Aksel Goehnermeier

Person

Essingen-Lauterburg, DE

People

Patents Grantslast 30 patents

Information Patent Grant
System and method for optical object coordinate determination
- Patent number 11,933,597
- Issue date Mar 19, 2024
- Carl Zeiss Industrielle Messtechnik GmbH
- Aksel Goehnermeier
- G01 - MEASURING TESTING
Information Patent Grant
Probing element and coordinate measuring machine for measuring at l...
- Patent number 10,495,441
- Issue date Dec 3, 2019
- Carl Zeiss Industrielle Messtechnik GmbH
- Aksel Goehnermeier
- G01 - MEASURING TESTING
Information Patent Grant
Device for optical examination of a specimen, method for examining...
- Patent number 10,345,570
- Issue date Jul 9, 2019
- Carl Zeiss Microscopy GmbH
- Wolfgang Singer
- G02 - OPTICS
Information Patent Grant
Coordinate measuring machine having an improved optical sensing sys...
- Patent number 10,309,765
- Issue date Jun 4, 2019
- Carl Zeiss Industrielle Messtechnik GmbH
- Dominik Seitz
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Projection exposure tool for microlithography and method for microl...
- Patent number 10,303,068
- Issue date May 28, 2019
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Grant
Multilayer mirror
- Patent number 10,209,411
- Issue date Feb 19, 2019
- Carl Zeiss SMT GmbH
- Aksel Goehnermeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and measuring machine for determining dimensional properties...
- Patent number 9,826,201
- Issue date Nov 21, 2017
- Carl Zeiss Industrielle Messtechnik GmbH
- Aksel Goehnermeier
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Projection exposure tool for microlithography and method for microl...
- Patent number 9,709,902
- Issue date Jul 18, 2017
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of lithographically transferring a pattern on a light sensit...
- Patent number 9,581,910
- Issue date Feb 28, 2017
- Carl Zeiss SMT GmbH
- Frank Schlesener
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure tool for microlithography and method for microl...
- Patent number 9,442,393
- Issue date Sep 13, 2016
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Grant
Measuring apparatus and method for determining dimensional characte...
- Patent number 9,383,190
- Issue date Jul 5, 2016
- Carl Zeiss Industrielle Messtechnik GmbH
- David Shafer
- G01 - MEASURING TESTING
Information Patent Grant
Projection exposure apparatus for EUV microlithography and method f...
- Patent number 9,298,097
- Issue date Mar 29, 2016
- Carl Zeiss SMT GmbH
- Marc Bienert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure method and projection exposure system therefor
- Patent number 9,110,383
- Issue date Aug 18, 2015
- Carl Zeiss SMT GmbH
- Aksel Goehnermeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective for microlithography with stray light compensa...
- Patent number 9,063,439
- Issue date Jun 23, 2015
- Carl Zeiss SMT GmbH
- Aksel Goehnermeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure tool for microlithography and method for microl...
- Patent number 9,046,792
- Issue date Jun 2, 2015
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Grant
Method of structuring a photosensitive material
- Patent number 9,025,137
- Issue date May 5, 2015
- Carl Zeiss SMT GmbH
- Aksel Goehnermeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 8,982,325
- Issue date Mar 17, 2015
- Carl Zeiss SMT GmbH
- Michael Totzeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic exposure method as well as a projection exposure...
- Patent number 8,767,181
- Issue date Jul 1, 2014
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system with an exchangeable, manipulable correction arrange...
- Patent number 8,659,745
- Issue date Feb 25, 2014
- Carl Zeiss SMT GmbH
- Guido Limbach
- G02 - OPTICS
Information Patent Grant
Method of manufacturing a miniaturized device
- Patent number 8,542,342
- Issue date Sep 24, 2013
- Carl Zeiss SMT GmbH
- Markus Schwab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system with an exchangeable, manipulable correction arrange...
- Patent number 8,542,346
- Issue date Sep 24, 2013
- Carl Zeiss SMT GmbH
- Guido Limbach
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective with tilted deflecting mirrors, p...
- Patent number 8,411,356
- Issue date Apr 2, 2013
- Carl Zeiss SMT GmbH
- Ralf Mueller
- G02 - OPTICS
Information Patent Grant
Method of structuring a photosensitive material
- Patent number 8,358,402
- Issue date Jan 22, 2013
- Carl Zeiss SMT GmbH
- Aksel Goehnermeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Off-axis objectives with rotatable optical element
- Patent number 8,339,575
- Issue date Dec 25, 2012
- Carl Zeiss SMT GmbH
- Alexandra Pazidis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical correction device
- Patent number 8,325,322
- Issue date Dec 4, 2012
- Carl Zeiss SMT GmbH
- Markus Hauf
- G02 - OPTICS
Information Patent Grant
Projection objective for microlithography, projection exposure appa...
- Patent number 8,228,483
- Issue date Jul 24, 2012
- Carl Zeiss SMT GmbH
- Ulrich Loering
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 8,107,054
- Issue date Jan 31, 2012
- Carl Zeiss SMT GmbH
- Michael Totzeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure method and projection exposure system therefor
- Patent number 8,081,295
- Issue date Dec 20, 2011
- Carl Zeiss SMT GmbH
- Aksel Goehnermeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric projection objective with tilted deflecting mirrors, p...
- Patent number 8,027,088
- Issue date Sep 27, 2011
- Carl Zeiss SMT GmbH
- Ralf Mueller
- G02 - OPTICS
Information Patent Grant
Microlithographic exposure method as well as a projection exposure...
- Patent number 7,847,921
- Issue date Dec 7, 2010
- Carl Zeiss SMT AG
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
