Akitoshi Harada

Person

Nirasaki-Shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of controlling temperature and plasma processing apparatus
- Patent number 10,217,616
- Issue date Feb 26, 2019
- Tokyo Electron Limited
- Akitoshi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 10,192,719
- Issue date Jan 29, 2019
- Tokyo Electron Limited
- Takamitsu Takayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,953,862
- Issue date Apr 24, 2018
- Tokyo Electron Limited
- Akitoshi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,460,896
- Issue date Oct 4, 2016
- Tokyo Electron Limited
- Akitoshi Harada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,330,891
- Issue date May 3, 2016
- Tokyo Electron Limited
- Ryo Nonaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,209,041
- Issue date Dec 8, 2015
- Tokyo Electron Limited
- Akitoshi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 7,125,806
- Issue date Oct 24, 2006
- Tokyo Electron Limited
- Akitoshi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 7,119,011
- Issue date Oct 10, 2006
- Tokyo Electron Limited
- Akitoshi Harada
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20160315005
- Publication date Oct 27, 2016
- TOKYO ELECTRON LIMITED
- Akitoshi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20160196957
- Publication date Jul 7, 2016
- TOKYO ELECTRON LIMITED
- Takamitsu TAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD FOR PLASMA PROCESSING APPARATUS
- Publication number 20150243489
- Publication date Aug 27, 2015
- TOKYO ELECTRON LIMITED
- Hiroshi Uda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150228458
- Publication date Aug 13, 2015
- TOKYO ELECTRON LIMITED
- Akitoshi Harada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150221522
- Publication date Aug 6, 2015
- Tokyo Electron Limited
- Akitoshi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BACKFLOW PREVENTING PART AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20150170891
- Publication date Jun 18, 2015
- TOKYO ELECTRON LIMITED
- Masanori TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150114930
- Publication date Apr 30, 2015
- TOKYO ELECTRON LIMITED
- Ryo NONAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF CONTROLLING TEMPERATURE AND PLASMA PROCESSING APPARATUS
- Publication number 20150004794
- Publication date Jan 1, 2015
- TOKYO ELECTRON LIMITED
- Akitoshi HARADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20140373867
- Publication date Dec 25, 2014
- Akitoshi HARADA
- B08 - CLEANING
Information Patent Application
Semiconductor device and manufacturing method thereof
- Publication number 20040256726
- Publication date Dec 23, 2004
- Akitoshi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching method
- Publication number 20040209469
- Publication date Oct 21, 2004
- Akitoshi Harada
- H01 - BASIC ELECTRIC ELEMENTS

Akitoshi Harada

Person

Patents Grantslast 30 patents

Method of controlling temperature and plasma processing apparatus

Plasma processing method

Plasma processing method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Etching method

Semiconductor device and manufacturing method thereof

Patents Applicationslast 30 patents

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD

CLEANING METHOD FOR PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PARTICLE BACKFLOW PREVENTING PART AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

METHOD OF CONTROLLING TEMPERATURE AND PLASMA PROCESSING APPARATUS

CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS

Semiconductor device and manufacturing method thereof

Etching method