Membership
Tour
Register
Log in
Akiyoshi GOTO
Follow
Person
Haibara-gun, JP
People
Overview
Industries
Organizations
People
Information
Impact
Patents Grants
last 30 patents
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
12,001,140
Issue date
Jun 4, 2024
FUJIFILM Corporation
Kazunari Yagi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
11,886,113
Issue date
Jan 30, 2024
FUJIFILM Corporation
Keita Kato
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
Patent number
11,584,810
Issue date
Feb 21, 2023
FUJIFILM Corporation
Akira Takada
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
11,579,528
Issue date
Feb 14, 2023
FUJIFILM Corporation
Ryo Nishio
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Composition for forming upper layer film, pattern forming method, r...
Patent number
11,281,103
Issue date
Mar 22, 2022
FUJIFILM Corporation
Naoya Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Pattern forming method, method for manufacturing electronic device,...
Patent number
11,249,395
Issue date
Feb 15, 2022
FUJIFILM Corporation
Naoki Inoue
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
11,156,917
Issue date
Oct 26, 2021
FUJIFILM Corporation
Kyohei Sakita
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Pattern forming method, method for manufacturing electronic device,...
Patent number
11,150,557
Issue date
Oct 19, 2021
FUJIFILM Corporation
Naoya Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Actinic ray-sensitive or radiation sensitive resin composition, act...
Patent number
11,073,762
Issue date
Jul 27, 2021
FUJIFILM Corporation
Daisuke Asakawa
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
11,067,890
Issue date
Jul 20, 2021
FUJIFILM Corporation
Akiyoshi Goto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Pattern forming method, method for producing electronic device, and...
Patent number
10,859,914
Issue date
Dec 8, 2020
FUJIFILM Corporation
Naoya Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Pattern forming method, resist pattern, method for manufacturing el...
Patent number
10,852,637
Issue date
Dec 1, 2020
FUJIFILM Corporation
Naoki Inoue
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
10,802,399
Issue date
Oct 13, 2020
FUJIFILM Corporation
Ryo Nishio
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
10,761,424
Issue date
Sep 1, 2020
FUJIFILM Corporation
Ryo Nishio
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Pattern forming method, resist pattern, and process for producing e...
Patent number
10,578,968
Issue date
Mar 3, 2020
FUJIFILM Corporation
Kei Yamamoto
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Pattern forming method, treating agent, electronic device, and meth...
Patent number
10,303,058
Issue date
May 28, 2019
FUJIFILM Corporation
Hajime Furutani
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Active-light-sensitive or radiation-sensitive resin composition, ac...
Patent number
10,261,417
Issue date
Apr 16, 2019
FUJIFILM Corporation
Akiyoshi Goto
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...
Patent number
10,234,759
Issue date
Mar 19, 2019
Fujifilm Corporation
Takeshi Kawabata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Pattern forming method, composition for forming protective film, me...
Patent number
10,175,578
Issue date
Jan 8, 2019
Fujifilm Corporation
Naoki Inoue
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Pattern forming method, resist pattern, and method for manufacturin...
Patent number
10,114,292
Issue date
Oct 30, 2018
FUJIFILM Corporation
Naoki Inoue
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Active-light-sensitive or radiation-sensitive resin composition, pa...
Patent number
10,025,186
Issue date
Jul 17, 2018
FUJIFILM Corporation
Akiyoshi Goto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Active-light-sensitive or radiation-sensitive resin composition, pa...
Patent number
10,018,913
Issue date
Jul 10, 2018
FUJIFILM Corporation
Akiyoshi Goto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Active-light-sensitive or radiation-sensitive resin composition, pa...
Patent number
9,996,003
Issue date
Jun 12, 2018
FUJIFILM Corporation
Akiyoshi Goto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
Patent number
9,952,509
Issue date
Apr 24, 2018
FUJIFILM Corporation
Keita Kato
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, pat...
Patent number
9,841,679
Issue date
Dec 12, 2017
FUJIFILM Corporation
Masafumi Kojima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Active light sensitive or radiation sensitive resin composition, pa...
Patent number
9,791,777
Issue date
Oct 17, 2017
FUJIFILM Corporation
Akiyoshi Goto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of forming pattern, actinic-ray- or radiation-sensitive resi...
Patent number
9,551,931
Issue date
Jan 24, 2017
FUJIFILM Corporation
Junichi Ito
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Pattern forming method, method for manufacturing electronic device,...
