Alexander Hains

Person

Aurora, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
CMP composition including a novel abrasive
- Patent number 11,725,116
- Issue date Aug 15, 2023
- CMC Materials, Inc.
- Alexander W. Hains
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-stopping polishing composition and method for bulk oxide plana...
- Patent number 10,920,107
- Issue date Feb 16, 2021
- CMC Materials, Inc.
- Alexander W. Hains
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Self-stopping polishing composition and method for bulk oxide plana...
- Patent number 10,619,076
- Issue date Apr 14, 2020
- Cabot Microelectronics Corporation
- Alexander W. Hains
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-stopping polishing composition and method for bulk oxide plana...
- Patent number 10,619,075
- Issue date Apr 14, 2020
- Cabot Microelectronics Corporation
- Alexander W. Hains
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing composition comprising an amine-containing surfactant
- Patent number 10,344,186
- Issue date Jul 9, 2019
- Cabot Microelectronics Corporation
- Alexander W. Hains
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing composition containing ceria abrasive
- Patent number 9,828,528
- Issue date Nov 28, 2017
- Cabot Microelectronics Corporation
- Brian Reiss
- B24 - GRINDING POLISHING
Information Patent Grant
CMP processing composition comprising alkylamine and cyclodextrin
- Patent number 9,796,882
- Issue date Oct 24, 2017
- Cabot Microelectronics Corporation
- Alexander W. Hains
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing composition containing ceria abrasive
- Patent number 9,505,952
- Issue date Nov 29, 2016
- Cabot Microelectronics Corporation
- Brian Reiss
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
AMINE-BASED COMPOSITIONS FOR USE IN CMP WITH HIGH POLYSILICON RATE
- Publication number 20240166915
- Publication date May 23, 2024
- Entegris, Inc.
- Julianne TRUFFA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION AND METHOD FOR POLISHING BORON DOPED POLYSILICON
- Publication number 20220235247
- Publication date Jul 28, 2022
- CMC Materials, Inc.
- Brittany JOHNSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMP COMPOSITION INCLUDING A NOVEL ABRASIVE
- Publication number 20210301178
- Publication date Sep 30, 2021
- Cabot Microelectronics Corporation, n/k/a CMC Materials, Inc.
- Alexander W. HAINS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SELF-STOPPING POLISHING COMPOSITION AND METHOD
- Publication number 20210115301
- Publication date Apr 22, 2021
- Cabot Microelectronics Corporation nka CMC Materials, Inc.
- Juyeon CHANG
- C01 - INORGANIC CHEMISTRY
Information Patent Application
COMPOSITION AND METHOD FOR SELECTIVE OXIDE CMP
- Publication number 20210115302
- Publication date Apr 22, 2021
- CMC Materials, Inc.
- Brittany JOHNSON
- C01 - INORGANIC CHEMISTRY
Information Patent Application
SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANA...
- Publication number 20200190361
- Publication date Jun 18, 2020
- Cabot Microelectronics Corporation
- Alexander W. HAINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANA...
- Publication number 20190185716
- Publication date Jun 20, 2019
- Cabot Microelectronics Corporation
- Alexander W. HAINS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANA...
- Publication number 20180244956
- Publication date Aug 30, 2018
- Cabot Microelectronics Corporation
- Alexander W. HAINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITION COMPRISING AN AMINE-CONTAINING SURFACTANT
- Publication number 20170369742
- Publication date Dec 28, 2017
- Cabot Microelectronics Corporation
- Alexander W. HAINS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP PROCESSING COMPOSITION COMPRISING ALKYLAMINE AND CYCLODEXTRIN
- Publication number 20170183540
- Publication date Jun 29, 2017
- Cabot Microelectronics Corporation
- Alexander W. HAINS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION CONTAINING CERIA ABRASIVE
- Publication number 20170044403
- Publication date Feb 16, 2017
- Cabot Microelectronics Corporation
- Brian REISS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION CONTAINING CERIA ABRASIVE
- Publication number 20160257856
- Publication date Sep 8, 2016
- Cabot Microelectronics Corporation
- Brian REISS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Alexander Hains

Person

Patents Grantslast 30 patents

CMP composition including a novel abrasive

Self-stopping polishing composition and method for bulk oxide plana...

Self-stopping polishing composition and method for bulk oxide plana...

Self-stopping polishing composition and method for bulk oxide plana...

Polishing composition comprising an amine-containing surfactant

Polishing composition containing ceria abrasive

CMP processing composition comprising alkylamine and cyclodextrin

Polishing composition containing ceria abrasive

Patents Applicationslast 30 patents

AMINE-BASED COMPOSITIONS FOR USE IN CMP WITH HIGH POLYSILICON RATE

COMPOSITION AND METHOD FOR POLISHING BORON DOPED POLYSILICON

CMP COMPOSITION INCLUDING A NOVEL ABRASIVE

SELF-STOPPING POLISHING COMPOSITION AND METHOD

COMPOSITION AND METHOD FOR SELECTIVE OXIDE CMP

SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANA...

SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANA...

SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANA...

POLISHING COMPOSITION COMPRISING AN AMINE-CONTAINING SURFACTANT

CMP PROCESSING COMPOSITION COMPRISING ALKYLAMINE AND CYCLODEXTRIN

POLISHING COMPOSITION CONTAINING CERIA ABRASIVE

POLISHING COMPOSITION CONTAINING CERIA ABRASIVE