Akira Oikawa

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of making resist patterns
- Patent number 6,127,098
- Issue date Oct 3, 2000
- Fujitsu Limited
- Kenji Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist with bleaching effect
- Patent number 6,120,977
- Issue date Sep 19, 2000
- Fujitsu Limited
- Yuko Kaimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative type composition for chemically amplified resist and proce...
- Patent number 5,723,259
- Issue date Mar 3, 1998
- Fujitsu Limited
- Akira Oikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming chemically amplified resist pattern and manufactu...
- Patent number 5,707,784
- Issue date Jan 13, 1998
- Fujitsu Ltd.
- Akira Oikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus of formation of chemically amplified resist pattern
- Patent number 5,693,145
- Issue date Dec 2, 1997
- Fujitsu Limited
- Akira Oikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition
- Patent number 5,688,628
- Issue date Nov 18, 1997
- Nippon Zeon Co., Ltd.
- Masayuki Oie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polysilphenylenesiloxane, production process thereof, and resist ma...
- Patent number 5,484,687
- Issue date Jan 16, 1996
- Fujitsu Limited
- Keiji Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polysilphenylenesiloxane, production process thereof, and resist ma...
- Patent number 5,240,813
- Issue date Aug 31, 1993
- Fujitsu Limited
- Keiji Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Akira Oikawa

Person

Patents Grantslast 30 patents

Method of making resist patterns

Photoresist with bleaching effect

Negative type composition for chemically amplified resist and proce...

Method of forming chemically amplified resist pattern and manufactu...

Apparatus of formation of chemically amplified resist pattern

Resist composition

Polysilphenylenesiloxane, production process thereof, and resist ma...

Polysilphenylenesiloxane, production process thereof, and resist ma...