Alexander Kremer

Person

Stamford, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus and ultraviolet radiation control system
- Patent number 12,124,172
- Issue date Oct 22, 2024
- ASML Holding N.V.
- Alexander Kremer
- G01 - MEASURING TESTING
Information Patent Grant
Light attenuating filter for correcting field dependent ellipticity...
- Patent number 7,843,549
- Issue date Nov 30, 2010
- ASML Holding N.V.
- Alexander Kremer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for uniformity correction
- Patent number 7,525,641
- Issue date Apr 28, 2009
- ASML Holding N.V.
- Richard C. Zimmerman
- G02 - OPTICS
Information Patent Grant
Uniformity correction for lithographic apparatus
- Patent number 7,362,413
- Issue date Apr 22, 2008
- ASML Netherlands B.V.
- Alexander Kremer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
De-focus uniformity correction
- Patent number 7,333,176
- Issue date Feb 19, 2008
- ASML Holding N.V.
- Roberto B. Wiener
- G02 - OPTICS
Information Patent Grant
Method for calculating an intensity integral for use in lithography...
- Patent number 7,173,688
- Issue date Feb 6, 2007
- ASML Holding N.V.
- Roberto B. Wiener
- G02 - OPTICS
Information Patent Grant
System for laser beam expansion without expanding spatial coherence
- Patent number 7,027,129
- Issue date Apr 11, 2006
- ASML Holding N.V.
- Alexander Kremer
- G02 - OPTICS
Information Patent Grant
System for laser beam expansion without expanding spatial coherence
- Patent number 6,801,299
- Issue date Oct 5, 2004
- ASML Holding N.V.
- Alexander Kremer
- G02 - OPTICS
Information Patent Grant
Method and apparatus for providing astigmatism-reduced images with...
- Patent number 5,579,106
- Issue date Nov 26, 1996
- Oriel Corporation
- Alexander Kremer
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Lithographic Apparatus and Ultraviolet Radiation Control System
- Publication number 20220291594
- Publication date Sep 15, 2022
- ASML NETHERLANDS B.V.
- Alexander KREMER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Light Attenuating Filter for Correcting Field Dependent Ellipticity...
- Publication number 20080291422
- Publication date Nov 27, 2008
- ASML Holding N.V.
- Alexander Kremer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
De-focus uniformity correction
- Publication number 20070109518
- Publication date May 17, 2007
- ASML Holding N.V.
- Roberto B. Wiener
- G02 - OPTICS
Information Patent Application
System and method for uniformity correction
- Publication number 20070103665
- Publication date May 10, 2007
- ASML Holding N.V.
- Richard C. Zimmerman
- G02 - OPTICS
Information Patent Application
De-focus uniformity correction
- Publication number 20060139608
- Publication date Jun 29, 2006
- ASML Holding N.V.
- Roberto B. Wiener
- G02 - OPTICS
Information Patent Application
Uniformity correction for lithographic apparatus
- Publication number 20060126036
- Publication date Jun 15, 2006
- ASML NETHERLANDS B.V.
- Alexander Kremer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System for laser beam expansion without expanding spatial coherence
- Publication number 20050036125
- Publication date Feb 17, 2005
- ASML Holding N.V.
- Alexander Kremer
- G02 - OPTICS
Information Patent Application
System and method for laser beam expansion without expanding spatia...
- Publication number 20040021842
- Publication date Feb 5, 2004
- ASML US, Inc.
- Alexander Kremer
- G02 - OPTICS

Alexander Kremer

Person

Patents Grantslast 30 patents

Lithographic apparatus and ultraviolet radiation control system

Light attenuating filter for correcting field dependent ellipticity...

System and method for uniformity correction

Uniformity correction for lithographic apparatus

De-focus uniformity correction

Method for calculating an intensity integral for use in lithography...

System for laser beam expansion without expanding spatial coherence

System for laser beam expansion without expanding spatial coherence

Method and apparatus for providing astigmatism-reduced images with...

Patents Applicationslast 30 patents

Lithographic Apparatus and Ultraviolet Radiation Control System

Light Attenuating Filter for Correcting Field Dependent Ellipticity...

De-focus uniformity correction

System and method for uniformity correction

De-focus uniformity correction

Uniformity correction for lithographic apparatus

System for laser beam expansion without expanding spatial coherence

System and method for laser beam expansion without expanding spatia...