Alexander Kuznetsov

Person

Mountain View, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Soft x-ray optics with improved filtering
- Patent number 12,025,575
- Issue date Jul 2, 2024
- KLA Corporation
- Alexander Kuznetsov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Self-calibrating overlay metrology
- Patent number 11,880,142
- Issue date Jan 23, 2024
- KLA Corporation
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bandgap measurements of patterned film stacks using spectroscopic m...
- Patent number 11,796,390
- Issue date Oct 24, 2023
- KLA Corporation
- Tianhan Wang
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems for overlay measurement based on soft X-ray Sca...
- Patent number 11,698,251
- Issue date Jul 11, 2023
- KLA Corporation
- Andrei V. Shchegrov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-calibrated overlay metrology using a skew training sample
- Patent number 11,604,063
- Issue date Mar 14, 2023
- KLA Corporation
- Stilian Pandev
- G01 - MEASURING TESTING
Information Patent Grant
Self-calibrating overlay metrology
- Patent number 11,604,420
- Issue date Mar 14, 2023
- KLA Corporation
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for combined reflectometry and photoelectron sp...
- Patent number 11,536,674
- Issue date Dec 27, 2022
- KLA Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems for semiconductor metrology based on wavelength...
- Patent number 11,460,418
- Issue date Oct 4, 2022
- KLA Corporation
- Alexander Kuznetsov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bandgap measurements of patterned film stacks using spectroscopic m...
- Patent number 11,378,451
- Issue date Jul 5, 2022
- KLA Corporation
- Tianhan Wang
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems for semiconductor metrology based on polychroma...
- Patent number 11,333,621
- Issue date May 17, 2022
- KLA-Tencor Corporation
- Daniel Wack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement methodology of advanced nanostructures
- Patent number 11,156,548
- Issue date Oct 26, 2021
- KLA-Tencor Corporation
- Manh Nguyen
- G05 - CONTROLLING REGULATING
Information Patent Grant
Soft x-ray optics with improved filtering
- Patent number 11,143,604
- Issue date Oct 12, 2021
- KLA Corporation
- Alexander Kuznetsov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Methods and systems for characterization of an x-ray beam with high...
- Patent number 11,073,487
- Issue date Jul 27, 2021
- KLA-Tencor Corporation
- Alexander Bykanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement models of nanowire semiconductor structures based on re...
- Patent number 11,036,898
- Issue date Jun 15, 2021
- KLA-Tencor Corporation
- Houssam Chouaib
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
On-device metrology using target decomposition
- Patent number 10,983,227
- Issue date Apr 20, 2021
- KLA-Tencor Corporation
- John Hench
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for combined x-ray reflectometry and photoelect...
- Patent number 10,895,541
- Issue date Jan 19, 2021
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G02 - OPTICS
Information Patent Grant
Multilayer targets for calibration and alignment of X-ray based mea...
- Patent number 10,816,486
- Issue date Oct 27, 2020
- KLA-Tencor Corporation
- Nikolay Artemiev
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems for co-located metrology
- Patent number 10,804,167
- Issue date Oct 13, 2020
- KLA-Tencor Corporation
- David Y. Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Integrated use of model-based metrology and a process model
- Patent number 10,769,320
- Issue date Sep 8, 2020
- KLA-Tencor Corporation
- Alexander Kuznetsov
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Hybrid metrology for patterned wafer characterization
- Patent number 10,712,145
- Issue date Jul 14, 2020
- KLA-Tencor Corporation
- Boxue Chen
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor metrology and defect classification using electron mi...
- Patent number 10,580,673
- Issue date Mar 3, 2020
- KLA Corporation
- Stilian Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and apparatus for patterned wafer characterization
- Patent number 10,502,694
- Issue date Dec 10, 2019
- KLA-Tencor Corporation
- Thaddeus Gerard Dziura
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor metrology with information from multiple processing s...
- Patent number 10,504,759
- Issue date Dec 10, 2019
- KLA-Tencor Corporation
- Alexander Kuznetsov
- G01 - MEASURING TESTING
Information Patent Grant
Signal response metrology for scatterometry based overlay measurements
- Patent number 10,352,876
- Issue date Jul 16, 2019
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology of multiple patterning processes
- Patent number 10,215,559
- Issue date Feb 26, 2019
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING
Information Patent Grant
Compressive sensing for metrology
- Patent number 10,062,157
- Issue date Aug 28, 2018
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Compressive sensing for metrology
- Patent number 9,518,916
- Issue date Dec 13, 2016
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING
Information Patent Grant
Method of electromagnetic modeling of finite structures and finite...
- Patent number 9,291,554
- Issue date Mar 22, 2016
- KLA-Tencor Corporation
- Alexander Kuznetsov
- G01 - MEASURING TESTING
Information Patent Grant
Metrology system optimization for parameter tracking
- Patent number 9,255,877
- Issue date Feb 9, 2016
- KLA-Tencor Corporation
- Andrei Veldman
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology of periodic targets in presence of multiple diffr...
- Patent number 9,243,886
- Issue date Jan 26, 2016
- KLA-Tencor Corporation
- Alexander Kuznetsov
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Soft X-Ray Optics With Improved Filtering
- Publication number 20240288388
- Publication date Aug 29, 2024
- KLA Corporation
- Alexander Kuznetsov
- G01 - MEASURING TESTING
Information Patent Application
