922
- Publication date Feb 21, 2008
- Fumitaro Masaki
- B82 - NANO-TECHNOLOGY
Information Patent Application
MULTILAYER MIRROR, EVALUATION METHOD, EXPOSURE APPARATUS, DEVICE MA...
- Publication number 20070287076
- Publication date Dec 13, 2007
- Fumitaro Masaki
- B82 - NANO-TECHNOLOGY
Information Patent Application
MULTILAYER MIRROR MANUFACTURING METHOD, OPTICAL SYSTEM MANUFACTURIN...
- Publication number 20070188870
- Publication date Aug 16, 2007
- Akira MIYAKE
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT, AND LIGHT SOURCE UNIT AND EXPOSURE APPARATUS HAVIN...
- Publication number 20070177274
- Publication date Aug 2, 2007
- Canon Kabushiki Kaisha
- Fumitaro MASAKI
- G02 - OPTICS
Information Patent Application
Apparatus for evalulating EUV light source, and evaluation method u...
- Publication number 20070002474
- Publication date Jan 4, 2007
- Mitsuaki Amemiya
- G02 - OPTICS
Information Patent Application
X-ray generator and exposure apparatus having the same
- Publication number 20060138364
- Publication date Jun 29, 2006
- Akira Miyake
- B82 - NANO-TECHNOLOGY
Information Patent Application
X-ray generator and exposure apparatus
- Publication number 20060078089
- Publication date Apr 13, 2006
- Fumitaro Masaki
- B82 - NANO-TECHNOLOGY
Information Patent Application
Light source unit and exposure apparatus having the same
- Publication number 20060011870
- Publication date Jan 19, 2006
- Takeshi Yamamoto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Evaluation method and fabrication method of optical element having...
- Publication number 20050271957
- Publication date Dec 8, 2005
- Takeshi Miyachi
- G02 - OPTICS
Information Patent Application
Assembly and adjusting method of optical system, exposure apparatus...
- Publication number 20050264779
- Publication date Dec 1, 2005
- Takayuki Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Akira MIYAKE

Person

Patents Grantslast 30 patents

Exposure apparatus with irradiation device for irradiating optical...

Reflective original, exposure method, and device manufacturing method

Mirror, method of manufacturing the same, exposure apparatus, and d...

X-ray apparatus and its adjusting method

X-ray optical apparatus

X-ray optical apparatus and adjusting method thereof

Radiation imaging apparatus

Charged particle beam apparatus, and article manufacturing method

In situ cleaning device for lithographic apparatus

Filter, exposure apparatus, and method of manufacturing device

Optical device and device manufacturing method

Charged particle optical system, drawing apparatus, and method of m...

Charged particle beam drawing apparatus and article manufacturing m...

Evaluation method and fabrication method of optical element having...

Multilayer mirror, evaluation method, exposure apparatus, device ma...

Evaluation method and fabrication method of optical element having...

Multilayer mirror manufacturing method, optical system manufacturin...

Method of evaluating optical element

Exposure apparatus using blaze type diffraction grating to diffract...

X-ray generator and exposure apparatus

X-ray generator and exposure apparatus having the same

X-ray generator and exposure apparatus

Apparatus for evaluating EUV light source, and evaluation method us...

Mirror unit, method of producing the same, and exposure apparatus a...

Assembly and adjusting method of optical system, exposure apparatus...

Light source unit and exposure apparatus having the same

EUV light spectrum measuring apparatus and calculating method of EU...

X-ray illumination optical system and X-ray reduction exposure appa...

Light generator and exposure apparatus

Adjustment method and apparatus of optical system, and exposure app...

Patents Applicationslast 30 patents

REFLECTIVE ORIGINAL, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING AR...

FILTER, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE

CHARGED PARTICLE OPTICAL SYSTEM, DRAWING APPARATUS, AND METHOD OF M...

RADIATION IMAGING APPARATUS

X-RAY APPARATUS AND ITS ADJUSTING METHOD

X-RAY OPTICAL APPARATUS AND ADJUSTING METHOD THEREOF

X-RAY OPTICAL APPARATUS

CHARGED PARTICLE BEAM APPARATUS, AND ARTICLE MANUFACTURING METHOD

X-RAY IMAGING APPARATUS AND METHOD OF CAPTURING IMAGES WITH SAME

CHARGED-PARTICLE BEAM LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACT...

CHARGED PARTICLE BEAM DRAWING APPARATUS AND ARTICLE MANUFACTURING M...

MIRROR, METHOD OF MANUFACTURING THE SAME, EXPOSURE APPARATUS, AND D...

FILTER, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE

OPTICAL DEVICE AND DEVICE MANUFACTURING METHOD

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

EVALUATION METHOD AND FABRICATION METHOD OF OPTICAL ELEMENT HAVING...

EXPOSURE MIRROR AND EXPOSURE APPARATUS HAVING SAME

OPTICAL ELEMENT, AND LIGHT SOURCE UNIT AND EXPOSURE APPARATUS HAVIN...

MIRROR UNIT, METHOD OF PRODUCING THE SAME, AND EXPOSURE APPARATUS A...

X-RAY GENERATOR AND EXPOSURE APPARATUS

MULTILAYER MIRROR, EVALUATION METHOD, EXPOSURE APPARATUS, DEVICE MA...

MULTILAYER MIRROR MANUFACTURING METHOD, OPTICAL SYSTEM MANUFACTURIN...

OPTICAL ELEMENT, AND LIGHT SOURCE UNIT AND EXPOSURE APPARATUS HAVIN...

Apparatus for evalulating EUV light source, and evaluation method u...

X-ray generator and exposure apparatus having the same

X-ray generator and exposure apparatus

Light source unit and exposure apparatus having the same

Evaluation method and fabrication method of optical element having...

Assembly and adjusting method of optical system, exposure apparatus...