Alan M. Schoepp

Person

Ben Lemond, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Atomic layer etch and deposition processing systems including a len...
- Patent number 11,984,330
- Issue date May 14, 2024
- Lam Research Corporation
- Dong Woo Paeng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition apparatus including an isothermal processing zone
- Patent number 10,808,317
- Issue date Oct 20, 2020
- Lam Research Corporation
- Ramesh Chandrasekharan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Configurable liquid precursor vaporizer
- Patent number 10,107,490
- Issue date Oct 23, 2018
- Lam Research Corporation
- Colin F. Smith
- F22 - STEAM GENERATION
Information Patent Grant
Modular vaporizer
- Patent number 9,982,341
- Issue date May 29, 2018
- Lam Research Corporation
- Alan M. Schoepp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate freeze dry apparatus and method
- Patent number 9,673,037
- Issue date Jun 6, 2017
- Law Research Corporation
- Stephen M. Sirard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Isotropic atomic layer etch for silicon and germanium oxides
- Patent number 9,431,268
- Issue date Aug 30, 2016
- Lam Research Corporation
- Thorsten Lill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for wafer electroless plating
- Patent number 9,287,110
- Issue date Mar 15, 2016
- Lam Research Corporation
- William Thie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controlled ambient system for interface engineering
- Patent number 9,117,860
- Issue date Aug 25, 2015
- Lam Research Corporation
- John Boyd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Configurable bevel etcher
- Patent number 9,053,925
- Issue date Jun 9, 2015
- Lam Research Corporation
- Andrew D. Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for distributing gas for a bevel etcher
- Patent number 8,940,098
- Issue date Jan 27, 2015
- Lam Research Corporation
- Greg Sexton
- B08 - CLEANING
Information Patent Grant
Delamination drying apparatus and method
- Patent number 8,898,928
- Issue date Dec 2, 2014
- Lam Research Corporation
- Stephen M. Sirard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluid handling system for wafer electroless plating and associated...
- Patent number 8,844,461
- Issue date Sep 30, 2014
- Lam Research Corporation
- William Thie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bevel etcher with vacuum chuck
- Patent number 8,721,908
- Issue date May 13, 2014
- Lam Research Corporation
- Andrew D. Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bevel etcher with vacuum chuck
- Patent number 8,580,078
- Issue date Nov 12, 2013
- Lam Research Corporation
- Andrew D. Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for wafer electroless plating
- Patent number 8,485,120
- Issue date Jul 16, 2013
- Lam Research Corporation
- William Thie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of orienting an upper electrode relative to a lower electrod...
- Patent number 8,398,875
- Issue date Mar 19, 2013
- Lam Research Corporation
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer electroless plating system and associated methods
- Patent number 8,314,027
- Issue date Nov 20, 2012
- Lam Research Corporation
- William Thie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for gate valve movement in a minimum-space wet process en...
- Patent number 8,083,207
- Issue date Dec 27, 2011
- Lam Research Corporation
- Jacob Wylie
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Wafer electroless plating system and associated methods
- Patent number 8,069,813
- Issue date Dec 6, 2011
- Lam Research Corporation
- William Thie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Configurable bevel etcher
- Patent number 7,943,007
- Issue date May 17, 2011
- Lam Research Corporation
- Andrew D. Bailey, III
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for aligning electrodes in a process chamber to protect a...
- Patent number 7,922,866
- Issue date Apr 12, 2011
- Lam Research Corporation
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bevel etcher with gap control
- Patent number 7,858,898
- Issue date Dec 28, 2010
- Lam Research Corporation
- Andrew D. Bailey, III
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of and apparatus for aligning electrodes in a process chamb...
- Patent number 7,662,254
- Issue date Feb 16, 2010
- Lam Research Corporation
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatuses and methods for cleaning a substrate
- Patent number 7,625,452
- Issue date Dec 1, 2009
- Lam Research Corporation
- John M. de Larios
- B08 - CLEANING
Information Patent Grant
System, method and apparatus for in-situ substrate inspection
- Patent number 7,542,134
- Issue date Jun 2, 2009
- Lam Research Corporation
- Aleksander Owczarz
- G01 - MEASURING TESTING
Information Patent Grant
Apparatuses and methods for cleaning a substrate
- Patent number 7,441,299
- Issue date Oct 28, 2008
- Lam Research Corporation
- John M. de Larios
- B08 - CLEANING
Information Patent Grant
System, method and apparatus for in-situ substrate inspection
- Patent number 7,397,555
- Issue date Jul 8, 2008
- Lam Research Corporation
- Aleksander Owczarz
- G01 - MEASURING TESTING
Information Patent Grant
High temperature electrostatic chuck
- Patent number 6,669,783
- Issue date Dec 30, 2003
- Lam Research Corporation
- Greg Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for producing uniform process rates
- Patent number 6,653,791
- Issue date Nov 25, 2003
- Lam Research Corporation
- Andrew D. Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature electrostatic chuck
- Patent number 6,567,258
- Issue date May 20, 2003
- Lam Research Corporation
- Greg Sexton
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DUAL PLENUM FRACTAL SHOWERHEAD