Methods And Systems For Monitoring Metrology Fleet Productivity
- Publication number 20240142948
- Publication date May 2, 2024
- KLA Corporation
- Alexander Kuznetsov
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SELF-CALIBRATING OVERLAY METROLOGY
- Publication number 20230221656
- Publication date Jul 13, 2023
- KLA Corporation
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Continuous Machine Learning Model Training for Semiconductor Manufa...
- Publication number 20230128610
- Publication date Apr 27, 2023
- KLA Corporation
- Liran Yerushalmi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Systems and Methods for Improved Computer Vision in On-Device Appli...
- Publication number 20230091374
- Publication date Mar 23, 2023
- Google LLC
- Qifei Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SELF-CALIBRATED OVERLAY METROLOGY USING A SKEW TRAINING SAMPLE
- Publication number 20220412734
- Publication date Dec 29, 2022
- Stilian Pandev
- G01 - MEASURING TESTING
Information Patent Application
SELF-CALIBRATING OVERLAY METROLOGY
- Publication number 20220357673
- Publication date Nov 10, 2022
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Bandgap Measurements of Patterned Film Stacks Using Spectroscopic M...
- Publication number 20220349752
- Publication date Nov 3, 2022
- KLA Corporation
- Tianhan Wang
- G01 - MEASURING TESTING
Information Patent Application
Soft X-Ray Optics With Improved Filtering
- Publication number 20210404979
- Publication date Dec 30, 2021
- KLA Corporation
- Alexander Kuznetsov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Soft X-Ray Optics With Improved Filtering
- Publication number 20210310968
- Publication date Oct 7, 2021
- KLA Corporation
- Alexander Kuznetsov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Methods And Systems For Overlay Measurement Based On Soft X-Ray Sca...
- Publication number 20210207956
- Publication date Jul 8, 2021
- KLA Corporation
- Andrei V. Shchegrov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods And Systems For Semiconductor Metrology Based On Wavelength...
- Publication number 20210063329
- Publication date Mar 4, 2021
- KLA Corporation
- Alexander Kuznetsov
- G01 - MEASURING TESTING
Information Patent Application
Systems And Methods For Combined Reflectometry And Photoelectron Sp...
- Publication number 20210055237
- Publication date Feb 25, 2021
- KLA Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
Methods And Systems For Co-Located Metrology
- Publication number 20200243400
- Publication date Jul 30, 2020
- KLA-Tencor Corporation
- David Y. Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM, METHOD AND COMPUTER PROGRAM PRODUCT FOR FAST AUTOMATIC DETE...
- Publication number 20200025554
- Publication date Jan 23, 2020
- KLA-Tencor Corporation
- Antonio A. Gellineau
- G01 - MEASURING TESTING
Information Patent Application
Multilayer Targets For Calibration And Alignment Of X-Ray Based Mea...
- Publication number 20190302039
- Publication date Oct 3, 2019
- KLA-Tencor Corporation
- Nikolay Artemiev
- G01 - MEASURING TESTING
Information Patent Application
Measurement Models Of Nanowire Semiconductor Structures Based On Re...
- Publication number 20190286787
- Publication date Sep 19, 2019
- KLA-Tencor Corporation
- Houssam Chouaib
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Semiconductor Metrology and Defect Classification Using Electron Mi...
- Publication number 20190214285
- Publication date Jul 11, 2019
- KLA-Tencor Corporation
- Stilian Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Systems And Methods For Combined X-Ray Reflectometry And Photoelect...
- Publication number 20190212281
- Publication date Jul 11, 2019
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Measurement Methodology of Advanced Nanostructures
- Publication number 20190178788
- Publication date Jun 13, 2019
- KLA-Tencor Corporation
- Manh Nguyen
- G05 - CONTROLLING REGULATING
Information Patent Application
On-Device Metrology Using Target Decomposition
- Publication number 20190049602
- Publication date Feb 14, 2019
- KLA-Tencor Corporation
- John Hench
- G01 - MEASURING TESTING
Information Patent Application
Bandgap Measurements of Patterned Film Stacks Using Spectroscopic M...
- Publication number 20190041266
- Publication date Feb 7, 2019
- KLA-Tencor Corporation
- Tianhan Wang
- G01 - MEASURING TESTING
Information Patent Application
Methods And Systems For Semiconductor Metrology Based On Polychroma...
- Publication number 20190017946
- Publication date Jan 17, 2019
- KLA-Tencor Corporation
- Daniel Wack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods And Systems For Characterization Of An X-Ray Beam With High...
- Publication number 20180328868
- Publication date Nov 15, 2018
- KLA-Tencor Corporation
- Alexander Bykanov
- G01 - MEASURING TESTING
Information Patent Application
Hybrid Metrology For Patterned Wafer Characterization
- Publication number 20180112968
- Publication date Apr 26, 2018
- KLA-Tencor Corporation
- Boxue Chen
- G01 - MEASURING TESTING
Information Patent Application
Semiconductor Metrology With Information From Multiple Processing S...
- Publication number 20170287751
- Publication date Oct 5, 2017
- KLA-Tencor Corporation
- Alexander Kuznetsov
- G01 - MEASURING TESTING
Information Patent Application
COMPRESSIVE SENSING FOR METROLOGY
- Publication number 20170076440
- Publication date Mar 16, 2017
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INSPECTION SYSTEM AND METHOD USING AN OFF-AXIS UNOBSCURED OBJECTIVE...
- Publication number 20160139032
- Publication date May 19, 2016
- KLA-Tencor Corporation
- Claudio Rampoldi
- G01 - MEASURING TESTING
Information Patent Application
Metrology Of Multiple Patterning Processes
- Publication number 20160109230
- Publication date Apr 21, 2016
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING
Information Patent Application
Signal Response Metrology For Scatterometry Based Overlay Measurements
- Publication number 20150323316
- Publication date Nov 12, 2015
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING

