Alexander Hendrik Vincent Van Veen

Person

Rotterdam, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged particle blocking element, exposure apparatus comprising su...
- Patent number 11,728,123
- Issue date Aug 15, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,705,252
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Aberration correction in charged particle system
- Patent number 11,348,756
- Issue date May 31, 2022
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle blocking element, exposure apparatus comprising su...
- Patent number 11,101,099
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,094,426
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 10,586,625
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
High voltage shielding and cooling in a charged particle beam gener...
- Patent number 10,037,864
- Issue date Jul 31, 2018
- Mapper Lithography IP B.V.
- Alexander Hendrik Vincent Van Veen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle lithography system and beam generator
- Patent number 9,653,261
- Issue date May 16, 2017
- Mapper Lithography IP B.V.
- Alexander Hendrik Vincent Van Veen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography system and method of refracting
- Patent number 9,208,989
- Issue date Dec 8, 2015
- Mapper Lithography IP B.V.
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Projection lens arrangement
- Patent number 9,105,439
- Issue date Aug 11, 2015
- Mapper Lithography IP B.V.
- Marco Jan Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Modulation device and charged particle multi-beamlet lithography sy...
- Patent number 8,921,758
- Issue date Dec 30, 2014
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection lens arrangement
- Patent number 8,890,094
- Issue date Nov 18, 2014
- Mapper Lithography IP B.V.
- Marco Jan Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Modulation device and charged particle multi-beamlet lithography sy...
- Patent number 8,841,636
- Issue date Sep 23, 2014
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure system
- Patent number RE45049
- Issue date Jul 29, 2014
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- 250 - Radiant energy
Information Patent Grant
Charged particle multi-beamlet lithography system with modulation d...
- Patent number 8,759,787
- Issue date Jun 24, 2014
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure system
- Patent number RE44908
- Issue date May 27, 2014
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- 250 - Radiant energy
Information Patent Grant
Projection lens arrangement
- Patent number 8,653,485
- Issue date Feb 18, 2014
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle system comprising a manipulator device for manipul...
- Patent number 8,618,496
- Issue date Dec 31, 2013
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam modulator
- Patent number 8,604,411
- Issue date Dec 10, 2013
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle lithography system with aperture array cooling
- Patent number 8,558,196
- Issue date Oct 15, 2013
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Imaging system
- Patent number 8,502,176
- Issue date Aug 6, 2013
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle multi-beamlet lithography system with modulation d...
- Patent number 8,492,731
- Issue date Jul 23, 2013
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure system
- Patent number RE44240
- Issue date May 28, 2013
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- 250 - Radiant energy
Information Patent Grant
Projection lens arrangement
- Patent number 8,445,869
- Issue date May 21, 2013
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection lens arrangement
- Patent number 8,089,056
- Issue date Jan 3, 2012
- Mapper Lithography IP B.V.
- Marco Jan Jaco Wieland
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20230386696
- Publication date Nov 30, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
CHARGED PARTICLE BLOCKING ELEMENT, EXPOSURE APPARATUS COMPRISING SU...
- Publication number 20230335366
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABERRATION CORRECTION IN CHARGED PARTICLE SYSTEM
- Publication number 20220285124
- Publication date Sep 8, 2022
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20210383941
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
CHARGED PARTICLE BLOCKING ELEMENT, EXPOSURE APPARATUS COMPRISING SU...
- Publication number 20210384002
- Publication date Dec 9, 2021
- Alexander Hendrik Vincent VAN VEEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20200194141
- Publication date Jun 18, 2020
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
CHARGED PARTICLE BLOCKING ELEMENT, EXPOSURE APPARATUS COMPRISING SU...
- Publication number 20200194214
- Publication date Jun 18, 2020
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABERRATION CORRECTION IN CHARGED PARTICLE SYSTEM
- Publication number 20180277334
- Publication date Sep 27, 2018
- MAPPER LITHOGRAPHY IP BV
- Alexander Hendrik Vincent VAN VEEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High voltage shielding and cooling in a charged particle beam gener...
- Publication number 20170250053
- Publication date Aug 31, 2017
- MAPPER LITHOGRAPHY IP BV
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20170221674
- Publication date Aug 3, 2017
- MAPPER LITHOGRAPHY IP BV
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Charged particle lithography system and beam generator
- Publication number 20150124229
- Publication date May 7, 2015
- MAPPER LITHOGRAPHY IP BV
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle multi-beamlet lithography system with modulation d...
- Publication number 20140014850
- Publication date Jan 16, 2014
- Marco Jan-Jaco WIELAND
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION LENS ARRANGEMENT
- Publication number 20140014852
- Publication date Jan 16, 2014
- Marco Jan Jaco WIELAND
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION LENS ARRANGEMENT
- Publication number 20120061583
- Publication date Mar 15, 2012
- MAPPER LITHOGRAPHY IP BV
- Marco Jan Jaco WIELAND
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION LENS ARRANGEMENT
- Publication number 20090261267
- Publication date Oct 22, 2009
- MAPPER LITHOGRAPHY IP BV
- Marco Jan Jaco WIELAND
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION LENS ARRANGEMENT
- Publication number 20090212229
- Publication date Aug 27, 2009
- MAPPER LITHOGRAPHY IP BV
- Marco Jan Jaco WIELAND
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam exposure system
- Publication number 20040141169
- Publication date Jul 22, 2004
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY

Alexander Hendrik Vincent Van Veen

Person

Patents Grantslast 30 patents

Vacuum chamber arrangement for charged particle beam generator

Charged particle blocking element, exposure apparatus comprising su...

Vacuum chamber arrangement for charged particle beam generator

Aberration correction in charged particle system

Charged particle blocking element, exposure apparatus comprising su...

Vacuum chamber arrangement for charged particle beam generator

Vacuum chamber arrangement for charged particle beam generator

High voltage shielding and cooling in a charged particle beam gener...

Charged particle lithography system and beam generator

Lithography system and method of refracting

Projection lens arrangement

Modulation device and charged particle multi-beamlet lithography sy...

Projection lens arrangement

Modulation device and charged particle multi-beamlet lithography sy...

Electron beam exposure system

Charged particle multi-beamlet lithography system with modulation d...

Electron beam exposure system

Projection lens arrangement

Charged particle system comprising a manipulator device for manipul...

Charged particle beam modulator

Charged particle lithography system with aperture array cooling

Imaging system

Charged particle multi-beamlet lithography system with modulation d...

Electron beam exposure system

Projection lens arrangement

Projection lens arrangement

Patents Applicationslast 30 patents

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

CHARGED PARTICLE BLOCKING ELEMENT, EXPOSURE APPARATUS COMPRISING SU...

ABERRATION CORRECTION IN CHARGED PARTICLE SYSTEM

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

CHARGED PARTICLE BLOCKING ELEMENT, EXPOSURE APPARATUS COMPRISING SU...

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

CHARGED PARTICLE BLOCKING ELEMENT, EXPOSURE APPARATUS COMPRISING SU...

ABERRATION CORRECTION IN CHARGED PARTICLE SYSTEM

High voltage shielding and cooling in a charged particle beam gener...

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

Charged particle lithography system and beam generator

Charged particle multi-beamlet lithography system with modulation d...

PROJECTION LENS ARRANGEMENT

PROJECTION LENS ARRANGEMENT

PROJECTION LENS ARRANGEMENT

PROJECTION LENS ARRANGEMENT

Electron beam exposure system