Alexander Bykanov

Person

San Diego, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for EUV mask inspection
- Patent number 11,635,700
- Issue date Apr 25, 2023
- Erel Milshtein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Droplet generation for a laser produced plasma light source
- Patent number 11,343,899
- Issue date May 24, 2022
- KLA Corporation
- Brian Ahr
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods and systems for characterization of an x-ray beam with high...
- Patent number 11,073,487
- Issue date Jul 27, 2021
- KLA-Tencor Corporation
- Alexander Bykanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
X-ray metrology system with broadband laser produced plasma illumin...
- Patent number 10,959,318
- Issue date Mar 23, 2021
- KLA-Tencor Corporation
- Oleg Khodykin
- G01 - MEASURING TESTING
Information Patent Grant
Droplet generation for a laser produced plasma light source
- Patent number 10,880,979
- Issue date Dec 29, 2020
- KLA Corporation
- Brian Ahr
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multilayer targets for calibration and alignment of X-ray based mea...
- Patent number 10,816,486
- Issue date Oct 27, 2020
- KLA-Tencor Corporation
- Nikolay Artemiev
- G01 - MEASURING TESTING
Information Patent Grant
Beam shaping slit for small spot size transmission small angle X-ra...
- Patent number 10,359,377
- Issue date Jul 23, 2019
- KLA-Tencor Corporation
- Alexander Bykanov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Plasma-based light source
- Patent number 10,034,362
- Issue date Jul 24, 2018
- KLA-Tencor Corporation
- Alexey Kuritsyn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Debris protection system for reflective optic utilizing gas flow
- Patent number 9,989,758
- Issue date Jun 5, 2018
- KLA-Tencor Corporation
- Alexey Kuritsyn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser produced plasma EUV light source
- Patent number 9,713,239
- Issue date Jul 18, 2017
- ASML Netherlands B.V.
- Bjorn A. M. Hansson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for generation of extreme ultraviolet light
- Patent number 9,544,984
- Issue date Jan 10, 2017
- KLA-Tencor Corporation
- Alexander Bykanov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for producing an exclusionary buffer gas flow in...
- Patent number 9,420,678
- Issue date Aug 16, 2016
- KLA-Tencor Corporation
- Alexander Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light source using cryogenic droplet targets in mask inspection
- Patent number 9,295,147
- Issue date Mar 22, 2016
- KLA-Tencor Corporation
- Alexander Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Systems and methods for optics cleaning in an EUV light source
- Patent number 9,000,404
- Issue date Apr 7, 2015
- ASML Netherlands, B.V.
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Laser produced plasma EUV light source
- Patent number 8,704,200
- Issue date Apr 22, 2014
- Cymer, LLC
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Systems and methods for optics cleaning in an EUV light source
- Patent number 8,633,459
- Issue date Jan 21, 2014
- Cymer, LLC
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Debris protection system having a magnetic field for an EUV light s...
- Patent number 8,519,366
- Issue date Aug 27, 2013
- Cymer, Inc.
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
LPP EUV light source drive laser system
- Patent number 8,461,560
- Issue date Jun 11, 2013
- Cymer, Inc.
- Alexander I. Ershov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light source components and methods for producing, using and re...
- Patent number 8,314,398
- Issue date Nov 20, 2012
- Cymer, Inc.
- Norbert R. Bowering
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Gas management system for a laser-produced-plasma EUV light source
- Patent number 8,198,615
- Issue date Jun 12, 2012
- Cymer, Inc.
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Laser produced plasma EUV light source
- Patent number 8,035,092
- Issue date Oct 11, 2011
- Cymer, Inc.
- Alexander N. Bykanov
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Drive laser delivery systems for EUV light source
- Patent number 8,017,924
- Issue date Sep 13, 2011
- Cymer, Inc.
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
LPP EUV light source drive laser system
- Patent number 7,928,417
- Issue date Apr 19, 2011
- Cymer, Inc.
- Alexander I. Ershov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Drive laser for EUV light source
- Patent number 7,916,388
- Issue date Mar 29, 2011
- Cymer, Inc.
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Systems and methods for target material delivery in a laser produce...
- Patent number 7,872,245
- Issue date Jan 18, 2011
- Cymer, Inc.
- Georgiy O. Vaschenko
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and apparatus for EUV plasma source target delivery
- Patent number 7,838,854
- Issue date Nov 23, 2010
- Cymer, Inc.
- J. Martin Algots
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System managing gas flow between chambers of an extreme ultraviolet...
- Patent number 7,812,329
- Issue date Oct 12, 2010
- Cymer, Inc.
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Spectral purity filters and methods therefor
- Patent number 7,741,626
- Issue date Jun 22, 2010
- Cymer, Inc.
- Alexander N. Bykanov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser produced plasma EUV light source
- Patent number 7,671,349
- Issue date Mar 2, 2010
- Cymer, Inc.
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Gas management system for a laser-produced-plasma EUV light source
- Patent number 7,655,925
- Issue date Feb 2, 2010
- Cymer, Inc.
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
Method and Apparatus for EUV Mask Inspection
- Publication number 20220260928
- Publication date Aug 18, 2022
- KLA Corporation