- Publication number 20240295025
- Publication date Sep 5, 2024
- LAM RESEARCH CORPORATION
- Clint Edward Thomas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATION OF VAPOR DEPOSITION PROCESS INTO PLASMA ETCH REACTOR
- Publication number 20230260759
- Publication date Aug 17, 2023
- LAM RESEARCH CORPORATION
- Eric A. Hudson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR PHOTORESIST DRY DEPOSITION
- Publication number 20220308462
- Publication date Sep 29, 2022
- LAM RESEARCH CORPORATION
- Butch Berney
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPACT HIGH DENSITY PLASMA SOURCE
- Publication number 20210183619
- Publication date Jun 17, 2021
- LAM RESEARCH CORPORATION
- Roger Patrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCH AND DEPOSITION PROCESSING SYSTEMS INCLUDING A LEN...
- Publication number 20210143032
- Publication date May 13, 2021
- LAM RESEARCH CORPORATION
- Dong Woo PAENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODULAR VAPORIZER
- Publication number 20160222508
- Publication date Aug 4, 2016
- LAM RESEARCH CORPORATION
- Alan M. Schoepp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ISOTROPIC ATOMIC LAYER ETCH FOR SILICON AND GERMANIUM OXIDES
- Publication number 20160196984
- Publication date Jul 7, 2016
- LAM RESEARCH CORPORATION
- Thorsten Lill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFIGURABLE LIQUID PRECURSOR VAPORIZER
- Publication number 20150377481
- Publication date Dec 31, 2015
- LAM RESEARCH CORPORATION
- Colin F. Smith
- F22 - STEAM GENERATION
Information Patent Application
DEPOSITION APPARATUS INCLUDING AN ISOTHERMAL PROCESSING ZONE
- Publication number 20150011096
- Publication date Jan 8, 2015
- Lam Research Corporation
- Ramesh Chandrasekharan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DELAMINATION DRYING APPARATUS AND METHOD
- Publication number 20140101964
- Publication date Apr 17, 2014
- LAM RESEARCH CORPORATION
- Stephen M. SIRARD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEVEL ETCHER WITH VACUUM CHUCK
- Publication number 20140038418
- Publication date Feb 6, 2014
- LAM RESEARCH CORPORATION
- Andrew D. Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Distributing Gas for A Bevel Edge Etcher
- Publication number 20130276821
- Publication date Oct 24, 2013
- Greg Sexton
- B08 - CLEANING
Information Patent Application
Method and Apparatus for Wafer Electroless Plating
- Publication number 20130280917
- Publication date Oct 24, 2013
- William Thie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE FREEZE DRY APPARATUS AND METHOD
- Publication number 20120304483
- Publication date Dec 6, 2012
- LAM RESEARCH CORPORATION
- Stephen M. Sirard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer Electroless Plating System and Associated Methods
- Publication number 20120045897
- Publication date Feb 23, 2012
- LAM RESEARCH CORPORATION
- William Thie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFIGURABLE BEVEL ETCHER
- Publication number 20110214687
- Publication date Sep 8, 2011
- LAM RESEARCH CORPORATION
- Andrew D. Bailey III
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ORIENTING AN UPPER ELECTRODE RELATIVE TO A LOWER ELECTROD...
- Publication number 20110165779
- Publication date Jul 7, 2011
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus For Aligning Electrodes In A Process Chamber to Protect A...
- Publication number 20100096087
- Publication date Apr 22, 2010
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUSES AND METHODS FOR CLEANING A SUBSTRATE
- Publication number 20090000044
- Publication date Jan 1, 2009
- John M. de Larios
- B08 - CLEANING
Information Patent Application
SYSTEM, METHOD AND APPARATUS FOR IN-SITU SUBSTRATE INSPECTION
- Publication number 20080273195
- Publication date Nov 6, 2008
- Aleksander Owczarz
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND SYSTEM FOR DISTRIBUTING GAS FOR A BEVEL EDGE ETCHER
- Publication number 20080216864
- Publication date Sep 11, 2008
- Greg Sexton
- B08 - CLEANING
Information Patent Application
Methods of and apparatus for aligning electrodes in a process chamb...
- Publication number 20080190556
- Publication date Aug 14, 2008
- LAM RESEARCH CORPORATION
- Gregory S. Sexton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Configurable bevel etcher
- Publication number 20080182412
- Publication date Jul 31, 2008
- LAM RESEARCH CORPORATION
- Andrew D. Bailey III
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Bevel etcher with vacuum chuck
- Publication number 20080179010
- Publication date Jul 31, 2008
- LAM RESEARCH CORPORATION
- Andrew D. Bailey III
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Bevel etcher with gap control
- Publication number 20080179297
- Publication date Jul 31, 2008
- LAM RESEARCH CORPORATION
- Andrew D. Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Controlled ambient system for interface engineering
- Publication number 20080057221
- Publication date Mar 6, 2008
- LAM RESEARCH CORPORATION
- John Boyd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR GAP FILL IN CONTROLLED AMBIENT SYSTEM
- Publication number 20080057182
- Publication date Mar 6, 2008
- John Boyd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System, method and apparatus for in-situ substrate inspection
- Publication number 20060139450
- Publication date Jun 29, 2006
- Lam Research Corp.
- Aleksander Owczarz
- G01 - MEASURING TESTING
Information Patent Application
Materials and gas chemistries for processing systems
- Publication number 20060011583
- Publication date Jan 19, 2006
- Andrew D. Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatuses and methods for cleaning a substrate
- Publication number 20050133061
- Publication date Jun 23, 2005
- LAM RESEARCH CORPORATION
- John M. de Larios
- B08 - CLEANING

