Akitaka Shimizu

Person

Yamanashi-Ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method, substrate processing apparatus, and me...
- Patent number 12,165,848
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Kenichi Oyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method, damage layer removal method, and storage medium
- Patent number 11,557,486
- Issue date Jan 17, 2023
- Tokyo Electron Limited
- Akitaka Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching device
- Patent number 11,443,952
- Issue date Sep 13, 2022
- Tokyo Electron Limited
- Akitaka Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,328,904
- Issue date May 10, 2022
- Tokyo Electron Limited
- Shigeki Doba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 11,024,514
- Issue date Jun 1, 2021
- Tokyo Electron Limited
- Takuya Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,985,029
- Issue date Apr 20, 2021
- Tokyo Electron Limited
- Hiroyuki Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of cleaning plasma processing apparatus
- Patent number 10,975,468
- Issue date Apr 13, 2021
- Tokyo Electron Limited
- Hiroki Kishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,923,329
- Issue date Feb 16, 2021
- Tokyo Electron Limited
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 10,923,358
- Issue date Feb 16, 2021
- Tokyo Electron Limited
- Muneyuki Imai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, substrate processing apparatus and sub...
- Patent number 10,903,083
- Issue date Jan 26, 2021
- Tokyo Electron Limited
- Keiko Hada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 10,734,201
- Issue date Aug 4, 2020
- Tokyo Electron Limited
- Shigeki Doba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,541,145
- Issue date Jan 21, 2020
- Tokyo Electron Limited
- Hiroyuki Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of cleaning plasma processing apparatus
- Patent number 10,053,773
- Issue date Aug 21, 2018
- Tokyo Electron Limited
- Hiroki Kishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxide film removing method, oxide film removing apparatus, contact...
- Patent number 9,984,892
- Issue date May 29, 2018
- Tokyo Electron Limited
- Takashi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and substrate processing apparatus
- Patent number 9,882,124
- Issue date Jan 30, 2018
- Tokyo Electron Limited
- Eiichi Nishimura
- C21 - METALLURGY OF IRON
Information Patent Grant
Plasma processing apparatus
- Patent number 9,245,776
- Issue date Jan 26, 2016
- Tokyo Electron Limited
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning apparatus and vacuum processing system
- Patent number 9,214,364
- Issue date Dec 15, 2015
- Tokyo Electron Limited
- Kazuya Dobashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of etching copper layer and mask
- Patent number 9,208,997
- Issue date Dec 8, 2015
- Tokyo Electron Limited
- Eiichi Nishimura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method
- Patent number 9,139,901
- Issue date Sep 22, 2015
- Tokyo Electron Limited
- Akitaka Shimizu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus for...
- Patent number 8,642,136
- Issue date Feb 4, 2014
- Tokyo Electron Limited
- Masato Kushibiki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,383,517
- Issue date Feb 26, 2013
- Tokyo Electron Limited
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etchimg method and plasma etching apparatus
- Patent number 8,298,957
- Issue date Oct 30, 2012
- Tokyo Electron Limited
- Yosuke Sakao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing control method and storage medium
- Patent number RE43652
- Issue date Sep 11, 2012
- Tokyo Electron Limited
- Susumu Saito
- 438 - Semiconductor device manufacturing: process
Information Patent Grant
Plasma processing apparatus
- Patent number 8,251,011
- Issue date Aug 28, 2012
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Component cleaning method and storage medium
- Patent number 8,236,109
- Issue date Aug 7, 2012
- Tokyo Electron Limited
- Tsuyoshi Moriya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 7,897,498
- Issue date Mar 1, 2011
- Tokyo Electron Limited
- Glenn Gale
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing method and post-processing method
- Patent number 7,871,532
- Issue date Jan 18, 2011
- Tokyo Electron Limited
- Akitaka Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing control method and storage medium
- Patent number 7,824,931
- Issue date Nov 2, 2010
- Tokyo Electron Limited
- Susumu Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 7,811,939
- Issue date Oct 12, 2010
- Tokyo Electron Limited
- Masato Kushibiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fine pattern forming method
- Patent number 7,604,908
- Issue date Oct 20, 2009
- Tokyo Electron Limited
- Masato Kushibiki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230124597
- Publication date Apr 20, 2023
- TOKYO ELECTRON LIMITED
- Nobuhiro TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND ME...
- Publication number 20220406572
- Publication date Dec 22, 2022
- Tokyo Electron Limited
- Kenichi OYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20220189783
- Publication date Jun 16, 2022
- TOKYO ELECTRON LIMITED
- Akitaka SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, METHOD OF REMOVING ETCHING RESIDUE, AND STORAGE MEDIUM
- Publication number 20210358761
- Publication date Nov 18, 2021
- Tokyo Electron Limited
- Nobuhiro TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching Method and Etching Device
- Publication number 20210151326
- Publication date May 20, 2021
- TOKYO ELECTRON LIMITED
- Akitaka SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND SUB...
- Publication number 20210104412
- Publication date Apr 8, 2021
- TOKYO ELECTRON LIMITED
- Keiko HADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, DAMAGE LAYER REMOVAL METHOD, AND STORAGE MEDIUM
- Publication number 20210090896
- Publication date Mar 25, 2021
- TOKYO ELECTRON LIMITED
- Akitaka SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus
- Publication number 20200321195
- Publication date Oct 8, 2020
- TOKYO ELECTRON LIMITED
- Shigeki DOBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200118830
- Publication date Apr 16, 2020
- TOKYO ELECTRON LIMITED
- Hiroyuki OGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200111646
- Publication date Apr 9, 2020
- TOKYO ELECTRON LIMITED
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20200035504
- Publication date Jan 30, 2020
- TOKYO ELECTRON LIMITED
- Takuya ABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20190109012
- Publication date Apr 11, 2019
- TOKYO ELECTRON LIMITED
- Muneyuki IMAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CLEANING PLASMA PROCESSING APPARATUS
- Publication number 20180327901
- Publication date Nov 15, 2018
- TOKYO ELECTRON LIMITED
- Hiroki KISHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20180286696
- Publication date Oct 4, 2018
- Hiroyuki OGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND HEAT SHIELD PLATE
- Publication number 20180151380
- Publication date May 31, 2018
- TOKYO ELECTRON LIMITED
- Hiroyuki OGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXIDE FILM REMOVING METHOD, OXIDE FILM REMOVING APPARATUS, CONTACT...
- Publication number 20170338120
- Publication date Nov 23, 2017
- TOKYO ELECTRON LIMITED
- Takashi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20170256382
- Publication date Sep 7, 2017
- Shigeki DOBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20170243725
- Publication date Aug 24, 2017
- Ryoji YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND SUB...
- Publication number 20170200618
- Publication date Jul 13, 2017
- TOKYO ELECTRON LIMITED
- Keiko HADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CLEANING PLASMA PROCESSING APPARATUS
- Publication number 20150247235
- Publication date Sep 3, 2015
- TOKYO ELECTRON LIMITED
- Hiroki KISHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20150214474
- Publication date Jul 30, 2015
- TOKYO ELECTRON LIMITED
- Eiichi NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20150132960
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20150132970
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20150083580
- Publication date Mar 26, 2015
- TOKYO ELECTRON LIMITED
- Akitaka SHIMIZU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20140284308
- Publication date Sep 25, 2014
- KABUSHIKI KAISHA TOSHIBA
- Shoichiro MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING COPPER LAYER AND MASK
- Publication number 20140110373
- Publication date Apr 24, 2014
- Eiichi Nishimura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20130295774
- Publication date Nov 7, 2013
- Akitaka Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING APPARATUS AND VACUUM PROCESSING SYSTEM
- Publication number 20120247670
- Publication date Oct 4, 2012
- IWATANI CORPORATION
- Kazuya DOBASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SIDE WALL COMPONENT
- Publication number 20120037314
- Publication date Feb 16, 2012
- TOKYO ELECTRON LIMITED
- Shosuke Endoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20110220609
- Publication date Sep 15, 2011
- TOKYO ELECTRON LIMITED
- Hidetami Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS

