Alexander Hains

Person

Aurora, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
CMP composition including a novel abrasive
- Patent number 11,725,116
- Issue date Aug 15, 2023
- CMC Materials, Inc.
- Alexander W. Hains
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-stopping polishing composition and method for bulk oxide plana...
- Patent number 10,920,107
- Issue date Feb 16, 2021
- CMC Materials, Inc.
- Alexander W. Hains
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Self-stopping polishing composition and method for bulk oxide plana...
- Patent number 10,619,076
- Issue date Apr 14, 2020
- Cabot Microelectronics Corporation
- Alexander W. Hains
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-stopping polishing composition and method for bulk oxide plana...
- Patent number 10,619,075
- Issue date Apr 14, 2020
- Cabot Microelectronics Corporation
- Alexander W. Hains
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing composition comprising an amine-containing surfactant
- Patent number 10,344,186
- Issue date Jul 9, 2019
- Cabot Microelectronics Corporation
- Alexander W. Hains
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing composition containing ceria abrasive
- Patent number 9,828,528
- Issue date Nov 28, 2017
- Cabot Microelectronics Corporation
- Brian Reiss
- B24 - GRINDING POLISHING
Information Patent Grant
CMP processing composition comprising alkylamine and cyclodextrin
- Patent number 9,796,882
- Issue date Oct 24, 2017
- Cabot Microelectronics Corporation
- Alexander W. Hains
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing composition containing ceria abrasive
- Patent number 9,505,952
- Issue date Nov 29, 2016
- Cabot Microelectronics Corporation
- Brian Reiss
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION AND METHOD FOR POLISHING BORON DOPED POLYSILICON
- Publication number 20220235247
- Publication date Jul 28, 2022
- CMC Materials, Inc.
- Brittany JOHNSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMP COMPOSITION INCLUDING A NOVEL ABRASIVE
- Publication number 20210301178
- Publication date Sep 30, 2021
- Cabot Microelectronics Corporation, n/k/a CMC Materials, Inc.
- Alexander W. HAINS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SELF-STOPPING POLISHING COMPOSITION AND METHOD
- Publication number 20210115301
- Publication date Apr 22, 2021
- Cabot Microelectronics Corporation nka CMC Materials, Inc.
- Juyeon CHANG
- C01 - INORGANIC CHEMISTRY
Information Patent Application
COMPOSITION AND METHOD FOR SELECTIVE OXIDE CMP
- Publication number 20210115302
- Publication date Apr 22, 2021
- CMC Materials, Inc.
- Brittany JOHNSON
- C01 - INORGANIC CHEMISTRY
Information Patent Application
SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANA...
- Publication number 20200190361
- Publication date Jun 18, 2020
- Cabot Microelectronics Corporation
- Alexander W. HAINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANA...
- Publication number 20190185716
- Publication date Jun 20, 2019
- Cabot Microelectronics Corporation
- Alexander W. HAINS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANA...
- Publication number 20180244956
- Publication date Aug 30, 2018
- Cabot Microelectronics Corporation
- Alexander W. HAINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING COMPOSITION COMPRISING AN AMINE-CONTAINING SURFACTANT
- Publication number 20170369742
- Publication date Dec 28, 2017
- Cabot Microelectronics Corporation
- Alexander W. HAINS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP PROCESSING COMPOSITION COMPRISING ALKYLAMINE AND CYCLODEXTRIN
- Publication number 20170183540
- Publication date Jun 29, 2017
- Cabot Microelectronics Corporation
- Alexander W. HAINS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION CONTAINING CERIA ABRASIVE
- Publication number 20170044403
- Publication date Feb 16, 2017
- Cabot Microelectronics Corporation
- Brian REISS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION CONTAINING CERIA ABRASIVE
- Publication number 20160257856
- Publication date Sep 8, 2016
- Cabot Microelectronics Corporation
- Brian REISS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Alexander Hains

Person

Patents Grantslast 30 patents

CMP composition including a novel abrasive

Self-stopping polishing composition and method for bulk oxide plana...

Self-stopping polishing composition and method for bulk oxide plana...

Self-stopping polishing composition and method for bulk oxide plana...

Polishing composition comprising an amine-containing surfactant

Polishing composition containing ceria abrasive

CMP processing composition comprising alkylamine and cyclodextrin

Polishing composition containing ceria abrasive

Patents Applicationslast 30 patents

COMPOSITION AND METHOD FOR POLISHING BORON DOPED POLYSILICON

CMP COMPOSITION INCLUDING A NOVEL ABRASIVE

SELF-STOPPING POLISHING COMPOSITION AND METHOD

COMPOSITION AND METHOD FOR SELECTIVE OXIDE CMP

SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANA...

SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANA...

SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANA...

POLISHING COMPOSITION COMPRISING AN AMINE-CONTAINING SURFACTANT

CMP PROCESSING COMPOSITION COMPRISING ALKYLAMINE AND CYCLODEXTRIN

POLISHING COMPOSITION CONTAINING CERIA ABRASIVE

POLISHING COMPOSITION CONTAINING CERIA ABRASIVE