Akira TAKADA

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 11,584,810
- Issue date Feb 21, 2023
- FUJIFILM Corporation
- Akira Takada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,579,528
- Issue date Feb 14, 2023
- FUJIFILM Corporation
- Ryo Nishio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,067,890
- Issue date Jul 20, 2021
- FUJIFILM Corporation
- Akiyoshi Goto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, and resist film, pattern forming method, and me...
- Patent number 10,551,739
- Issue date Feb 4, 2020
- FUJIFILM Corporation
- Akira Takada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, photo mask manufacturing method, and electr...
- Patent number 10,488,755
- Issue date Nov 26, 2019
- FUJIFILM Corporation
- Hidehiro Mochizuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
- Publication number 20230148344
- Publication date May 11, 2023
- FUJIFILM CORPORATION
- Akiyoshi GOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20230133710
- Publication date May 4, 2023
- FUJIFILM CORPORATION
- Aina USHIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20230139891
- Publication date May 4, 2023
- FUJIFILM CORPORATION
- Masafumi Kojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMATION METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DE...
- Publication number 20230067750
- Publication date Mar 2, 2023
- FUJIFILM CORPORATION
- Kazuhiro MARUMO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE TONE RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METH...
- Publication number 20220382153
- Publication date Dec 1, 2022
- FUJIFILM CORPORATION
- Akira TAKADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RE...
- Publication number 20220179307
- Publication date Jun 9, 2022
- FUJIFILM CORPORATION
- Akira TAKADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20220043347
- Publication date Feb 10, 2022
- FUJIFILM CORPORATION
- Akira TAKADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
- Publication number 20210109446
- Publication date Apr 15, 2021
- FUJIFILM CORPORATION
- Akiyoshi Goto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING MET...
- Publication number 20200183279
- Publication date Jun 11, 2020
- FUJI FILM Corporation
- Kazuhiro MARUMO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METH...
- Publication number 20200183274
- Publication date Jun 11, 2020
- FUJIFILM CORPORATION
- Naohiro TANGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20200159117
- Publication date May 21, 2020
- FUJIFILM CORPORATION
- Ryo NISHIO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20200012189
- Publication date Jan 9, 2020
- FUJIFILM CORPORATION
- Akiyoshi GOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20190171104
- Publication date Jun 6, 2019
- FUJIFILM CORPORATION
- Akira Takada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, AND ME...
- Publication number 20180210339
- Publication date Jul 26, 2018
- FUJIFILM CORPORATION
- Akira Takada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, PHOTO MASK MANUFACTURING METHOD, AND ELECTR...
- Publication number 20180017865
- Publication date Jan 18, 2018
- FUJIFILM CORPORATION
- Hidehiro MOCHIZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Akira TAKADA

Person

Patents Grantslast 30 patents

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Resist composition, and resist film, pattern forming method, and me...

Pattern forming method, photo mask manufacturing method, and electr...

Patents Applicationslast 30 patents

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PATTERN FORMATION METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DE...

POSITIVE TONE RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METH...

ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RE...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...

PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING MET...

PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METH...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

RESIST COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, AND ME...

PATTERN FORMING METHOD, PHOTO MASK MANUFACTURING METHOD, AND ELECTR...