Albrecht Ehrmann

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Krailling, DE

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Patents Grantslast 30 patents

Information Patent Grant
Method of producing large-area membrane masks by dry etching
- Patent number 6,864,182
- Issue date Mar 8, 2005
- Infineon Technologies AG
- Jörg Butschke
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Large-area membrane mask and method for fabricating the mask
- Patent number 6,835,508
- Issue date Dec 28, 2004
- Infineon Technologies AG
- Jörg Butschke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing a perforated mask for particle radiation
- Patent number 6,773,854
- Issue date Aug 10, 2004
- Infineon Technologies AG
- Albrecht Ehrmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography mask configuration
- Patent number 6,696,206
- Issue date Feb 24, 2004
- Infineon Technologies AG
- Albrecht Ehrmann
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for fabricating positionally exact surface-wide membrane masks
- Patent number 6,696,371
- Issue date Feb 24, 2004
- Infineon Technologies AG
- Joerg Butschke
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Method of producing a perforated mask for particle radiation
- Publication number 20030059689
- Publication date Mar 27, 2003
- Albrecht Ehrmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Large-area membrane mask and method for fabricating the mask
- Publication number 20030031939
- Publication date Feb 13, 2003
- Jorg Butschke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of producing large-area membrane masks by dry etching
- Publication number 20030003739
- Publication date Jan 2, 2003
- Jorg Butschke
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Method for fabricating positionally exact surface-wide membrane masks
- Publication number 20020182895
- Publication date Dec 5, 2002
- Joerg Butschke
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Lithography mask configuration
- Publication number 20020081498
- Publication date Jun 27, 2002
- Albrecht Ehrmann
- B82 - NANO-TECHNOLOGY