Aleksandr Khmelichek

Person

Brooklyn, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Liquid immersion lithography system comprising a tilted showerhead...
- Patent number 8,203,693
- Issue date Jun 19, 2012
- ASML Netherlands B.V.
- Aleksandr Khmelichek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interferometric lithographic projection apparatus
- Patent number 7,751,030
- Issue date Jul 6, 2010
- ASML Holding N.V.
- Louis Markoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adjustable resolution interferometric lithography system
- Patent number 7,492,442
- Issue date Feb 17, 2009
- ASML Holding N.V.
- Louis Markoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adjustable resolution interferometric lithography system
- Patent number 7,474,385
- Issue date Jan 6, 2009
- ASML Holding N.V.
- Louis Markoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid immersion lithography system having a tilted showerhead rela...
- Patent number 7,256,864
- Issue date Aug 14, 2007
- ASML Holding N.V.
- Nicolaas Ten Kate
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid immersion lithography system with tilted liquid flow
- Patent number 7,253,879
- Issue date Aug 7, 2007
- ASML Holding N.V.
- Aleksandr Khmelichek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Liquid Immersion Lithography System Comprising a Tilted Showerhead...
- Publication number 20100053574
- Publication date Mar 4, 2010
- ASML Holding N.V.
- Aleksandr Khmelichek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Adjustable Resolution Interferometric Lithography System
- Publication number 20070070321
- Publication date Mar 29, 2007
- ASML Holding N.V.
- Louis Markoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Liquid immersion lithography system with tilted liquid flow
- Publication number 20070041002
- Publication date Feb 22, 2007
- ASML Holding N.V.
- Aleksandr Khmelichek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Liquid immersion lithography system having a tilted showerhead rela...
- Publication number 20060238721
- Publication date Oct 26, 2006
- ASML Holding N.V.
- Nicolaas Ten Kate
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Liquid immersion lithography system with tilted liquid flow
- Publication number 20060232753
- Publication date Oct 19, 2006
- ASML Holding N.V.
- Aleksandr Khmelichek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Interferometric lithographic projection apparatus
- Publication number 20060170896
- Publication date Aug 3, 2006
- ASML Holding, N.V.
- Louis J. Markoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Adjustable resolution interferometric lithography system
- Publication number 20060044539
- Publication date Mar 2, 2006
- ASML Holding N.V.
- Louis Markoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Aleksandr Khmelichek

Person

Patents Grantslast 30 patents

Liquid immersion lithography system comprising a tilted showerhead...

Interferometric lithographic projection apparatus

Adjustable resolution interferometric lithography system

Adjustable resolution interferometric lithography system

Liquid immersion lithography system having a tilted showerhead rela...

Liquid immersion lithography system with tilted liquid flow

Patents Applicationslast 30 patents

Liquid Immersion Lithography System Comprising a Tilted Showerhead...

Adjustable Resolution Interferometric Lithography System

Liquid immersion lithography system with tilted liquid flow

Liquid immersion lithography system having a tilted showerhead rela...

Liquid immersion lithography system with tilted liquid flow

Interferometric lithographic projection apparatus

Adjustable resolution interferometric lithography system