Alan Rosenbluth

Person

Yorktown Heights, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Color-map method to eliminate qubit frequency crowding in a quantum...
- Patent number 12,039,402
- Issue date Jul 16, 2024
- International Business Machines Corporation
- Jared Barney Hertzberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Tool to provide integrated circuit masks with accurate dimensional...
- Patent number 10,915,686
- Issue date Feb 9, 2021
- International Business Machines Corporation
- Alan E. Rosenbluth
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Tool to provide integrated circuit masks with accurate dimensional...
- Patent number 10,872,188
- Issue date Dec 22, 2020
- International Business Machines Corporation
- Alan E. Rosenbluth
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Tool to provide integrated circuit masks with accurate dimensional...
- Patent number 10,437,950
- Issue date Oct 8, 2019
- International Business Machines Corporation
- Alan E. Rosenbluth
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Tool to provide integrated circuit masks with accurate dimensional...
- Patent number 10,394,984
- Issue date Aug 27, 2019
- International Business Machines Corporation
- Alan E. Rosenbluth
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Tool to provide integrated circuit masks with accurate dimensional...
- Patent number 10,210,295
- Issue date Feb 19, 2019
- International Business Machines Corporation
- Alan E. Rosenbluth
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Figurative models calibrated to correct errors in process models
- Patent number 10,120,963
- Issue date Nov 6, 2018
- GLOBALFOUNDRIES Inc.
- Pardeep Kumar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and program product for designing source and mask for lithog...
- Patent number 9,857,676
- Issue date Jan 2, 2018
- International Business Machines Corporation
- Tadanobu Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Source, target and mask optimization by incorporating contour based...
- Patent number 9,651,856
- Issue date May 16, 2017
- International Business Machines Corporation
- Tadanobu Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Synthesizing low mask error enhancement factor lithography solutions
- Patent number 9,395,622
- Issue date Jul 19, 2016
- GLOBALFOUNDRIES Inc.
- Tadanobu Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask that provides improved focus control using orthogonal edges
- Patent number 9,310,674
- Issue date Apr 12, 2016
- International Business Machines Corporation
- Jaione Tirapu Azpiroz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Source, target and mask optimization by incorporating countour base...
- Patent number 9,250,535
- Issue date Feb 2, 2016
- International Business Machines Corporation
- Tadanobu Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask design method, program, and mask design system
- Patent number 8,959,462
- Issue date Feb 17, 2015
- International Business Machines Corporation
- Tadanobu Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Source-mask optimization for a lithography process
- Patent number 8,954,898
- Issue date Feb 10, 2015
- International Business Machines Corporation
- Tadanobu Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Printing process calibration and correction
- Patent number 8,910,089
- Issue date Dec 9, 2014
- International Business Machines Corporation
- Samit Barai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Analyzing a patterning process using a model of yield
- Patent number 8,880,382
- Issue date Nov 4, 2014
- International Business Machines Corporation
- Saeed Bagheri
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Reflective film interface to restore transverse magnetic wave contr...
- Patent number 8,867,024
- Issue date Oct 21, 2014
- International Business Machines Corporation
- Kafai Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining mask operation activities
- Patent number 8,769,445
- Issue date Jul 1, 2014
- International Business Machines Corporation
- Emily E. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimizing lithographic mask for manufacturability in efficient manner
- Patent number 8,719,735
- Issue date May 6, 2014
- International Business Machines Corporation
- Masaharu Sakamoto
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Analyzing a patterning process using a model of yield
- Patent number 8,682,634
- Issue date Mar 25, 2014
- International Business Machines Corporation
- Saeed Bagheri
