Akiya KAWAUE

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Chemically amplified photosensitive composition, photosensitive dry...
- Patent number 11,474,432
- Issue date Oct 18, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified positive-type photosensitive resin composition...
- Patent number 11,131,927
- Issue date Sep 28, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical amplification type positive photosensitive resin compositi...
- Patent number 11,061,326
- Issue date Jul 13, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified positive-type photosensitive resin composition...
- Patent number 11,022,880
- Issue date Jun 1, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of producing structure containing phase-separated structure
- Patent number 10,995,234
- Issue date May 4, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Brush composition, and method of producing structure containing pha...
- Patent number 10,676,636
- Issue date Jun 9, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Resin composition for forming a phase-separated structure, and meth...
- Patent number 10,179,866
- Issue date Jan 15, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for manufacturing polymer compound
- Patent number 10,100,134
- Issue date Oct 16, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin composition for forming a phase-separated structure, and meth...
- Patent number 9,914,847
- Issue date Mar 13, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resin composition for forming a phase-separated structure, and meth...
- Patent number 9,828,519
- Issue date Nov 28, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Brush composition, and method of producing structure containing pha...
- Patent number 9,776,208
- Issue date Oct 3, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Yahagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, compound, polymeric compound and method of form...
- Patent number 9,244,347
- Issue date Jan 26, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,164,380
- Issue date Oct 20, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern and compound
- Patent number 9,063,416
- Issue date Jun 23, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and resist pattern forming method
- Patent number 9,052,592
- Issue date Jun 9, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern and compound
- Patent number 9,040,224
- Issue date May 26, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 9,023,581
- Issue date May 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 9,017,919
- Issue date Apr 28, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 9,012,129
- Issue date Apr 21, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, polymeric compound, acid generator, resist composition, a...
- Patent number 9,005,874
- Issue date Apr 14, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, and new compound
- Patent number 8,846,291
- Issue date Sep 30, 2014
- Tokyo Ohka Kogyo Co. Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 8,808,959
- Issue date Aug 19, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 8,703,387
- Issue date Apr 22, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, compound and...
- Patent number 8,541,157
- Issue date Sep 24, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 8,415,085
- Issue date Apr 9, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 8,367,297
- Issue date Feb 5, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, compound and...
- Patent number 8,367,299
- Issue date Feb 5, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 8,338,076
- Issue date Dec 25, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound and method of producing same, acid generator, resist compo...
- Patent number 8,252,505
- Issue date Aug 28, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, and novel com...
- Patent number 8,247,160
- Issue date Aug 21, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
CHEMICALLY AMPLIFIED PHOTOSENTIVE COMPOSITION, PHOTOSENSITIVE DRY F...
- Publication number 20230273521
- Publication date Aug 31, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Daisuke OJIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, PHOT...
- Publication number 20230106185
- Publication date Apr 6, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo MASUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION...
- Publication number 20230102353
- Publication date Mar 30, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Yusuke KISHIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION...
- Publication number 20220283500
- Publication date Sep 8, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya KAWAUE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY...
- Publication number 20200209739
- Publication date Jul 2, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya KAWAUE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION...
- Publication number 20200142307
- Publication date May 7, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Aya MOMOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION...
- Publication number 20190346765
- Publication date Nov 14, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya KAWAUE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE
- Publication number 20190276698
- Publication date Sep 12, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro DAZAI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION...
- Publication number 20190121233
- Publication date Apr 25, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya KAWAUE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTOSENSITIVE RESIN COMPOSITI...
- Publication number 20190101825
- Publication date Apr 4, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya KAWAUE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
BRUSH COMPOSITION, AND METHOD OF PRODUCING STRUCTURE CONTAINING PHA...
- Publication number 20180273794
- Publication date Sep 27, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya KAWAUE
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
RESIN COMPOSITION FOR FORMING A PHASE-SEPARATED STRUCTURE, AND METH...
- Publication number 20170362460
- Publication date Dec 21, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya KAWAUE
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
RESIN COMPOSITION FOR FORMING A PHASE-SEPARATED STRUCTURE, AND METH...
- Publication number 20170240766
- Publication date Aug 24, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya KAWAUE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIN COMPOSITION FOR FORMING A PHASE-SEPARATED STRUCTURE, AND METH...
- Publication number 20170240767
- Publication date Aug 24, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya KAWAUE
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD FOR MANUFACTURING POLYMER COMPOUND
- Publication number 20170166664
- Publication date Jun 15, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
BRUSH COMPOSITION, AND METHOD OF PRODUCING STRUCTURE CONTAINING PHA...
- Publication number 20160194751
- Publication date Jul 7, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito YAHAGI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...
- Publication number 20150111155
- Publication date Apr 23, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORM...
- Publication number 20140356787
- Publication date Dec 4, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20140287360
- Publication date Sep 25, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND
- Publication number 20140178821
- Publication date Jun 26, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20140120472
- Publication date May 1, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...
- Publication number 20130260314
- Publication date Oct 3, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130189619
- Publication date Jul 25, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND
- Publication number 20130157197
- Publication date Jun 20, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20130089819
- Publication date Apr 11, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130065180
- Publication date Mar 14, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Kurosawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20120301829
- Publication date Nov 29, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION, A...
- Publication number 20120270155
- Publication date Oct 25, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20120264061
- Publication date Oct 18, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND
- Publication number 20120148955
- Publication date Jun 14, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY

Akiya KAWAUE

Person

Patents Grantslast 30 patents

Chemically amplified photosensitive composition, photosensitive dry...

Chemically amplified positive-type photosensitive resin composition...

Chemical amplification type positive photosensitive resin compositi...

Chemically amplified positive-type photosensitive resin composition...

Method of producing structure containing phase-separated structure

Brush composition, and method of producing structure containing pha...

Resin composition for forming a phase-separated structure, and meth...

Method for manufacturing polymer compound

Resin composition for forming a phase-separated structure, and meth...

Resin composition for forming a phase-separated structure, and meth...

Brush composition, and method of producing structure containing pha...

Resist composition, compound, polymeric compound and method of form...

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern and compound

Resist composition and resist pattern forming method

Resist composition, method of forming resist pattern and compound

Resist composition, method of forming resist pattern, polymeric com...

Resist composition, method of forming resist pattern, novel compoun...

Resist composition, method of forming resist pattern, novel compoun...

Compound, polymeric compound, acid generator, resist composition, a...

Resist composition, method of forming resist pattern, and new compound

Resist composition, method of forming resist pattern, novel compoun...

Resist composition, method of forming resist pattern, novel compoun...

Resist composition, method of forming resist pattern, compound and...

Resist composition, method of forming resist pattern, novel compoun...

Resist composition, method of forming resist pattern, novel compoun...

Resist composition, method of forming resist pattern, compound and...

Resist composition, method of forming resist pattern, novel compoun...

Compound and method of producing same, acid generator, resist compo...

Resist composition, method of forming resist pattern, and novel com...

Patents Applicationslast 30 patents

CHEMICALLY AMPLIFIED PHOTOSENTIVE COMPOSITION, PHOTOSENSITIVE DRY F...

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, PHOT...

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION...

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION...

CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY...

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION...

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION...

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION...

CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTOSENSITIVE RESIN COMPOSITI...

BRUSH COMPOSITION, AND METHOD OF PRODUCING STRUCTURE CONTAINING PHA...

RESIN COMPOSITION FOR FORMING A PHASE-SEPARATED STRUCTURE, AND METH...

RESIN COMPOSITION FOR FORMING A PHASE-SEPARATED STRUCTURE, AND METH...

RESIN COMPOSITION FOR FORMING A PHASE-SEPARATED STRUCTURE, AND METH...

METHOD FOR MANUFACTURING POLYMER COMPOUND

BRUSH COMPOSITION, AND METHOD OF PRODUCING STRUCTURE CONTAINING PHA...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...

RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORM...

RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION, A...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND