Albert Ellingboe

Person

Dublin, IE

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma source electrode
- Patent number 8,890,412
- Issue date Nov 18, 2014
- Dublin City University
- Albert Rogers Ellingboe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode for plasma processes and method for manufacture and use t...
- Patent number 8,845,855
- Issue date Sep 30, 2014
- Lam Research Corporation
- Jerome S. Hubacek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power splitter
- Patent number 8,680,770
- Issue date Mar 25, 2014
- Dublin City University
- Albert Rogers Ellingboe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source
- Patent number 7,886,690
- Issue date Feb 15, 2011
- Dublin City University
- Albert Rogers Ellingboe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for producing plasma
- Patent number 7,589,470
- Issue date Sep 15, 2009
- Dublin City University
- Lutfi Oksuz
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Wafer area pressure control for plasma confinement
- Patent number 7,470,627
- Issue date Dec 30, 2008
- Lam Research Corporation
- Taejoon Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source
- Patent number 7,342,361
- Issue date Mar 11, 2008
- Dublin City University
- Albert Rogers Ellingboe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deformation reduction at the main chamber
- Patent number 6,949,204
- Issue date Sep 27, 2005
- Lam Research Corporation
- Eric Lenz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processor with electrode simultaneously responsive to plural...
- Patent number 6,841,943
- Issue date Jan 11, 2005
- LAM Research Corp.
- Vahid Vahedi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer area pressure control for plasma confinement
- Patent number 6,823,815
- Issue date Nov 30, 2004
- Lam Research Corporation
- Taejoon Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deformation reduction at the main chamber
- Patent number 6,712,929
- Issue date Mar 30, 2004
- Lam Research Corporation
- Eric Lenz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer area pressure control for plasma confinement
- Patent number 6,492,774
- Issue date Dec 10, 2002
- Lam Research Corporation
- Taejoon Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated load simulator
- Patent number 6,490,536
- Issue date Dec 3, 2002
- Lam Research Corporation
- Albert R. Ellingboe
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA SOURCE ELECTRODE
- Publication number 20120001549
- Publication date Jan 5, 2012
- PHIVE PLASMA TECHNOLOGIES LIMITED
- Albert Rogers Ellingboe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER SPLITTER
- Publication number 20110025430
- Publication date Feb 3, 2011
- Dublin City University
- Albert Rogers Ellingboe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Source
- Publication number 20080309242
- Publication date Dec 18, 2008
- Dublin City University
- Albert Rogers Ellingboe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrode for plasma processes and method for manufacture and use t...
- Publication number 20080026589
- Publication date Jan 31, 2008
- LAM RESEARCH CORPORATION
- Jerome S. Hubacek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for producing plasma
- Publication number 20070176709
- Publication date Aug 2, 2007
- Lutfi Oksuz
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma source
- Publication number 20060254518
- Publication date Nov 16, 2006
- Dublin City University
- Albert Rogers Ellingboe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deformation reduction at the main chamber
- Publication number 20060032736
- Publication date Feb 16, 2006
- Lam Research Corporation
- Eric Lenz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer area pressure control for plasma confinement
- Publication number 20050051268
- Publication date Mar 10, 2005
- Lam Research Corporation
- Taejoon Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processor with electrode simultaneously responsive to plural...
- Publication number 20040000875
- Publication date Jan 1, 2004
- Vahid Vahedi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor processing using an efficiently coupled gas source
- Publication number 20030129106
- Publication date Jul 10, 2003
- APPLIED MATERIALS, INC.
- Carl A. Sorensen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Wafer area pressure control for plasma confinement
- Publication number 20020190657
- Publication date Dec 19, 2002
- Lam Research Corporation
- Taejoon Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrode for plasma processes and method for manufacture and use t...
- Publication number 20020127853
- Publication date Sep 12, 2002
- Jerome S. Hubacek
- H01 - BASIC ELECTRIC ELEMENTS

Albert Ellingboe

Person

Patents Grantslast 30 patents

Plasma source electrode

Electrode for plasma processes and method for manufacture and use t...

Power splitter

Plasma source

Method and apparatus for producing plasma

Wafer area pressure control for plasma confinement

Plasma source

Deformation reduction at the main chamber

Plasma processor with electrode simultaneously responsive to plural...

Wafer area pressure control for plasma confinement

Deformation reduction at the main chamber

Wafer area pressure control for plasma confinement

Integrated load simulator

Patents Applicationslast 30 patents

PLASMA SOURCE ELECTRODE

POWER SPLITTER

Plasma Source

Electrode for plasma processes and method for manufacture and use t...

Method and apparatus for producing plasma

Plasma source

Deformation reduction at the main chamber

Wafer area pressure control for plasma confinement

Plasma processor with electrode simultaneously responsive to plural...

Semiconductor processing using an efficiently coupled gas source

Wafer area pressure control for plasma confinement

Electrode for plasma processes and method for manufacture and use t...