Alexander Kuznetsov

Person

Patents Grantslast 30 patents

Soft x-ray optics with improved filtering

Self-calibrating overlay metrology

Bandgap measurements of patterned film stacks using spectroscopic m...

Methods and systems for overlay measurement based on soft X-ray Sca...

Self-calibrated overlay metrology using a skew training sample

Self-calibrating overlay metrology

Systems and methods for combined reflectometry and photoelectron sp...

Methods and systems for semiconductor metrology based on wavelength...

Bandgap measurements of patterned film stacks using spectroscopic m...

Methods and systems for semiconductor metrology based on polychroma...

Measurement methodology of advanced nanostructures

Soft x-ray optics with improved filtering

Methods and systems for characterization of an x-ray beam with high...

Measurement models of nanowire semiconductor structures based on re...

On-device metrology using target decomposition

Systems and methods for combined x-ray reflectometry and photoelect...

Multilayer targets for calibration and alignment of X-ray based mea...

Methods and systems for co-located metrology

Integrated use of model-based metrology and a process model

Hybrid metrology for patterned wafer characterization

Semiconductor metrology and defect classification using electron mi...

Methods and apparatus for patterned wafer characterization

Semiconductor metrology with information from multiple processing s...

Signal response metrology for scatterometry based overlay measurements

Metrology of multiple patterning processes

Compressive sensing for metrology

Compressive sensing for metrology

Method of electromagnetic modeling of finite structures and finite...

Metrology system optimization for parameter tracking

Optical metrology of periodic targets in presence of multiple diffr...

Patents Applicationslast 30 patents

Soft X-Ray Optics With Improved Filtering

Methods And Systems For Monitoring Metrology Fleet Productivity

SELF-CALIBRATING OVERLAY METROLOGY

Continuous Machine Learning Model Training for Semiconductor Manufa...

Systems and Methods for Improved Computer Vision in On-Device Appli...

SELF-CALIBRATED OVERLAY METROLOGY USING A SKEW TRAINING SAMPLE

SELF-CALIBRATING OVERLAY METROLOGY

Bandgap Measurements of Patterned Film Stacks Using Spectroscopic M...

Soft X-Ray Optics With Improved Filtering

Soft X-Ray Optics With Improved Filtering

Methods And Systems For Overlay Measurement Based On Soft X-Ray Sca...

Methods And Systems For Semiconductor Metrology Based On Wavelength...

Systems And Methods For Combined Reflectometry And Photoelectron Sp...

Methods And Systems For Co-Located Metrology

SYSTEM, METHOD AND COMPUTER PROGRAM PRODUCT FOR FAST AUTOMATIC DETE...

Multilayer Targets For Calibration And Alignment Of X-Ray Based Mea...

Measurement Models Of Nanowire Semiconductor Structures Based On Re...

Semiconductor Metrology and Defect Classification Using Electron Mi...

Systems And Methods For Combined X-Ray Reflectometry And Photoelect...

Measurement Methodology of Advanced Nanostructures

On-Device Metrology Using Target Decomposition

Bandgap Measurements of Patterned Film Stacks Using Spectroscopic M...

Methods And Systems For Semiconductor Metrology Based On Polychroma...

Methods And Systems For Characterization Of An X-Ray Beam With High...

Hybrid Metrology For Patterned Wafer Characterization

Semiconductor Metrology With Information From Multiple Processing S...

COMPRESSIVE SENSING FOR METROLOGY

INSPECTION SYSTEM AND METHOD USING AN OFF-AXIS UNOBSCURED OBJECTIVE...

Metrology Of Multiple Patterning Processes

Signal Response Metrology For Scatterometry Based Overlay Measurements