Alexander D. Lantsman

Person

Middletown, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for sputter depositing dielectric films on a s...
- Patent number 6,475,353
- Issue date Nov 5, 2002
- Sony Corporation
- Alexander D. Lantsman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Soft plasma ignition in plasma processing chambers
- Patent number 6,190,512
- Issue date Feb 20, 2001
- Tokyo Electron Arizona Inc.
- Alexander D. Lantsman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for ionized sputtering
- Patent number 5,948,215
- Issue date Sep 7, 1999
- Tokyo Electron Limited
- Alexander D. Lantsman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for low pressure sputtering
- Patent number 5,830,330
- Issue date Nov 3, 1998
- Tokyo Electron Limited
- Alexander D. Lantsman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for ionized sputtering
- Patent number 5,800,688
- Issue date Sep 1, 1998
- Tokyo Electron Limited
- Alexander D. Lantsman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma sputter etching system with reduced particle contamination
- Patent number 5,589,041
- Issue date Dec 31, 1996
- Sony Corporation
- Alexander D. Lantsman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma noise and arcing suppressor apparatus and method for sputter...
- Patent number 5,584,972
- Issue date Dec 17, 1996
- Sony Corporation
- Alexander D. Lantsman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system with reduced particle contamination
- Patent number 5,573,597
- Issue date Nov 12, 1996
- Sony Corporation
- Alexander D. Lantsman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma sputter chamber with conductive material...
- Patent number 5,569,363
- Issue date Oct 29, 1996
- Sony Corporation
- Robert Bayer
- H01 - BASIC ELECTRIC ELEMENTS

Alexander D. Lantsman

Person

Patents Grantslast 30 patents

Apparatus and method for sputter depositing dielectric films on a s...

Soft plasma ignition in plasma processing chambers

Method and apparatus for ionized sputtering

Method and apparatus for low pressure sputtering

Apparatus for ionized sputtering

Plasma sputter etching system with reduced particle contamination

Plasma noise and arcing suppressor apparatus and method for sputter...

Plasma processing system with reduced particle contamination

Inductively coupled plasma sputter chamber with conductive material...