Alan M. Schoepp

Person

Patents Grantslast 30 patents

Atomic layer etch and deposition processing systems including a len...

Deposition apparatus including an isothermal processing zone

Configurable liquid precursor vaporizer

Modular vaporizer

Substrate freeze dry apparatus and method

Isotropic atomic layer etch for silicon and germanium oxides

Method and apparatus for wafer electroless plating

Controlled ambient system for interface engineering

Configurable bevel etcher

Method for distributing gas for a bevel etcher

Delamination drying apparatus and method

Fluid handling system for wafer electroless plating and associated...

Bevel etcher with vacuum chuck

Bevel etcher with vacuum chuck

Method and apparatus for wafer electroless plating

Method of orienting an upper electrode relative to a lower electrod...

Wafer electroless plating system and associated methods

Apparatus for gate valve movement in a minimum-space wet process en...

Wafer electroless plating system and associated methods

Configurable bevel etcher

Apparatus for aligning electrodes in a process chamber to protect a...

Bevel etcher with gap control

Methods of and apparatus for aligning electrodes in a process chamb...

Apparatuses and methods for cleaning a substrate

System, method and apparatus for in-situ substrate inspection

Apparatuses and methods for cleaning a substrate

System, method and apparatus for in-situ substrate inspection

High temperature electrostatic chuck

Method and apparatus for producing uniform process rates

High temperature electrostatic chuck

Patents Applicationslast 30 patents

DUAL PLENUM FRACTAL SHOWERHEAD

INTEGRATION OF VAPOR DEPOSITION PROCESS INTO PLASMA ETCH REACTOR

APPARATUS FOR PHOTORESIST DRY DEPOSITION

COMPACT HIGH DENSITY PLASMA SOURCE

ATOMIC LAYER ETCH AND DEPOSITION PROCESSING SYSTEMS INCLUDING A LEN...

MODULAR VAPORIZER

ISOTROPIC ATOMIC LAYER ETCH FOR SILICON AND GERMANIUM OXIDES

CONFIGURABLE LIQUID PRECURSOR VAPORIZER

DEPOSITION APPARATUS INCLUDING AN ISOTHERMAL PROCESSING ZONE

DELAMINATION DRYING APPARATUS AND METHOD

BEVEL ETCHER WITH VACUUM CHUCK

Method and System for Distributing Gas for A Bevel Edge Etcher

Method and Apparatus for Wafer Electroless Plating

SUBSTRATE FREEZE DRY APPARATUS AND METHOD

Wafer Electroless Plating System and Associated Methods

CONFIGURABLE BEVEL ETCHER

METHOD OF ORIENTING AN UPPER ELECTRODE RELATIVE TO A LOWER ELECTROD...

Apparatus For Aligning Electrodes In A Process Chamber to Protect A...

APPARATUSES AND METHODS FOR CLEANING A SUBSTRATE

SYSTEM, METHOD AND APPARATUS FOR IN-SITU SUBSTRATE INSPECTION

METHOD AND SYSTEM FOR DISTRIBUTING GAS FOR A BEVEL EDGE ETCHER

Methods of and apparatus for aligning electrodes in a process chamb...

Configurable bevel etcher

Bevel etcher with vacuum chuck

Bevel etcher with gap control

Controlled ambient system for interface engineering

METHOD FOR GAP FILL IN CONTROLLED AMBIENT SYSTEM

System, method and apparatus for in-situ substrate inspection

Materials and gas chemistries for processing systems

Apparatuses and methods for cleaning a substrate