Akiteru Ko

Person

Schenectady, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for pitch split patterning using sidewall image transfer
- Patent number 11,676,817
- Issue date Jun 13, 2023
- Tokyo Electron Limited
- Akiteru Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for capping of cores for self-aligned multiple pa...
- Patent number 11,651,965
- Issue date May 16, 2023
- Tokyo Electron Limited
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface fluorination remediation for aluminium oxide electrostatic...
- Patent number 11,626,271
- Issue date Apr 11, 2023
- Tokyo Electron Limited
- Scott Lefevre
- B08 - CLEANING
Information Patent Grant
Methods to reduce microbridge defects in EUV patterning for microel...
- Patent number 11,615,958
- Issue date Mar 28, 2023
- Tokyo Electron Limited
- Akiteru Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for EUV inverse patterning in processing of microelectronic...
- Patent number 11,557,479
- Issue date Jan 17, 2023
- Tokyo Electron Limited
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to reshape spacer profiles in self-aligned multiple patterning
- Patent number 11,551,930
- Issue date Jan 10, 2023
- Tokyo Electron Limited
- Akiteru Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of line roughness improvement by plasma selective deposition
- Patent number 11,537,049
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Toshiharu Wada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing method using multiline patterning
- Patent number 11,515,160
- Issue date Nov 29, 2022
- Tokyo Electron Limited
- Akiteru Ko
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Forming a semiconductor feature using atomic layer etch
- Patent number 11,424,123
- Issue date Aug 23, 2022
- Tokyo Electron Limited
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple patterning processes
- Patent number 11,417,526
- Issue date Aug 16, 2022
- Tokyo Electron Limited
- David L. O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and process using dual memorization layer for multi-color sp...
- Patent number 11,380,579
- Issue date Jul 5, 2022
- Tokyo Electron Limited
- Hirokazu Aizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment method to improve photo resist roughness and remov...
- Patent number 11,372,332
- Issue date Jun 28, 2022
- Tokyo Electron Limited
- Wan Jae Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and process for forming memory hole patterns
- Patent number 11,049,721
- Issue date Jun 29, 2021
- Tokyo Electron Limited
- Toshiharu Wada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to reduce gouging for core removal processes using thermal...
- Patent number 10,978,300
- Issue date Apr 13, 2021
- Tokyo Electron Limited
- Yuki Kikuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to reshape spacers for multi-patterning processes using the...
- Patent number 10,950,442
- Issue date Mar 16, 2021
- Tokyo Electron Limited
- Yuki Kikuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to transfer patterns to a layer
- Patent number 10,916,428
- Issue date Feb 9, 2021
- Tokyo Electron Limited
- Yuki Kikuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of patterning low-k materials using thermal decomposition ma...
- Patent number 10,861,739
- Issue date Dec 8, 2020
- Tokyo Electron Limited
- Yuki Kikuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of line cut by multi-color patterning technique
- Patent number 10,790,154
- Issue date Sep 29, 2020
- Tokyo Electron Limited
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing methods to apply stress engineering to self-aligned m...
- Patent number 10,734,228
- Issue date Aug 4, 2020
- Tokyo Electron Limited
- Eric Chih-Fang Liu
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
In-situ spacer reshaping for self-aligned multi-patterning methods...
- Patent number 10,453,686
- Issue date Oct 22, 2019
- Tokyo Electron Limited
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organic mandrel protection process
- Patent number 10,354,873
- Issue date Jul 16, 2019
- Tokyo Electron Limited
- Akiteru Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching high-K dielectric using pulsed bias power
- Patent number 10,290,506
- Issue date May 14, 2019
- Tokyo Electron Limited
- Alok Ranjan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for sculpting spacer sidewall mask
- Patent number 10,260,150
- Issue date Apr 16, 2019
- Tokyo Electron Limited
- Vinh Luong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wrap-around contact integration scheme
- Patent number 10,217,670
- Issue date Feb 26, 2019
- Tokyo Electron Limited
- Kandabara N. Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spacer formation for self-aligned multi-patterning technique
- Patent number 10,170,329
- Issue date Jan 1, 2019
- Tokyo Electron Limited
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trim method for patterning during various stages of an integration...
- Patent number 10,049,875
- Issue date Aug 14, 2018
- Tokyo Electron Limited
- Angelique Raley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment method to meet line edge roughness and other integ...
- Patent number 9,978,563
- Issue date May 22, 2018
- Tokyo Electron Limited
- Vinh Luong
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Trimming inorganic resists with selected etchant gas mixture and mo...
- Patent number 9,899,219
- Issue date Feb 20, 2018
- Tokyo Electron Limited
- Vinh Luong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for modifying spacer profile
- Patent number 9,812,325
- Issue date Nov 7, 2017
- Nihar Mohanty
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method for increasing pattern density in self-aligned patterning sc...
- Patent number 9,786,503
- Issue date Oct 10, 2017
- Tokyo Electron Limited
- Angelique D. Raley
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Cyclic Method for Reactive Development of Photoresists
- Publication number 20240053684
- Publication date Feb 15, 2024
- TOKYO ELECTRON LIMITED