- Erel Milshtein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DROPLET GENERATION FOR A LASER PRODUCED PLASMA LIGHT SOURCE
- Publication number 20210105886
- Publication date Apr 8, 2021
- KLA Corporation
- Brian Ahr
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Multilayer Targets For Calibration And Alignment Of X-Ray Based Mea...
- Publication number 20190302039
- Publication date Oct 3, 2019
- KLA-Tencor Corporation
- Nikolay Artemiev
- G01 - MEASURING TESTING
Information Patent Application
X-Ray Metrology System With Broadband Laser Produced Plasma Illumin...
- Publication number 20190215940
- Publication date Jul 11, 2019
- KLA-Tencor Corporation
- Oleg Khodykin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Methods And Systems For Characterization Of An X-Ray Beam With High...
- Publication number 20180328868
- Publication date Nov 15, 2018
- KLA-Tencor Corporation
- Alexander Bykanov
- G01 - MEASURING TESTING
Information Patent Application
Beam Shaping Slit For Small Spot Size Transmission Small Angle X-Ra...
- Publication number 20170307548
- Publication date Oct 26, 2017
- KLA-Tencor Corporation
- Alexander Bykanov
- G01 - MEASURING TESTING
Information Patent Application
Droplet Generation for a Laser Produced Plasma Light Source
- Publication number 20170131129
- Publication date May 11, 2017
- KLA-Tencor Corporation
- Brian Ahr
- G01 - MEASURING TESTING
Information Patent Application
Plasma-Based Light Source
- Publication number 20160249442
- Publication date Aug 25, 2016
- KLA-Tencor Corporation
- Alexey Kuritsyn
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
System and Method for Generation of Extreme Ultraviolet Light
- Publication number 20150076359
- Publication date Mar 19, 2015
- KLA-Tencor Corporation
- Alexander Bykanov
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD FOR PRODUCING AN EXCLUSIONARY BUFFER GAS FLOW IN...
- Publication number 20150008335
- Publication date Jan 8, 2015
- KLA-Tencor Corporation
- Alexander Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Debris Protection System For Reflective Optic Utilizing Gas Flow
- Publication number 20140306115
- Publication date Oct 16, 2014
- KLA-Tencor Corporation
- Alexey Kuritsyn
- G02 - OPTICS
Information Patent Application
EUV LIGHT SOURCE USING CRYOGENIC DROPLET TARGETS IN MASK INSPECTION
- Publication number 20140246607
- Publication date Sep 4, 2014
- KLA-Tencor Corporation
- Alexander Bykanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR OPTICS CLEANING IN AN EUV LIGHT SOURCE
- Publication number 20140110609
- Publication date Apr 24, 2014
- CYMER, LLC
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEMS AND METHODS FOR OPTICS CLEANING IN AN EUV LIGHT SOURCE
- Publication number 20120223256
- Publication date Sep 6, 2012
- Cymer, Inc.
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LASER PRODUCED PLASMA EUV LIGHT SOURCE
- Publication number 20120193547
- Publication date Aug 2, 2012
- Bjorn A. M. Hansson
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LPP EUV Light Source Drive Laser System
- Publication number 20110192995
- Publication date Aug 11, 2011
- Cymer, Inc.
- Alexander I. Ershov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Laser produced plasma EUV light source
- Publication number 20110079736
- Publication date Apr 7, 2011
- Cymer, Inc.
- Bjorn A. M. Hansson
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Gas management system for a laser-produced-plasma EUV light source
- Publication number 20100140514
- Publication date Jun 10, 2010
- Cymer, Inc.
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Laser produced plasma EUV light source
- Publication number 20100127186
- Publication date May 27, 2010
- Cymer, Inc.
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SPECTRAL PURITY FILTERS AND METHODS THEREFOR
- Publication number 20100066989
- Publication date Mar 18, 2010
- ALEXANDER N. BYKANOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Debris protection system having a magnetic field for an EUV light s...
- Publication number 20100032590
- Publication date Feb 11, 2010
- Cymer, Inc.
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Drive laser delivery systems for euv light source
- Publication number 20090267005
- Publication date Oct 29, 2009
- Cymer, Inc.
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Systems and methods for target material delivery in a laser produce...
- Publication number 20090230326
- Publication date Sep 17, 2009
- Cymer, Inc.
- Georgiy O. Vaschenko
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV light source components and methods for producing, using and re...
- Publication number 20090159808
- Publication date Jun 25, 2009
- Cymer, Inc.
- Norbert R. Bowering
- G02 - OPTICS
Information Patent Application
Drive laser for EUV light source
- Publication number 20090161201
- Publication date Jun 25, 2009
- Cymer, Inc.
- Alexander I. Ershov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
System managing gas flow between chambers of an extreme ultraviolet...
- Publication number 20090154642
- Publication date Jun 18, 2009
- Cymer, Inc.
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LPP EUV light source drive laser system
- Publication number 20090095925
- Publication date Apr 16, 2009
- Cymer, Inc.
- Alexander I. Ershov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Gas management system for a laser-produced-plasma EUV light source
- Publication number 20090057567
- Publication date Mar 5, 2009
- Cymer, Inc.
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method and apparatus for EUV plasma source target delivery
- Publication number 20080283776
- Publication date Nov 20, 2008
- Cymer, Inc.
- J. Martin Algots
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LPP EUV plasma source material target delivery system
- Publication number 20080179549
- Publication date Jul 31, 2008
- Cymer, Inc.
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Alexander Bykanov