Patent number
9,405,197
Issue date
Aug 2, 2016
FUJIFILM Corporation
Akinori Shibuya
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Pattern forming method and actinic ray-sensitive or radiation-sensi...
Patent number
9,250,519
Issue date
Feb 2, 2016
FUJIFILM Corporation
Shohei Kataoka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Dye compound, method of producing dipyrromethene metal complex comp...
Patent number
9,116,426
Issue date
Aug 25, 2015
FUJIFILM Corporation
Kyohei Arayama
C07 - ORGANIC CHEMISTRY
Patents Applications
last 30 patents
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20240192598
Publication date
Jun 13, 2024
FUJIFILM CORPORATION
Akiyoshi GOTO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, ACT...
Publication number
20240176242
Publication date
May 30, 2024
FUJIFILM CORPORATION
Michihiro SHIRAKAWA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20240061331
Publication date
Feb 22, 2024
FUJIFILM CORPORATION
Yosuke BEKKI
C07 - ORGANIC CHEMISTRY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
Publication number
20240004293
Publication date
Jan 4, 2024
FUJIFILM CORPORATION
Naoya HATAKEYAMA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
Publication number
20230400769
Publication date
Dec 14, 2023
FUJIFILM CORPORATION
Naoya HATAKEYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
Publication number
20230375925
Publication date
Nov 23, 2023
FUJIFILM CORPORATION
Tsutomu YOSHIMURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
Publication number
20230367210
Publication date
Nov 16, 2023
FUJIFILM CORPORATION
Tsutomu YOSHIMURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20230259029
Publication date
Aug 17, 2023
FUJIFILM CORPORATION
Yuta OKUAKI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20230236502
Publication date
Jul 27, 2023
FUJIFILM CORPORATION
Masafumi KOJIMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20230221640
Publication date
Jul 13, 2023
FUJIFILM CORPORATION
Tsutomu YOSHIMURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20230185192
Publication date
Jun 15, 2023
FUJIFILM CORPORATION
Akiyoshi GOTO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20230168581
Publication date
Jun 1, 2023
FUJIFILM CORPORATION
Michihiro SHIRAKAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
Publication number
20230148344
Publication date
May 11, 2023
FUJIFILM CORPORATION
Akiyoshi GOTO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20230139891
Publication date
May 4, 2023
FUJIFILM CORPORATION
Masafumi Kojima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR PRODUCING RESIST COMPOSITION AND PATTERN FORMING METHOD
Publication number
20230045851
Publication date
Feb 16, 2023
FUJIFILM CORPORATION
Naohiro TANGO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
Publication number
20230043143
Publication date
Feb 9, 2023
FUJIFILM CORPORATION
Aina USHIYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
Publication number
20230004086
Publication date
Jan 5, 2023
FUJIFILM CORPORATION
Tsutomu Yoshimura
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POSITIVE TONE RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METH...
Publication number
20220382153
Publication date
Dec 1, 2022
FUJIFILM CORPORATION
Akira TAKADA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
Publication number
20220334476
Publication date
Oct 20, 2022
FUJIFILM CORPORATION
Masafumi KOJIMA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RE...
Publication number
20220179307
Publication date
Jun 9, 2022
FUJIFILM CORPORATION
Akira TAKADA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
Publication number
20220082938
Publication date
Mar 17, 2022
FUJIFILM CORPORATION
Aina USHIYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20220043347
Publication date
Feb 10, 2022
FUJIFILM CORPORATION
Akira TAKADA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20210364917
Publication date
Nov 25, 2021
FUJIFILM CORPORATION
Minoru UEMURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD FOR PRODUCING SALT
Publication number
20210355082
Publication date
Nov 18, 2021
FUJIFILM CORPORATION
Ryo MINAMIKAWA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20210356862
Publication date
Nov 18, 2021
FUJIFILM CORPORATION
Masafumi KOJIMA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20210318616
Publication date
Oct 14, 2021
FUJIFILM CORPORATION
Daisuke ASAKAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20210294217
Publication date
Sep 23, 2021
FUJIFILM CORPORATION
Akiyoshi Goto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20210286264
Publication date
Sep 16, 2021
FUJIFILM CORPORATION
Akihiro Kaneko
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESI...
Publication number
20210286263
Publication date
Sep 16, 2021
FUJIFILM CORPORATION
Naohiro TANGO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20210271162
Publication date
Sep 2, 2021
FUJIFILM CORPORATION
Keiyu OU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY