Alexander Kohl

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Illumination system for illuminating a mask in a microlithographic...
- Patent number 10,191,382
- Issue date Jan 29, 2019
- Carl Zeiss SMT GmbH
- Erich Schubert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for illuminating a mask in a microlithographic...
- Patent number 9,977,333
- Issue date May 22, 2018
- Carl Zeiss SMT GmbH
- Erich Schubert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for illuminating a mask in a microlithographic...
- Patent number 9,599,904
- Issue date Mar 21, 2017
- Carl Zeiss SMT GmbH
- Erich Schubert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus illumination optics
- Patent number 9,470,981
- Issue date Oct 18, 2016
- Carl Zeiss SMT GmbH
- Alexander Kohl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for illuminating a mask in a microlithographic...
- Patent number 9,310,694
- Issue date Apr 12, 2016
- Carl Zeiss SMT GmbH
- Erich Schubert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus illumination optics
- Patent number 9,223,226
- Issue date Dec 29, 2015
- Carl Zeiss SMT GmbH
- Alexander Kohl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus illumination optics
- Patent number 9,052,611
- Issue date Jun 9, 2015
- Carl Zeiss SMT GmbH
- Alexander Kohl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging device in a projection exposure facility
- Patent number 8,514,371
- Issue date Aug 20, 2013
- Carl Zeiss SMT GmbH
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for illuminating a mask in a microlithographic...
- Patent number 8,467,031
- Issue date Jun 18, 2013
- Carl Zeiss SMT GmbH
- Erich Schubert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus illumination optics
- Patent number 8,085,382
- Issue date Dec 27, 2011
- Carl Zeiss SMT GmbH
- Alexander Kohl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging device in a projection exposure facility
- Patent number 7,961,294
- Issue date Jun 14, 2011
- Carl Zeiss SMT GmbH
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging device in a projection exposure machine
- Patent number 7,710,542
- Issue date May 4, 2010
- Carl Zeiss SMT AG
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adjustment arrangement of an optical element
- Patent number 7,656,595
- Issue date Feb 2, 2010
- Carl Zeiss SMT AG
- Klaus Beck
- G02 - OPTICS
Information Patent Grant
Optical beam transformation system and illumination system comprisi...
- Patent number 7,511,886
- Issue date Mar 31, 2009
- Carl Zeiss SMT AG
- Joerg Schultz
- G02 - OPTICS
Information Patent Grant
Imaging device in a projection exposure machine
- Patent number 7,486,382
- Issue date Feb 3, 2009
- Carl Zeiss SMT AG
- Stephan Back
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adjustment arrangement of an optical element
- Patent number 7,457,059
- Issue date Nov 25, 2008
- Carl Zeiss SMT AG
- Klaus Beck
- G02 - OPTICS
Information Patent Grant
Imaging device in a projection exposure facility
- Patent number 7,304,717
- Issue date Dec 4, 2007
- Carl Zelss SMT AG
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adjustment arrangement of an optical element
- Patent number 7,193,794
- Issue date Mar 20, 2007
- Carl Zeiss SMT AG
- Klaus Beck
- G02 - OPTICS
Information Patent Grant
Projection lens and microlithographic projection exposure apparatus
- Patent number 7,170,585
- Issue date Jan 30, 2007
- Carl Zeiss SMT AG
- Martin Brunotte
- G02 - OPTICS
Information Patent Grant
Objective, particularly a projection objective for use in semicondu...
- Patent number 7,123,427
- Issue date Oct 17, 2006
- Carl Zeiss SMT AG
- Alexander Kohl
- G02 - OPTICS
Information Patent Grant
Device for holding a beam splitter element
- Patent number 7,079,331
- Issue date Jul 18, 2006
- Carl Zeiss SMT AG
- Ulrich Weber
- G02 - OPTICS
Information Patent Grant
Method for improving the imaging properties of at least two optical...
- Patent number 7,027,237
- Issue date Apr 11, 2006
- Carl Zeiss SMT AG
- Birgit Mecking
- G02 - OPTICS
Information Patent Grant
Apparatus for tilting a carrier for optical elements
- Patent number 7,014,328
- Issue date Mar 21, 2006
- Carl Zeiss SMT AG
- Ulrich Weber
- G02 - OPTICS
Information Patent Grant
Method for improving the imaging properties of at least two optical...
- Patent number 6,963,449
- Issue date Nov 8, 2005
- Carl Zeiss SMT AG
- Birgit Mecking
- G02 - OPTICS
Information Patent Grant
Method for correcting oscillation-induced imaging errors in an obje...
- Patent number 6,943,965
- Issue date Sep 13, 2005
- Carl Zeiss SMT AG
- Alexander Kohl
- G02 - OPTICS
Information Patent Grant
Projection lens and microlithographic projection exposure apparatus
- Patent number 6,879,379
- Issue date Apr 12, 2005
- Carl Zeiss SMT AG
- Martin Brunotte
- G02 - OPTICS
Information Patent Grant
Catadioptric objective
- Patent number 6,842,294
- Issue date Jan 11, 2005
- Carl Zeiss SMT AG
- Hubert Holderer
- G02 - OPTICS
Information Patent Grant
Mounting apparatus for an optical element
- Patent number 6,816,325
- Issue date Nov 9, 2004
- Carl Zeiss SMT AG
- Jochen Becker
- G02 - OPTICS
Information Patent Grant
Optical component and method of inducing a desired alteration of an...
- Patent number 6,728,021
- Issue date Apr 27, 2004
- Carl Zeiss SMT AG
- Alexander Kohl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mounting apparatus for an optical element
- Patent number 6,580,570
- Issue date Jun 17, 2003
- Carl-Zeiss-Stiftung
- Jochen Becker
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC...
- Publication number 20180335702
- Publication date Nov 22, 2018
- Carl Zeiss SMT GMBH
- Erich Schubert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC...
- Publication number 20170351183
- Publication date Dec 7, 2017
- Carl Zeiss SMT GMBH
- Erich Schubert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC...
- Publication number 20160187789
- Publication date Jun 30, 2016
- Carl Zeiss SMT GMBH
- Erich Schubert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS ILLUMINATION OPTICS
- Publication number 20160004167
- Publication date Jan 7, 2016
- Carl Zeiss SMT GMBH
- Alexander Kohl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC...
- Publication number 20130250264
- Publication date Sep 26, 2013
- Carl Zeiss SMT GMBH
- Erich Schubert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS ILLUMINATION OPTICS
- Publication number 20120081685
- Publication date Apr 5, 2012
- Carl Zeiss SMT GMBH
- Alexander Kohl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS ILLUMINATION OPTICS
- Publication number 20120081686
- Publication date Apr 5, 2012
- Carl Zeiss SMT GMBH
- Alexander Kohl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY
- Publication number 20110199597
- Publication date Aug 18, 2011
- Carl Zeiss SMT GMBH
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC...
- Publication number 20100265482
- Publication date Oct 21, 2010
- Carl Zeiss SMT AG
- Erich Schubert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Imaging Device in a Projection Exposure Machine
- Publication number 20090141258
- Publication date Jun 4, 2009
- Carl Zeiss SMT AG
- Stephan Back
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY
- Publication number 20090040487
- Publication date Feb 12, 2009
- Carl Zeiss SMT AG
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Adjustment Arrangement of an Optical Element
- Publication number 20090009892
- Publication date Jan 8, 2009
- Carl Zeiss SMT AG
- Klaus Beck
- G02 - OPTICS
Information Patent Application
IMAGING DEVICE IN A PROJECTION EXPOSURE MACHINE
- Publication number 20080174757
- Publication date Jul 24, 2008
- Carl Zeiss SMT AG
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical measuring system, and a projection objective
- Publication number 20080100930
- Publication date May 1, 2008
- Carl Zeiss SMT AG
- Hubert Holderer
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS ILLUMINATION OPTICS
- Publication number 20080013065
- Publication date Jan 17, 2008
- Carl Zeiss SMT AG
- Alexander Kohl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADJUSTMENT ARRANGEMENT OF AN OPTICAL ELEMENT
- Publication number 20070014038
- Publication date Jan 18, 2007
- Klaus Beck
- G02 - OPTICS
Information Patent Application
Imaging device in a projection exposure machine
- Publication number 20060164619
- Publication date Jul 27, 2006
- Carl Zeiss SMT AG
- Stephan Back
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for improving the imaging properties of at least two optical...
- Publication number 20060146427
- Publication date Jul 6, 2006
- Birgit Kurz
- G02 - OPTICS
Information Patent Application
Optical beam transformation system and illumination system comprisi...
- Publication number 20060146384
- Publication date Jul 6, 2006
- Carl Zeiss SMT AG
- Joerg Schultz
- G02 - OPTICS
Information Patent Application
Objective, in particular a projection objective in microlithography
- Publication number 20060012893
- Publication date Jan 19, 2006
- Ulrich Weber
- G02 - OPTICS
Information Patent Application
Objective, especially a projection objective for microlithography
- Publication number 20050286121
- Publication date Dec 29, 2005
- Carl Zeiss SMT AG
- Ulrich Weber
- G02 - OPTICS
Information Patent Application
Projection lens and microlithographic projection exposure apparatus
- Publication number 20050264786
- Publication date Dec 1, 2005
- Martin Brunotte
- G02 - OPTICS
Information Patent Application
Method for improving the imaging properties of at least two optical...
- Publication number 20050254773
- Publication date Nov 17, 2005
- Birgit Kurz
- G02 - OPTICS
Information Patent Application
Device for holding a beam splitter element
- Publication number 20050248858
- Publication date Nov 10, 2005
- Carl Zeiss SMT AG
- Ulrich Weber
- G02 - OPTICS
Information Patent Application
PROJECTION LENS AND MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20050134967
- Publication date Jun 23, 2005
- Carl Zeiss SMT AG
- Martin Brunotte
- G02 - OPTICS
Information Patent Application
METHOD FOR IMPROVING THE IMAGING PROPERTIES OF AT LEAST TWO OPTICAL...
- Publication number 20050013012
- Publication date Jan 20, 2005
- Carl Zeiss SMT AG
- Birgit Kurz
- G02 - OPTICS
Information Patent Application
Imaging device in a projection exposure facility
- Publication number 20040263812
- Publication date Dec 30, 2004
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical measuring system, and a projection objective
- Publication number 20040257675
- Publication date Dec 23, 2004
- Carl Zeiss SMT AG
- Hubert Holderer
- G02 - OPTICS
Information Patent Application
Objective, particularly a projection objective for use in semicondu...
- Publication number 20040201909
- Publication date Oct 14, 2004
- Alexander Kohl
- G02 - OPTICS
Information Patent Application
Adjustment arrangement of an optical element
- Publication number 20040174619
- Publication date Sep 9, 2004
- Carl Zeiss SMT AG
- Klaus Beck
- G02 - OPTICS

Alexander Kohl

Person

Patents Grantslast 30 patents

Illumination system for illuminating a mask in a microlithographic...

Illumination system for illuminating a mask in a microlithographic...

Illumination system for illuminating a mask in a microlithographic...

Microlithographic projection exposure apparatus illumination optics

Illumination system for illuminating a mask in a microlithographic...

Microlithographic projection exposure apparatus illumination optics

Microlithographic projection exposure apparatus illumination optics

Imaging device in a projection exposure facility

Illumination system for illuminating a mask in a microlithographic...

Microlithographic projection exposure apparatus illumination optics

Imaging device in a projection exposure facility

Imaging device in a projection exposure machine

Adjustment arrangement of an optical element

Optical beam transformation system and illumination system comprisi...

Imaging device in a projection exposure machine

Adjustment arrangement of an optical element

Imaging device in a projection exposure facility

Adjustment arrangement of an optical element

Projection lens and microlithographic projection exposure apparatus

Objective, particularly a projection objective for use in semicondu...

Device for holding a beam splitter element

Method for improving the imaging properties of at least two optical...

Apparatus for tilting a carrier for optical elements

Method for improving the imaging properties of at least two optical...

Method for correcting oscillation-induced imaging errors in an obje...

Projection lens and microlithographic projection exposure apparatus

Catadioptric objective

Mounting apparatus for an optical element

Optical component and method of inducing a desired alteration of an...

Mounting apparatus for an optical element

Patents Applicationslast 30 patents

ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC...

ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC...

ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS ILLUMINATION OPTICS

ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS ILLUMINATION OPTICS

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS ILLUMINATION OPTICS

IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY

ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC...

Imaging Device in a Projection Exposure Machine

IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY

Adjustment Arrangement of an Optical Element

IMAGING DEVICE IN A PROJECTION EXPOSURE MACHINE

Optical measuring system, and a projection objective

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS ILLUMINATION OPTICS

ADJUSTMENT ARRANGEMENT OF AN OPTICAL ELEMENT

Imaging device in a projection exposure machine

Method for improving the imaging properties of at least two optical...

Optical beam transformation system and illumination system comprisi...

Objective, in particular a projection objective in microlithography

Objective, especially a projection objective for microlithography

Projection lens and microlithographic projection exposure apparatus

Method for improving the imaging properties of at least two optical...

Device for holding a beam splitter element

PROJECTION LENS AND MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

METHOD FOR IMPROVING THE IMAGING PROPERTIES OF AT LEAST TWO OPTICAL...

Imaging device in a projection exposure facility

Optical measuring system, and a projection objective

Objective, particularly a projection objective for use in semicondu...

Adjustment arrangement of an optical element