Akira Yokota

Person

Yamato, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive-working photoresist containing o-naphthoquinone diazide su...
- Patent number 5,281,508
- Issue date Jan 25, 1994
- Tokyo Ohka Kogyo Co., Ltd.
- Hidekatsu Kohara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Undercoating material for photosensitive resins
- Patent number 4,902,770
- Issue date Feb 20, 1990
- Tokyo Ohka Kogyo Co., Ltd.
- Wataru Ishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Containing an arylsulfonic acid, a phenol and a naphalenic solvent
- Patent number 4,844,832
- Issue date Jul 4, 1989
- Tokyo Ohka Kogyo Co., Ltd.
- Masakazu Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing solution for positive-working photoresist comprising tma...
- Patent number 4,833,067
- Issue date May 23, 1989
- Tokyo Ohka Kogyo Co., Ltd.
- Hatsuyuki Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a positive resist pattern in photoresist of o-nap...
- Patent number 4,797,348
- Issue date Jan 10, 1989
- Tokyo Ohka Kogyo Co., Ltd.
- Yoichi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing solution for positive-working photoresist comprising a m...
- Patent number 4,784,937
- Issue date Nov 15, 1988
- Tokyo Ohka Kogyo Co., Ltd.
- Hatsuyuki Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working O-quinone diazide photoresist composition with 2,3...
- Patent number 4,738,915
- Issue date Apr 19, 1988
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Komine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of preparing photoresist material with undercoating of photo...
- Patent number 4,702,992
- Issue date Oct 27, 1987
- Tokyo Ohka Kogyo Co., Ltd.
- Wataru Ishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aqueous developer solution for positive type photoresists with tetr...
- Patent number 4,610,953
- Issue date Sep 9, 1986
- Tokyo Ohka Kogyo Co., Ltd.
- Koichiro Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for fine pattern formation on a photoresist
- Patent number 4,590,149
- Issue date May 20, 1986
- Tokyo Ohka Kogyo Co., Ltd.
- Hisashi Nakane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for fine pattern formation on a photoresist
- Patent number 4,588,675
- Issue date May 13, 1986
- Tok Yo Ohka Kogyo Co., Ltd.
- Hisashi Nakane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for preventing leaching of contaminants from solid surfaces
- Patent number 4,385,086
- Issue date May 24, 1983
- Tokyo Ohka Kogyo Kabushiki Kaisha
- Muneo Nakayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Positive-type O-quinone diazide containing photoresist compositions
- Patent number 4,174,222
- Issue date Nov 13, 1979
- Tokyo Ohka Kogyo Kabushiki Kaisha
- Takashi Komine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Akira Yokota

Person

Patents Grantslast 30 patents

Positive-working photoresist containing o-naphthoquinone diazide su...

Undercoating material for photosensitive resins

Containing an arylsulfonic acid, a phenol and a naphalenic solvent

Developing solution for positive-working photoresist comprising tma...

Method of forming a positive resist pattern in photoresist of o-nap...

Developing solution for positive-working photoresist comprising a m...

Positive-working O-quinone diazide photoresist composition with 2,3...

Method of preparing photoresist material with undercoating of photo...

Aqueous developer solution for positive type photoresists with tetr...

Method for fine pattern formation on a photoresist

Method for fine pattern formation on a photoresist

Method for preventing leaching of contaminants from solid surfaces

Positive-type O-quinone diazide containing photoresist compositions