Alexander Matthijs Struycken

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Optical device and associated system
- Patent number 10,712,667
- Issue date Jul 14, 2020
- ASML Netherlands B.V.
- Sumant Sukdew Ramanujan Oemrawsingh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source
- Patent number 10,222,702
- Issue date Mar 5, 2019
- ASML Netherlands B.V.
- Arno Jan Bleeker
- G02 - OPTICS
Information Patent Grant
Radiation collector, radiation source and lithographic apparatus
- Patent number 9,983,482
- Issue date May 29, 2018
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for generating radiation
- Patent number 9,986,628
- Issue date May 29, 2018
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element mount for lithographic apparatus
- Patent number 9,335,641
- Issue date May 10, 2016
- ASML Netherlands B.V.
- Henricus Gerardus Tegenbosch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ex-situ removal of deposition on an optical element
- Patent number 8,598,550
- Issue date Dec 3, 2013
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ex-situ removal of deposition on an optical element
- Patent number 8,134,136
- Issue date Mar 13, 2012
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- B08 - CLEANING
Information Patent Grant
Lithographic apparatus, device manufacturing method, and use of a r...
- Patent number 7,897,941
- Issue date Mar 1, 2011
- ASML Netherlands B.V.
- Johannes Christiaan Leonardus Franken
- F24 - HEATING RANGES VENTILATING
Information Patent Grant
Ex-situ removal of deposition on an optical element
- Patent number 7,767,989
- Issue date Aug 3, 2010
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- B08 - CLEANING
Information Patent Grant
Contamination prevention system, lithographic apparatus, radiation...
- Patent number 7,602,472
- Issue date Oct 13, 2009
- ASML Netherlands B.V.
- Edwin Johan Buis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source
- Patent number 7,501,642
- Issue date Mar 10, 2009
- ASML Netherlands B.V.
- Johannes Hubertus Josephina Moors
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lithographic apparatus, device manufacturing method, and use of a r...
- Patent number 7,462,841
- Issue date Dec 9, 2008
- ASML Netherlands B.V.
- Johannes Christiaan Leonardus Franken
- F24 - HEATING RANGES VENTILATING
Information Patent Grant
Ex-situ removal of deposition on an optical element
- Patent number 7,372,058
- Issue date May 13, 2008
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- B08 - CLEANING
Information Patent Grant
Lithographic apparatus, measurement system, and device manufacturin...
- Patent number 7,102,729
- Issue date Sep 5, 2006
- ASML Netherlands B.V.
- Michael Jozef Mathijs Renkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
An Optical Device and Associated Systems
- Publication number 20190377267
- Publication date Dec 12, 2019
- ASML NETHERLANDS B.V.
- Sumant Sukdew Ramanujan OEMRAWSINGH
- G02 - OPTICS
Information Patent Application
Radiation Source
- Publication number 20180031979
- Publication date Feb 1, 2018
- ASML NETHERLANDS B.V.
- Arno Jan BLEEKER
- G02 - OPTICS
Information Patent Application
Radiation Collector, Radiation Source and Lithographic Apparatus
- Publication number 20160041374
- Publication date Feb 11, 2016
- ASML NETHERLANDS B.V.
- Ivo VANDERHALLEN
- G02 - OPTICS
Information Patent Application
Radiation Collector, Radiation Source and Lithographic Apparatus
- Publication number 20160026091
- Publication date Jan 28, 2016
- ASML NETHERLANDS B.V.
- Erik Roelof LOOPSTRA
- G02 - OPTICS
Information Patent Application
Method and Apparatus for Generating Radiation
- Publication number 20150296602
- Publication date Oct 15, 2015
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EX-SITU REMOVAL OF DEPOSITION ON AN OPTICAL ELEMENT
- Publication number 20120140196
- Publication date Jun 7, 2012
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- B08 - CLEANING
Information Patent Application
OPTICAL ELEMENT MOUNT FOR LITHOGRAPHIC APPARATUS
- Publication number 20110205517
- Publication date Aug 25, 2011
- ASML NETHERLANDS B.V.
- Henricus Gerardus Tegenbosch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING M...
- Publication number 20110122389
- Publication date May 26, 2011
- ASML NETHERLANDS B.V.
- Michel Fransois Hubert Klaassen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EX-SITU REMOVAL OF DEPOSITION ON AN OPTICAL ELEMENT
- Publication number 20100290015
- Publication date Nov 18, 2010
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- B08 - CLEANING
Information Patent Application
Lithographic apparatus, device manufacturing method, and use of a r...
- Publication number 20090066924
- Publication date Mar 12, 2009
- ASML NETHERLANDS B.V.
- Johannes Christiaan Leonardus Franken
- F24 - HEATING RANGES VENTILATING
Information Patent Application
Contamination prevention system, lithographic apparatus, radiation...
- Publication number 20080309893
- Publication date Dec 18, 2008
- ASML NETHERLANDS B.V.
- Edwin Johan Buis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation source
- Publication number 20070152175
- Publication date Jul 5, 2007
- ASML NETHERLANDS B.V.
- Johannes Hubertus Josephina Moors
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Lithographic apparatus, device manufacturing method, and use of a r...
- Publication number 20070085043
- Publication date Apr 19, 2007
- ASML NETHERLANDS B.V.
- Johannes Christiaan Leonardus Franken
- F24 - HEATING RANGES VENTILATING
Information Patent Application
Ex-situ removal of deposition on an optical element
- Publication number 20070069160
- Publication date Mar 29, 2007
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- B08 - CLEANING
Information Patent Application
Ex-situ removal of deposition on an optical element
- Publication number 20070069162
- Publication date Mar 29, 2007
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- B08 - CLEANING
Information Patent Application
Lithographic apparatus, measurement system, and device manufacturin...
- Publication number 20050168714
- Publication date Aug 4, 2005
- ASML NETHERLANDS B.V.
- Michael Jozef Mathijs Renkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Alexander Matthijs Struycken

Person

Patents Grantslast 30 patents

Optical device and associated system

Radiation source

Radiation collector, radiation source and lithographic apparatus

Method and apparatus for generating radiation

Optical element mount for lithographic apparatus

Ex-situ removal of deposition on an optical element

Ex-situ removal of deposition on an optical element

Lithographic apparatus, device manufacturing method, and use of a r...

Ex-situ removal of deposition on an optical element

Contamination prevention system, lithographic apparatus, radiation...

Radiation source

Lithographic apparatus, device manufacturing method, and use of a r...

Ex-situ removal of deposition on an optical element

Lithographic apparatus, measurement system, and device manufacturin...

Patents Applicationslast 30 patents

An Optical Device and Associated Systems

Radiation Source

Radiation Collector, Radiation Source and Lithographic Apparatus

Radiation Collector, Radiation Source and Lithographic Apparatus

Method and Apparatus for Generating Radiation

EX-SITU REMOVAL OF DEPOSITION ON AN OPTICAL ELEMENT

OPTICAL ELEMENT MOUNT FOR LITHOGRAPHIC APPARATUS

RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING M...

EX-SITU REMOVAL OF DEPOSITION ON AN OPTICAL ELEMENT

Lithographic apparatus, device manufacturing method, and use of a r...

Contamination prevention system, lithographic apparatus, radiation...

Radiation source

Lithographic apparatus, device manufacturing method, and use of a r...

Ex-situ removal of deposition on an optical element

Ex-situ removal of deposition on an optical element

Lithographic apparatus, measurement system, and device manufacturin...