Person

Patents Grantslast 30 patents

Method and apparatus for EUV mask inspection

Droplet generation for a laser produced plasma light source

Methods and systems for characterization of an x-ray beam with high...

X-ray metrology system with broadband laser produced plasma illumin...

Droplet generation for a laser produced plasma light source

Multilayer targets for calibration and alignment of X-ray based mea...

Beam shaping slit for small spot size transmission small angle X-ra...

Plasma-based light source

Debris protection system for reflective optic utilizing gas flow

Laser produced plasma EUV light source

System and method for generation of extreme ultraviolet light

System and method for producing an exclusionary buffer gas flow in...

EUV light source using cryogenic droplet targets in mask inspection

Systems and methods for optics cleaning in an EUV light source

Laser produced plasma EUV light source

Systems and methods for optics cleaning in an EUV light source

Debris protection system having a magnetic field for an EUV light s...

LPP EUV light source drive laser system

EUV light source components and methods for producing, using and re...

Gas management system for a laser-produced-plasma EUV light source

Laser produced plasma EUV light source

Drive laser delivery systems for EUV light source

LPP EUV light source drive laser system

Drive laser for EUV light source

Systems and methods for target material delivery in a laser produce...

Method and apparatus for EUV plasma source target delivery

System managing gas flow between chambers of an extreme ultraviolet...

Spectral purity filters and methods therefor

Laser produced plasma EUV light source

Gas management system for a laser-produced-plasma EUV light source

Patents Applicationslast 30 patents

Method and Apparatus for EUV Mask Inspection

DROPLET GENERATION FOR A LASER PRODUCED PLASMA LIGHT SOURCE

Multilayer Targets For Calibration And Alignment Of X-Ray Based Mea...

X-Ray Metrology System With Broadband Laser Produced Plasma Illumin...

Methods And Systems For Characterization Of An X-Ray Beam With High...

Beam Shaping Slit For Small Spot Size Transmission Small Angle X-Ra...

Droplet Generation for a Laser Produced Plasma Light Source

Plasma-Based Light Source

System and Method for Generation of Extreme Ultraviolet Light

SYSTEM AND METHOD FOR PRODUCING AN EXCLUSIONARY BUFFER GAS FLOW IN...

Debris Protection System For Reflective Optic Utilizing Gas Flow

EUV LIGHT SOURCE USING CRYOGENIC DROPLET TARGETS IN MASK INSPECTION

SYSTEMS AND METHODS FOR OPTICS CLEANING IN AN EUV LIGHT SOURCE

SYSTEMS AND METHODS FOR OPTICS CLEANING IN AN EUV LIGHT SOURCE

LASER PRODUCED PLASMA EUV LIGHT SOURCE

LPP EUV Light Source Drive Laser System

Laser produced plasma EUV light source

Gas management system for a laser-produced-plasma EUV light source

Laser produced plasma EUV light source

SPECTRAL PURITY FILTERS AND METHODS THEREFOR

Debris protection system having a magnetic field for an EUV light s...

Drive laser delivery systems for euv light source

Systems and methods for target material delivery in a laser produce...

EUV light source components and methods for producing, using and re...

Drive laser for EUV light source

System managing gas flow between chambers of an extreme ultraviolet...

LPP EUV light source drive laser system

Gas management system for a laser-produced-plasma EUV light source

Method and apparatus for EUV plasma source target delivery

LPP EUV plasma source material target delivery system