System and Method for Optical Object Coordinate Determination
- Publication number 20210247175
- Publication date Aug 12, 2021
- Carl Zeiss Industrielle Messtechnik GmbH
- Aksel GOEHNERMEIER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROBING ELEMENT AND COORDINATE MEASURING MACHINE FOR MEASURING AT L...
- Publication number 20190107381
- Publication date Apr 11, 2019
- Carl Zeiss Industrielle Messtechnik GmbH
- Aksel Goehnermeier
- G01 - MEASURING TESTING
Information Patent Application
PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROL...
- Publication number 20170371251
- Publication date Dec 28, 2017
- Carl Zeiss SMT GMBH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Application
COORDINATE MEASURING MACHINE, METHOD FOR PRODUCING A COORDINATE MEA...
- Publication number 20170307355
- Publication date Oct 26, 2017
- Carl Zeiss Industrielle Messtechnik GmbH
- Dominik SEITZ
- G01 - MEASURING TESTING
Information Patent Application
Device for optical examination of a specimen, method for examining...
- Publication number 20170123198
- Publication date May 4, 2017
- CARL ZEISS MICROSCOPY GMBH
- Wolfgang Singer
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROL...
- Publication number 20170082931
- Publication date Mar 23, 2017
- Carl Zeiss SMT GMBH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND MEASURING MACHINE FOR DETERMINING DIMENSIONAL PROPERTIES...
- Publication number 20170032540
- Publication date Feb 2, 2017
- Carl Zeiss Industrielle Messtechnik GmbH
- Aksel GOEHNERMEIER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTILAYER MIRROR
- Publication number 20160202396
- Publication date Jul 14, 2016
- Carl Zeiss SMT GMBH
- Aksel GOEHNERMEIER
- G02 - OPTICS
Information Patent Application
MEASURING APPARATUS AND METHOD FOR DETERMINING DIMENSIONAL CHARACTE...
- Publication number 20160169660
- Publication date Jun 16, 2016
- Carl Zeiss Industrielle Messtechnik GmbH
- David SHAFER
- G01 - MEASURING TESTING
Information Patent Application
PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROL...
- Publication number 20160116851
- Publication date Apr 28, 2016
- Carl Zeiss SMT GMBH
- Jochen Hetzler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF LITHOGRAPHICALLY TRANSFERRING A PATTERN ON A LIGHT SENSIT...
- Publication number 20150301455
- Publication date Oct 22, 2015
- Carl Zeiss SMT GMBH
- Frank Schlesener
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROL...
- Publication number 20150042975
- Publication date Feb 12, 2015
- Carl Zeiss SMT GMBH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...
- Publication number 20130278911
- Publication date Oct 24, 2013
- Guido Limbach
- G02 - OPTICS
Information Patent Application
Projection Exposure Apparatus for EUV Microlithography and Method f...
- Publication number 20130250265
- Publication date Sep 26, 2013
- Carl Zeiss SMT GMBH
- Marc Bienert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection Exposure Tool for Microlithography and Method for Microl...
- Publication number 20130252146
- Publication date Sep 26, 2013
- Carl Zeiss SMT GMBH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF STRUCTURING A PHOTOSENSITIVE MATERIAL
- Publication number 20130120726
- Publication date May 16, 2013
- Carl Zeiss SMT GMBH
- Aksel Goehnermeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20120092637
- Publication date Apr 19, 2012
- Carl Zeiss SMT GMBH
- Michael Totzeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE SYSTEM THEREFOR
- Publication number 20120069318
- Publication date Mar 22, 2012
- Carl Zeiss SMT GMBH
- Aksel Goehnermeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE WITH TILTED DEFLECTING MIRRORS, P...
- Publication number 20110304926
- Publication date Dec 15, 2011
- Carl Zeiss SMT GMBH
- Ralf Mueller
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE...
- Publication number 20110069296
- Publication date Mar 24, 2011
- Carl Zeiss SMT AG
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL CORRECTION DEVICE
- Publication number 20100201958
- Publication date Aug 12, 2010
- Carl Zeiss SMT AG
- Markus Hauf
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY, PROJECTION EXPOSURE APPA...
- Publication number 20100195070
- Publication date Aug 5, 2010
- Carl Zeiss SMT AG
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF STRUCTURING A PHOTOSENSITIVE MATERIAL
- Publication number 20100149503
- Publication date Jun 17, 2010
- Carl Zeiss SMT AG
- Aksel Goehnermeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
- Publication number 20100079739
- Publication date Apr 1, 2010
- Carl Zeiss SMT AG
- Aksel Goehnermeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...
- Publication number 20090244509
- Publication date Oct 1, 2009
- Carl Zeiss SMT AG
- Guido Limbach
- G02 - OPTICS
Information Patent Application
METHOD FOR IMPROVING THE IMAGING PROPERTIES OF AN OPTICAL SYSTEM, A...
- Publication number 20090213352
- Publication date Aug 27, 2009
- Carl Zeiss SMT AG
- Aksel Goehnermeier
- G02 - OPTICS
Information Patent Application
METHOD OF MANUFACTURING A MINIATURIZED DEVICE
- Publication number 20090190116
- Publication date Jul 30, 2009
- Carl Zeiss SMT AG
- Markus Schwab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20090073398
- Publication date Mar 19, 2009
- Carl Zeiss SMT AG
- Michael Totzeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OFF-AXIS OBJECTIVES WITH ROTATABLE OPTICAL ELEMENT
- Publication number 20090073412
- Publication date Mar 19, 2009
- Carl Zeiss SMT AG
- Alexandra Pazidis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR USE IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS
- Publication number 20090059189
- Publication date Mar 5, 2009
- Carl Zeiss SMT AG
- Aksel Goehnermeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Aksel Goehnermeier

