Alan W. Collins

Person

San Francisco, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Deposition chamber and method for depositing low dielectric constan...
- Patent number 7,413,627
- Issue date Aug 19, 2008
- Applied Materials, Inc.
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition chamber and method for depositing low dielectric constan...
- Patent number 6,833,052
- Issue date Dec 21, 2004
- Applied Materials, Inc.
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning residues from surfaces in a chamber by sputtering sacrific...
- Patent number 6,814,814
- Issue date Nov 9, 2004
- Applied Materials, Inc.
- Alan W. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for cleaning a semiconductor wafer processing...
- Patent number 6,715,496
- Issue date Apr 6, 2004
- Applied Materials Inc.
- Michael Chiu Kwan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for producing stable low k FSG film for HDP-CVD
- Patent number 6,633,076
- Issue date Oct 14, 2003
- Applied Materials, Inc.
- Padmanabhan Krishnaraj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for cleaning a semiconductor wafer processing...
- Patent number 6,596,123
- Issue date Jul 22, 2003
- Applied Materials, Inc.
- Michael Chiu Kwan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition chamber and method for depositing low dielectric constan...
- Patent number 6,589,610
- Issue date Jul 8, 2003
- Applied Materials, Inc.
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for producing stable low k FSG film for HDP-CVD
- Patent number 6,511,922
- Issue date Jan 28, 2003
- Applied Materials, Inc.
- Padmanabhan Krishnaraj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution system for a CVD processing chamber
- Patent number 6,486,081
- Issue date Nov 26, 2002
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition chamber and method for depositing low dielectric constan...
- Patent number 6,416,823
- Issue date Jul 9, 2002
- Applied Materials, Inc.
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution system for a CVD processing chamber
- Patent number 6,143,078
- Issue date Nov 7, 2000
- Applied Materials, Inc.
- Tetsuya Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition chamber and method for depositing low dielectric constan...
- Patent number 6,070,551
- Issue date Jun 6, 2000
- Applied Materials, Inc.
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Deposition chamber and method for depositing low dielectric constan...
- Publication number 20050150454
- Publication date Jul 14, 2005
- Applied Materials, Inc.
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cleaning residues from surfaces in a chamber by sputtering sacrific...
- Publication number 20030183243
- Publication date Oct 2, 2003
- APPLIED MATERIALS, INC.
- Alan W. Collins
- B08 - CLEANING
Information Patent Application
Method and apparatus for cleaning a semiconductor wafer processing...
- Publication number 20030164224
- Publication date Sep 4, 2003
- Michael Chiu Kwan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and apparatus for producing stable low k FSG film for HDP-CVD
- Publication number 20030064556
- Publication date Apr 3, 2003
- Applied Materials, Inc.
- Padmanabhan Krishnaraj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition chamber and method for depositing low dielectric constan...
- Publication number 20030056900
- Publication date Mar 27, 2003
- APPLIED MATERIALS, INCORPORATED a Delaware corporation
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and apparatus for producing stable low k FSG film for HDP-CVD
- Publication number 20020173167
- Publication date Nov 21, 2002
- APPLIED MATERIALS, INC.
- Padmanabhan Krishnaraj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition chamber and method for depositing low dielectric constan...
- Publication number 20020160113
- Publication date Oct 31, 2002
- APPLIED MATERIALS, INCORPORATED
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition chamber and method for depositing low dielectric constan...
- Publication number 20010053423
- Publication date Dec 20, 2001
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Alan W. Collins

Person

Patents Grantslast 30 patents

Deposition chamber and method for depositing low dielectric constan...

Deposition chamber and method for depositing low dielectric constan...

Cleaning residues from surfaces in a chamber by sputtering sacrific...

Method and apparatus for cleaning a semiconductor wafer processing...

Methods and apparatus for producing stable low k FSG film for HDP-CVD

Method and apparatus for cleaning a semiconductor wafer processing...

Deposition chamber and method for depositing low dielectric constan...

Methods and apparatus for producing stable low k FSG film for HDP-CVD

Gas distribution system for a CVD processing chamber

Deposition chamber and method for depositing low dielectric constan...

Gas distribution system for a CVD processing chamber

Deposition chamber and method for depositing low dielectric constan...

Patents Applicationslast 30 patents

Deposition chamber and method for depositing low dielectric constan...

Cleaning residues from surfaces in a chamber by sputtering sacrific...

Method and apparatus for cleaning a semiconductor wafer processing...

Methods and apparatus for producing stable low k FSG film for HDP-CVD

Deposition chamber and method for depositing low dielectric constan...

Methods and apparatus for producing stable low k FSG film for HDP-CVD

Deposition chamber and method for depositing low dielectric constan...

Deposition chamber and method for depositing low dielectric constan...