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Constrained optimization of lithographic source intensities under c...
- Patent number 8,605,254
- Issue date Dec 10, 2013
- International Business Machines Corporation
- Saeed Bagheri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for projection lithography with immersed image-al...
- Patent number 8,537,444
- Issue date Sep 17, 2013
- International Business Machines Corporation
- Dario Gil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining manufacturability of lithographic mask based on manufac...
- Patent number 8,539,390
- Issue date Sep 17, 2013
- International Business Machines Corporation
- Tadanobu Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for generating a plurality of optimized wavefronts for a mul...
- Patent number 8,495,528
- Issue date Jul 23, 2013
- International Business Machines Corporation
- Saeed Bagheri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wavefront engineering of mask data for semiconductor device design
- Patent number 8,453,076
- Issue date May 28, 2013
- International Business Machines Corporation
- Tadanobu Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fracturing continuous photolithography masks
- Patent number 8,448,098
- Issue date May 21, 2013
- International Business Machines Corporation
- Ying Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for optimizing source and mask to control line width roughne...
- Patent number 8,372,565
- Issue date Feb 12, 2013
- International Business Machines Corporation
- Kehan Tian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to match exposure tools using a programmable illuminator
- Patent number 8,351,037
- Issue date Jan 8, 2013
- International Business Machines Corporation
- Jaione Tirapu Azpiroz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EMF correction model calibration using asymmetry factor data obtain...
- Patent number 8,271,910
- Issue date Sep 18, 2012
- International Business Machines Corporation
- Jaione Tirapu-Azpiroz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fracturing continuous photolithography masks
- Patent number 8,266,556
- Issue date Sep 11, 2012
- International Business Machines Corporation
- Ying Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COLOR-MAP METHOD TO ELIMINATE QUBIT FREQUENCY CROWDING IN A QUANTUM...
- Publication number 20220058509
- Publication date Feb 24, 2022
- International Business Machines Corporation
- Jared Barney Hertzberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Tool To Provide Integrated Circuit Masks With Accurate Dimensional...
- Publication number 20200074031
- Publication date Mar 5, 2020
- International Business Machines Corporation
- Alan E. Rosenbluth
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Tool To Provide Integrated Circuit Masks With Accurate Dimensional...
- Publication number 20200074032
- Publication date Mar 5, 2020
- International Business Machines Corporation
- Alan E. Rosenbluth
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FIGURATIVE MODELS CALIBRATED TO CORRECT ERRORS IN PROCESS MODELS
- Publication number 20180322228
- Publication date Nov 8, 2018
- GLOBALFOUNDRIES INC.
- Pardeep KUMAR
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TOOL TO PROVIDE INTEGRATED CIRCUIT MASKS WITH ACCURATE DIMENSIONAL...
- Publication number 20170270230
- Publication date Sep 21, 2017
- International Business Machines Corporation
- Alan E. Rosenbluth
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TOOL TO PROVIDE INTEGRATED CIRCUIT MASKS WITH ACCURATE DIMENSIONAL...
- Publication number 20170147734
- Publication date May 25, 2017
- International Business Machines Corporation
- Alan E. Rosenbluth
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TOOL TO PROVIDE INTEGRATED CIRCUIT MASKS WITH ACCURATE DIMENSIONAL...
- Publication number 20170147733
- Publication date May 25, 2017
- International Business Machines Corporation
- Alan E. Rosenbluth
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SOURCE, TARGET AND MASK OPTIMIZATION BY INCORPORATING CONTOUR BASED...
- Publication number 20160109795
- Publication date Apr 21, 2016
- International Business Machines Corporation
- Tadanobu Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND PROGRAM PRODUCT FOR DESIGNING SOURCE AND MASK FOR LITHOG...
- Publication number 20160103389
- Publication date Apr 14, 2016
- International Business Machines Corporation
- Tadanobu Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYNTHESIZING LOW MASK ERROR ENHANCEMENT FACTOR LITHOGRAPHY SOLUTIONS
- Publication number 20150234970
- Publication date Aug 20, 2015
- International Business Machines Corporation
- Tadanobu Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK THAT PROVIDES IMPROVED FOCUS CONTROL USING ORTHOGONAL EDGES
- Publication number 20150234269
- Publication date Aug 20, 2015
- International Business Machines Corporation
- Jaione Tirapu Azpiroz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRINTING PROCESS CALIBRATION AND CORRECTION
- Publication number 20140380255
- Publication date Dec 25, 2014
- Samit Barai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SOURCE, TARGET AND MASK OPTIMIZATION BY INCORPORATING COUNTOUR BASE...
- Publication number 20140268075
- Publication date Sep 18, 2014
- International Business Machines Corporation
- Tadanobu Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SOURCE-MASK OPTIMIZATION FOR A LITHOGRAPHY PROCESS
- Publication number 20140282291
- Publication date Sep 18, 2014
- International Business Machines Corporation
- Tadanobu Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK DESIGN METHOD, PROGRAM, AND MASK DESIGN SYSTEM
- Publication number 20130263063
- Publication date Oct 3, 2013
- Tadanobu Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Analyzing A Patterning Process Using A Model Of Yield
- Publication number 20130185046
- Publication date Jul 18, 2013
- International Business Machines Corporation
- Saeed BAGHERI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ANALYZING A PATTERNING PROCESS USING A MODEL OF YIELD
- Publication number 20130185045
- Publication date Jul 18, 2013
- International Business Machines Corporation
- Saeed BAGHERI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHOD FOR PROJECTION LITHOGRAPHY WITH IMMERSED IMAGE-AL...
- Publication number 20130071774
- Publication date Mar 21, 2013
- International Business Machines Corporation
- Dario Gil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimizing lithographic mask for manufacturability in efficient manner
- Publication number 20130019211
- Publication date Jan 17, 2013
- Masaharu Sakamoto
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FRACTURING CONTINUOUS PHOTOLITHOGRAPHY MASKS
- Publication number 20120210281
- Publication date Aug 16, 2012
- International Business Machines Corporation
- YING LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Determining manufacturability of lithographic mask based on manufac...
- Publication number 20120196210
- Publication date Aug 2, 2012
- Tadanobu Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
REFLECTIVE FILM INTERFACE TO RESTORE TRANSVERSE MAGNETIC WAVE CONTR...
- Publication number 20120092633
- Publication date Apr 19, 2012
- International Business Machines Corporation
- Kafai Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR GENERATING A PLURALITY OF OPTIMIZED WAVEFRONTS FOR A MUL...
- Publication number 20120077130
- Publication date Mar 29, 2012
- International Business Machines Corporation
- Saeed Bagheri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING MASK OPERATION ACTIVITIES
- Publication number 20120070064
- Publication date Mar 22, 2012
- International Business Machines Corporation
- Emily E. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPTIMIZING SOURCE AND MASK TO CONTROL LINE WIDTH ROUGHNE...
- Publication number 20120052418
- Publication date Mar 1, 2012
- International Business Machines Corporation
- Kehan Tian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DYNAMIC PROVISIONAL DECOMPOSITION OF LITHOGRAPHIC PATTERNS HAVING D...
- Publication number 20120047471
- Publication date Feb 23, 2012
- International Business Machines Corporation
- Saeed Bagheri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FRACTURING CONTINUOUS PHOTOLITHOGRAPHY MASKS
- Publication number 20120036487
- Publication date Feb 9, 2012
- International Business Machines Corporation
- YING LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FAST ESTIMATION OF LITHOGRAPHIC BINDING PATTERNS IN AN I...
- Publication number 20120017194
- Publication date Jan 19, 2012
- International Business Machines Corporation
- Saeed Bagheri
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD TO MATCH EXPOSURE TOOLS USING A PROGRAMMABLE ILLUMINATOR
- Publication number 20120008134
- Publication date Jan 12, 2012
- International Business Machines Corporation
- Jaione Tirapu Azpiroz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EMF CORRECTION MODEL CALIBRATION USING ASYMMETRY FACTOR DATA OBTAIN...
- Publication number 20110239169
- Publication date Sep 29, 2011
- International Business Machines Corporation
- Jaione Tirapu-Azpiroz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Alan Rosenbluth

Person

Patents Grantslast 30 patents

Color-map method to eliminate qubit frequency crowding in a quantum...

Tool to provide integrated circuit masks with accurate dimensional...

Tool to provide integrated circuit masks with accurate dimensional...

Tool to provide integrated circuit masks with accurate dimensional...

Tool to provide integrated circuit masks with accurate dimensional...

Tool to provide integrated circuit masks with accurate dimensional...

Figurative models calibrated to correct errors in process models

Method and program product for designing source and mask for lithog...

Source, target and mask optimization by incorporating contour based...

Synthesizing low mask error enhancement factor lithography solutions

Mask that provides improved focus control using orthogonal edges

Source, target and mask optimization by incorporating countour base...

Mask design method, program, and mask design system

Source-mask optimization for a lithography process

Printing process calibration and correction

Analyzing a patterning process using a model of yield

Reflective film interface to restore transverse magnetic wave contr...

Method for determining mask operation activities

Optimizing lithographic mask for manufacturability in efficient manner

Analyzing a patterning process using a model of yield

Constrained optimization of lithographic source intensities under c...

System and method for projection lithography with immersed image-al...

Determining manufacturability of lithographic mask based on manufac...

Method for generating a plurality of optimized wavefronts for a mul...

Wavefront engineering of mask data for semiconductor device design

Fracturing continuous photolithography masks

Method for optimizing source and mask to control line width roughne...

Method to match exposure tools using a programmable illuminator

EMF correction model calibration using asymmetry factor data obtain...

Fracturing continuous photolithography masks

Patents Applicationslast 30 patents

COLOR-MAP METHOD TO ELIMINATE QUBIT FREQUENCY CROWDING IN A QUANTUM...

Tool To Provide Integrated Circuit Masks With Accurate Dimensional...

Tool To Provide Integrated Circuit Masks With Accurate Dimensional...

FIGURATIVE MODELS CALIBRATED TO CORRECT ERRORS IN PROCESS MODELS

TOOL TO PROVIDE INTEGRATED CIRCUIT MASKS WITH ACCURATE DIMENSIONAL...

TOOL TO PROVIDE INTEGRATED CIRCUIT MASKS WITH ACCURATE DIMENSIONAL...

TOOL TO PROVIDE INTEGRATED CIRCUIT MASKS WITH ACCURATE DIMENSIONAL...

SOURCE, TARGET AND MASK OPTIMIZATION BY INCORPORATING CONTOUR BASED...

METHOD AND PROGRAM PRODUCT FOR DESIGNING SOURCE AND MASK FOR LITHOG...

SYNTHESIZING LOW MASK ERROR ENHANCEMENT FACTOR LITHOGRAPHY SOLUTIONS

MASK THAT PROVIDES IMPROVED FOCUS CONTROL USING ORTHOGONAL EDGES

PRINTING PROCESS CALIBRATION AND CORRECTION

SOURCE, TARGET AND MASK OPTIMIZATION BY INCORPORATING COUNTOUR BASE...

SOURCE-MASK OPTIMIZATION FOR A LITHOGRAPHY PROCESS

MASK DESIGN METHOD, PROGRAM, AND MASK DESIGN SYSTEM

Analyzing A Patterning Process Using A Model Of Yield

ANALYZING A PATTERNING PROCESS USING A MODEL OF YIELD

SYSTEM AND METHOD FOR PROJECTION LITHOGRAPHY WITH IMMERSED IMAGE-AL...

Optimizing lithographic mask for manufacturability in efficient manner

FRACTURING CONTINUOUS PHOTOLITHOGRAPHY MASKS

Determining manufacturability of lithographic mask based on manufac...

REFLECTIVE FILM INTERFACE TO RESTORE TRANSVERSE MAGNETIC WAVE CONTR...

METHOD FOR GENERATING A PLURALITY OF OPTIMIZED WAVEFRONTS FOR A MUL...

METHOD FOR DETERMINING MASK OPERATION ACTIVITIES

METHOD FOR OPTIMIZING SOURCE AND MASK TO CONTROL LINE WIDTH ROUGHNE...

DYNAMIC PROVISIONAL DECOMPOSITION OF LITHOGRAPHIC PATTERNS HAVING D...

FRACTURING CONTINUOUS PHOTOLITHOGRAPHY MASKS

METHOD FOR FAST ESTIMATION OF LITHOGRAPHIC BINDING PATTERNS IN AN I...

METHOD TO MATCH EXPOSURE TOOLS USING A PROGRAMMABLE ILLUMINATOR

EMF CORRECTION MODEL CALIBRATION USING ASYMMETRY FACTOR DATA OBTAIN...