- Hamed Hajibabaeinajafabadi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metal Oxide Resists for EUV Patterning and Methods for Developing t...
- Publication number 20240045337
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Hamed Hajibabaeinajafabadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Acid for Reactive Development of Metal Oxide Resists
- Publication number 20240027900
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Hamed Hajibabaeinajafabadi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Oblique Deposition and Etch Processes
- Publication number 20220392771
- Publication date Dec 8, 2022
- TOKYO ELECTRON LIMITED
- Akiteru Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PITCH SPLIT PATTERNING USING SIDEWALL IMAGE TRANSFER
- Publication number 20210407804
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Akiteru Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface Fluorination Remediation For Aluminium Oxide Electrostatic...
- Publication number 20210398784
- Publication date Dec 23, 2021
- TOKYO ELECTRON LIMITED
- Scott Lefevre
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Process Using Dual Memorization Layer for Multi-Color Sp...
- Publication number 20210343586
- Publication date Nov 4, 2021
- TOKYO ELECTRON LIMITED
- Hirokazu Aizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO REDUCE MICROBRIDGE DEFECTS IN EUV PATTERNING FOR MICROEL...
- Publication number 20210305048
- Publication date Sep 30, 2021
- TOKYO ELECTRON LIMITED
- Akiteru Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR EUV INVERSE PATTERNING IN PROCESSING OF MICROELECTRONIC...
- Publication number 20210296125
- Publication date Sep 23, 2021
- TOKYO ELECTRON LIMITED
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING A SEMICONDUCTOR FEATURE USING ATOMIC LAYER ETCH
- Publication number 20210265164
- Publication date Aug 26, 2021
- TOKYO ELECTRON LIMITED
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multiple Patterning Processes
- Publication number 20210242020
- Publication date Aug 5, 2021
- TOKYO ELECTRON LIMITED
- David L. O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR CAPPING OF CORES FOR SELF-ALIGNED MULTIPLE PA...
- Publication number 20210050214
- Publication date Feb 18, 2021
- TOKYO ELECTRON LIMITED
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Process for Forming Memory Hole Patterns
- Publication number 20210035981
- Publication date Feb 4, 2021
- TOKYO ELECTRON LIMITED
- Toshiharu Wada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD USING MULTILINE PATTERNING
- Publication number 20200328082
- Publication date Oct 15, 2020
- TOKYO ELECTRON LIMITED
- Akiteru Ko
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of Line Roughness Improvement by Plasma Selective Deposition
- Publication number 20200272054
- Publication date Aug 27, 2020
- TOKYO ELECTRON LIMITED
- Toshiharu Wada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS TO RESHAPE SPACER PROFILES IN SELF-ALIGNED MULTIPLE PATTERNING
- Publication number 20200194261
- Publication date Jun 18, 2020
- TOKYO ELECTRON LIMITED
- Akiteru Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Treatment Method to Improve Photo Resist Roughness and Remov...
- Publication number 20200133133
- Publication date Apr 30, 2020
- TOKYO ELECTRON LIMITED
- Wan Jae Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS TO REDUCE GOUGING FOR CORE REMOVAL PROCESSES USING THERMAL...
- Publication number 20200020523
- Publication date Jan 16, 2020
- TOKYO ELECTRON LIMITED
- Yuki Kikuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO TRANSFER PATTERNS TO A LAYER
- Publication number 20200020534
- Publication date Jan 16, 2020
- TOKYO ELECTRON LIMITED
- Yuki Kikuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTIVE LAYER FOR CHUCKS DURING PLASMA PROCESSING TO REDUCE PART...
- Publication number 20200013590
- Publication date Jan 9, 2020
- TOKYO ELECTRON LIMITED
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO RESHAPE SPACERS FOR MULTI-PATTERNING PROCESSES USING THE...
- Publication number 20200013619
- Publication date Jan 9, 2020
- TOKYO ELECTRON LIMITED
- Yuki Kikuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method Utilizing Thermal Decomposition Material To Relax Queue Time...
- Publication number 20190393084
- Publication date Dec 26, 2019
- TOKYO ELECTRON LIMITED
- Yuki Kikuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Patterning Low-K Materials Using Thermal Decomposition Ma...
- Publication number 20190385903
- Publication date Dec 19, 2019
- TOKYO ELECTRON LIMITED
- Yuki Kikuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF LINE CUT BY MULTI-COLOR PATTERNING TECHNIQUE
- Publication number 20190244826
- Publication date Aug 8, 2019
- TOKYO ELECTRON LIMITED
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHODS TO APPLY STRESS ENGINEERING TO SELF-ALIGNED M...
- Publication number 20190189445
- Publication date Jun 20, 2019
- TOKYO ELECTRON LIMITED
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR SCULPTING SPACER SIDEWALL MASK
- Publication number 20180187308
- Publication date Jul 5, 2018
- TOKYO ELECTRON LIMITED
- Vinh Luong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPACER FORMATION FOR SELF-ALIGNED MULTI-PATTERNING TECHNIQUE
- Publication number 20180082851
- Publication date Mar 22, 2018
- TOKYO ELECTRON LIMITED
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WRAP-AROUND CONTACT INTEGRATION SCHEME
- Publication number 20180068899
- Publication date Mar 8, 2018
- TOKYO ELECTRON LIMITED
- Kandabara N. Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU SPACER RESHAPING FOR SELF-ALIGNED MULTI-PATTERNING METHODS...
- Publication number 20180061640
- Publication date Mar 1, 2018
- TOKYO ELECTRON LIMITED
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Organic Mandrel Protection Process
- Publication number 20170358450
- Publication date Dec 14, 2017
- TOKYO ELECTRON LIMITED
- Akiteru Ko
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Method for pitch split patterning using sidewall image transfer