Akitaka Shimizu

Person

Patents Grantslast 30 patents

Substrate processing method, substrate processing apparatus, and me...

Etching method, damage layer removal method, and storage medium

Etching method and etching device

Substrate processing apparatus

Etching method and etching apparatus

Substrate processing apparatus and substrate processing method

Method of cleaning plasma processing apparatus

Substrate processing apparatus and substrate processing method

Substrate processing method

Substrate processing method, substrate processing apparatus and sub...

Substrate processing apparatus

Substrate processing apparatus and substrate processing method

Method of cleaning plasma processing apparatus

Oxide film removing method, oxide film removing apparatus, contact...

Etching method and substrate processing apparatus

Plasma processing apparatus

Substrate cleaning apparatus and vacuum processing system

Method of etching copper layer and mask

Plasma processing method

Substrate processing method and substrate processing apparatus for...

Substrate processing method and substrate processing apparatus

Plasma etchimg method and plasma etching apparatus

Substrate processing control method and storage medium

Plasma processing apparatus

Component cleaning method and storage medium

Method for manufacturing semiconductor device

Plasma processing method and post-processing method

Substrate processing control method and storage medium

Plasma etching method

Fine pattern forming method

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND ME...

ETCHING METHOD AND ETCHING APPARATUS

ETCHING METHOD, METHOD OF REMOVING ETCHING RESIDUE, AND STORAGE MEDIUM

Etching Method and Etching Device

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND SUB...

ETCHING METHOD, DAMAGE LAYER REMOVAL METHOD, AND STORAGE MEDIUM

Substrate Processing Apparatus

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

ETCHING METHOD AND ETCHING APPARATUS

SUBSTRATE PROCESSING METHOD

METHOD OF CLEANING PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND HEAT SHIELD PLATE

OXIDE FILM REMOVING METHOD, OXIDE FILM REMOVING APPARATUS, CONTACT...

SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND SUB...

METHOD OF CLEANING PLASMA PROCESSING APPARATUS

ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

PLASMA PROCESSING METHOD

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS

METHOD OF ETCHING COPPER LAYER AND MASK

PLASMA ETCHING METHOD

SUBSTRATE CLEANING APPARATUS AND VACUUM PROCESSING SYSTEM

SUBSTRATE PROCESSING APPARATUS AND SIDE WALL COMPONENT

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS