Akira Yonemizu

Person

Koshi-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Heat treatment method, heat treatment apparatus and treatment system
- Patent number 6,979,474
- Issue date Dec 27, 2005
- Tokyo Electron Limited
- Yuji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 6,936,134
- Issue date Aug 30, 2005
- Tokyo Electron Limited
- Akira Yonemizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate surface processing apparatus and method
- Patent number 6,652,662
- Issue date Nov 25, 2003
- Tokyo Electron Limited
- Akira Ishihara
- B08 - CLEANING
Information Patent Grant
Scrub washing method
- Patent number 6,491,760
- Issue date Dec 10, 2002
- Tokyo Electron Limited
- Akira Ishihara
- B08 - CLEANING
Information Patent Grant
Scrub washing apparatus and scrub washing method
- Patent number 6,292,972
- Issue date Sep 25, 2001
- Tokyo Electron Limited
- Akira Ishihara
- B08 - CLEANING
Information Patent Grant
Heat treatment method, heat treatment apparatus and treatment system
- Patent number 6,261,365
- Issue date Jul 17, 2001
- Tokyo Electron Limited
- Yuji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus
- Patent number 6,178,580
- Issue date Jan 30, 2001
- Tokyo Electron Limited
- Akira Ishihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for washing both surfaces of a substrate
- Patent number 6,173,468
- Issue date Jan 16, 2001
- Tokyo Electron Limited
- Akira Yonemizu
- B08 - CLEANING
Information Patent Grant
Method for wet etching of thin film
- Patent number 6,096,233
- Issue date Aug 1, 2000
- Tokyo Electron Limited
- Hiroki Taniyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for washing both surfaces of a substrate
- Patent number 5,985,039
- Issue date Nov 16, 1999
- Tokyo Electron Limited
- Akira Yonemizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus for target processing substrate
- Patent number 5,975,097
- Issue date Nov 2, 1999
- Tokyo Electron Limited
- Akira Yonemizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double-sided substrate cleaning apparatus and cleaning method using...
- Patent number 5,964,954
- Issue date Oct 12, 1999
- Tokyo Electron Limited
- Hiroyuki Matsukawa
- B08 - CLEANING
Information Patent Grant
Method for washing both surfaces of a substrate
- Patent number 5,958,145
- Issue date Sep 28, 1999
- Tokyo Electron Limited
- Akira Yonemizu
- B08 - CLEANING
Information Patent Grant
Method of cleaning a substrate by scrubbing
- Patent number 5,882,426
- Issue date Mar 16, 1999
- Tokyo Electron Limited
- Akira Yonemizu
- B08 - CLEANING
Information Patent Grant
Method for cleaning substrates
- Patent number 5,858,112
- Issue date Jan 12, 1999
- Tokyo Electron Limited
- Akira Yonemizu
- B08 - CLEANING
Information Patent Grant
Cleaning apparatus
- Patent number 5,685,039
- Issue date Nov 11, 1997
- Tokyo Electron Limited
- Tomoko Hamada
- A46 - BRUSHWARE
Information Patent Grant
Resist treating method
- Patent number 5,686,143
- Issue date Nov 11, 1997
- Tokyo Electron Limited
- Hiroyuki Matsukawa
- B08 - CLEANING
Information Patent Grant
Cleaning apparatus for cleaning substrates
- Patent number 5,651,160
- Issue date Jul 29, 1997
- Tokyo Electron Limited
- Akira Yonemizu
- B08 - CLEANING
Information Patent Grant
Cleaning apparatus and cleaning method
- Patent number 5,636,401
- Issue date Jun 10, 1997
- Tokyo Electron Limited
- Akira Yonemizu
- B08 - CLEANING
Information Patent Grant
Double-sided substrate cleaning apparatus
- Patent number 5,518,542
- Issue date May 21, 1996
- Tokyo Electron Limited
- Hiroyuki Matsukawa
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
Heating Device
- Publication number 20140014644
- Publication date Jan 16, 2014
- Tokyo Electron Limited
- Hironori Akiba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heating Device
- Publication number 20140014643
- Publication date Jan 16, 2014
- Tokyo Electron Limited
- Hironori Akiba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF REMOVING PARTICLE ON SUBSTRATE, APPARATUS THEREFOR, AND C...
- Publication number 20070125491
- Publication date Jun 7, 2007
- TOKYO ELECTON LIMITED
- Akira Yonemizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20020056417
- Publication date May 16, 2002
- TOKYO ELECTRON LIMITED
- Akira Yonemizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scrub washing apparatus and scrub washing method
- Publication number 20010035200
- Publication date Nov 1, 2001
- Akira Ishihara
- G05 - CONTROLLING REGULATING
Information Patent Application
Heat treatment method, heat treatment apparatus and treatment system
- Publication number 20010029890
- Publication date Oct 18, 2001
- TOKYO ELECTRON LIMITED
- Yuji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS

Akira Yonemizu

Person

Patents Grantslast 30 patents

Heat treatment method, heat treatment apparatus and treatment system

Substrate processing apparatus and substrate processing method

Substrate surface processing apparatus and method

Scrub washing method

Scrub washing apparatus and scrub washing method

Heat treatment method, heat treatment apparatus and treatment system

Processing apparatus

Apparatus for washing both surfaces of a substrate

Method for wet etching of thin film

Apparatus and method for washing both surfaces of a substrate

Processing apparatus for target processing substrate

Double-sided substrate cleaning apparatus and cleaning method using...

Method for washing both surfaces of a substrate

Method of cleaning a substrate by scrubbing

Method for cleaning substrates

Cleaning apparatus

Resist treating method

Cleaning apparatus for cleaning substrates

Cleaning apparatus and cleaning method

Double-sided substrate cleaning apparatus

Patents Applicationslast 30 patents

Heating Device

Heating Device

METHOD OF REMOVING PARTICLE ON SUBSTRATE, APPARATUS THEREFOR, AND C...

Substrate processing apparatus and substrate processing method

Scrub washing apparatus and scrub washing method

Heat treatment method, heat treatment apparatus and treatment system