Method and system for capping of cores for self-aligned multiple pa...

Surface fluorination remediation for aluminium oxide electrostatic...

Methods to reduce microbridge defects in EUV patterning for microel...

Methods for EUV inverse patterning in processing of microelectronic...

Methods to reshape spacer profiles in self-aligned multiple patterning

Method of line roughness improvement by plasma selective deposition

Substrate processing method using multiline patterning

Forming a semiconductor feature using atomic layer etch

Multiple patterning processes

Method and process using dual memorization layer for multi-color sp...

Plasma treatment method to improve photo resist roughness and remov...

Method and process for forming memory hole patterns

Methods to reduce gouging for core removal processes using thermal...

Methods to reshape spacers for multi-patterning processes using the...

Method to transfer patterns to a layer

Method of patterning low-k materials using thermal decomposition ma...

Method of line cut by multi-color patterning technique

Manufacturing methods to apply stress engineering to self-aligned m...

In-situ spacer reshaping for self-aligned multi-patterning methods...

Organic mandrel protection process

Method for etching high-K dielectric using pulsed bias power

Method and system for sculpting spacer sidewall mask

Wrap-around contact integration scheme

Spacer formation for self-aligned multi-patterning technique

Trim method for patterning during various stages of an integration...

Plasma treatment method to meet line edge roughness and other integ...

Trimming inorganic resists with selected etchant gas mixture and mo...

Method for modifying spacer profile

Method for increasing pattern density in self-aligned patterning sc...

Patents Applicationslast 30 patents

Cyclic Method for Reactive Development of Photoresists

Metal Oxide Resists for EUV Patterning and Methods for Developing t...

Acid for Reactive Development of Metal Oxide Resists

Oblique Deposition and Etch Processes

METHOD FOR PITCH SPLIT PATTERNING USING SIDEWALL IMAGE TRANSFER

Surface Fluorination Remediation For Aluminium Oxide Electrostatic...

Method and Process Using Dual Memorization Layer for Multi-Color Sp...

METHODS TO REDUCE MICROBRIDGE DEFECTS IN EUV PATTERNING FOR MICROEL...

METHODS FOR EUV INVERSE PATTERNING IN PROCESSING OF MICROELECTRONIC...

FORMING A SEMICONDUCTOR FEATURE USING ATOMIC LAYER ETCH

Multiple Patterning Processes

METHOD AND SYSTEM FOR CAPPING OF CORES FOR SELF-ALIGNED MULTIPLE PA...

Method and Process for Forming Memory Hole Patterns

SUBSTRATE PROCESSING METHOD USING MULTILINE PATTERNING

Method of Line Roughness Improvement by Plasma Selective Deposition

METHODS TO RESHAPE SPACER PROFILES IN SELF-ALIGNED MULTIPLE PATTERNING

Plasma Treatment Method to Improve Photo Resist Roughness and Remov...

METHODS TO REDUCE GOUGING FOR CORE REMOVAL PROCESSES USING THERMAL...

METHOD TO TRANSFER PATTERNS TO A LAYER

PROTECTIVE LAYER FOR CHUCKS DURING PLASMA PROCESSING TO REDUCE PART...

METHODS TO RESHAPE SPACERS FOR MULTI-PATTERNING PROCESSES USING THE...

Method Utilizing Thermal Decomposition Material To Relax Queue Time...

Method of Patterning Low-K Materials Using Thermal Decomposition Ma...

METHOD OF LINE CUT BY MULTI-COLOR PATTERNING TECHNIQUE

MANUFACTURING METHODS TO APPLY STRESS ENGINEERING TO SELF-ALIGNED M...

METHOD AND SYSTEM FOR SCULPTING SPACER SIDEWALL MASK

SPACER FORMATION FOR SELF-ALIGNED MULTI-PATTERNING TECHNIQUE

WRAP-AROUND CONTACT INTEGRATION SCHEME

IN-SITU SPACER RESHAPING FOR SELF-ALIGNED MULTI-PATTERNING METHODS...

Organic Mandrel Protection Process