Person

Patents Grantslast 30 patents

System and method for optical object coordinate determination

Probing element and coordinate measuring machine for measuring at l...

Device for optical examination of a specimen, method for examining...

Coordinate measuring machine having an improved optical sensing sys...

Projection exposure tool for microlithography and method for microl...

Multilayer mirror

Method and measuring machine for determining dimensional properties...

Projection exposure tool for microlithography and method for microl...

Method of lithographically transferring a pattern on a light sensit...

Projection exposure tool for microlithography and method for microl...

Measuring apparatus and method for determining dimensional characte...

Projection exposure apparatus for EUV microlithography and method f...

Projection exposure method and projection exposure system therefor

Projection objective for microlithography with stray light compensa...

Projection exposure tool for microlithography and method for microl...

Method of structuring a photosensitive material

Microlithographic projection exposure apparatus

Microlithographic exposure method as well as a projection exposure...

Optical system with an exchangeable, manipulable correction arrange...

Method of manufacturing a miniaturized device

Optical system with an exchangeable, manipulable correction arrange...

Catadioptric projection objective with tilted deflecting mirrors, p...

Method of structuring a photosensitive material

Off-axis objectives with rotatable optical element

Optical correction device

Projection objective for microlithography, projection exposure appa...

Microlithographic projection exposure apparatus

Projection exposure method and projection exposure system therefor

Catadioptric projection objective with tilted deflecting mirrors, p...

Microlithographic exposure method as well as a projection exposure...

Patents Applicationslast 30 patents

System and Method for Optical Object Coordinate Determination

PROBING ELEMENT AND COORDINATE MEASURING MACHINE FOR MEASURING AT L...

PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROL...

COORDINATE MEASURING MACHINE, METHOD FOR PRODUCING A COORDINATE MEA...

Device for optical examination of a specimen, method for examining...

PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROL...

METHOD AND MEASURING MACHINE FOR DETERMINING DIMENSIONAL PROPERTIES...

MULTILAYER MIRROR

MEASURING APPARATUS AND METHOD FOR DETERMINING DIMENSIONAL CHARACTE...

PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROL...

METHOD OF LITHOGRAPHICALLY TRANSFERRING A PATTERN ON A LIGHT SENSIT...

PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROL...

OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...

Projection Exposure Apparatus for EUV Microlithography and Method f...

Projection Exposure Tool for Microlithography and Method for Microl...

METHOD OF STRUCTURING A PHOTOSENSITIVE MATERIAL

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE SYSTEM THEREFOR

CATADIOPTRIC PROJECTION OBJECTIVE WITH TILTED DEFLECTING MIRRORS, P...

MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE...

OPTICAL CORRECTION DEVICE

PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY, PROJECTION EXPOSURE APPA...

METHOD OF STRUCTURING A PHOTOSENSITIVE MATERIAL

PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY

OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...

METHOD FOR IMPROVING THE IMAGING PROPERTIES OF AN OPTICAL SYSTEM, A...

METHOD OF MANUFACTURING A MINIATURIZED DEVICE

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

OFF-AXIS OBJECTIVES WITH ROTATABLE OPTICAL ELEMENT

PELLICLE FOR USE IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS