Alexander Matyushkin

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Electrostatic chucks with coolant gas zones and corresponding groov...
- Patent number 11,942,351
- Issue date Mar 26, 2024
- Lam Research Corporation
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chucks with coolant gas zones and corresponding groov...
- Patent number 11,664,262
- Issue date May 30, 2023
- Lam Research Corporation
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic Chuck design for cooling-gas light-up prevention
- Patent number 11,651,991
- Issue date May 16, 2023
- Lam Research Corporation
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with features for preventing electrical arcing...
- Patent number 11,069,553
- Issue date Jul 20, 2021
- Lam Research Corporation
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck design for cooling-gas light-up prevention
- Patent number 11,024,532
- Issue date Jun 1, 2021
- Lam Research Corporation
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly incorporation a gasket for distributin...
- Patent number 10,804,129
- Issue date Oct 13, 2020
- Lam Research Corporation
- Christopher Kimball
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support assembly
- Patent number 10,257,887
- Issue date Apr 9, 2019
- Applied Materials, Inc.
- Alexander Matyushkin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Electrostatic chuck design for cooling-gas light-up prevention
- Patent number 10,083,853
- Issue date Sep 25, 2018
- Lam Research Corporation
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
ESC assembly including an electrically conductive gasket for unifor...
- Patent number 10,002,782
- Issue date Jun 19, 2018
- Lam Research Corporation
- Christopher Kimball
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support assembly having rapid temperature control
- Patent number 9,883,549
- Issue date Jan 30, 2018
- Applied Materials, Inc.
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing with rapid temperature gradient control
- Patent number 9,275,887
- Issue date Mar 1, 2016
- Applied Materials, Inc.
- Alexander Matyushkin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Electrostatic chuck having a plurality of heater coils
- Patent number 8,663,391
- Issue date Mar 4, 2014
- Applied Materials, Inc.
- Alexander Matyushkin
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate support with electrostatic chuck having dual temperature...
- Patent number 8,226,769
- Issue date Jul 24, 2012
- Applied Materials, Inc.
- Alexander Matyushkin
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Heat transfer assembly
- Patent number 7,846,254
- Issue date Dec 7, 2010
- Applied Materials, Inc.
- Boris S. Yendler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process using combined capacitively and inductively coupled plasma...
- Patent number 7,780,864
- Issue date Aug 24, 2010
- Applied Materials, Inc.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual plasma source process using a variable frequency capacitively...
- Patent number 7,727,413
- Issue date Jun 1, 2010
- Applied Materials, Inc.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor apparatus with a VHF capacitively coupled plasma sou...
- Patent number 7,645,357
- Issue date Jan 12, 2010
- Applied Materials, Inc.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling temperature of a substrate
- Patent number 7,436,645
- Issue date Oct 14, 2008
- Applied Materials, Inc.
- John Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor apparatus with independent capacitive and toroidal p...
- Patent number 7,264,688
- Issue date Sep 4, 2007
- Applied Materials, Inc.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH POWER ELECTROSTATIC CHUCK WITH FEATURES PREVENTING HE HOLE LIG...
- Publication number 20240404798
- Publication date Dec 5, 2024
- LAM RESEARCH CORPORATION
- Alexander MATYUSHKIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCKS WITH COOLANT GAS ZONES AND CORRESPONDING GROOV...
- Publication number 20240347366
- Publication date Oct 17, 2024
- LAM RESEARCH CORPORATION
- Alexander MATYUSHKIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RING STRUCTURES AND SYSTEMS FOR USE IN A PLASMA CHAMBER
- Publication number 20240266151
- Publication date Aug 8, 2024
- LAM RESEARCH CORPORATION
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RING STRUCTURES AND SYSTEMS FOR USE IN A PLASMA CHAMBER
- Publication number 20240162015
- Publication date May 16, 2024
- LAM RESEARCH CORPORATION
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW FREQUENCY RF GENERATOR AND ASSOCIATED ELECTROSTATIC CHUCK
- Publication number 20230274914
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCKS WITH COOLANT GAS ZONES AND CORRESPONDING GROOV...
- Publication number 20230260816
- Publication date Aug 17, 2023
- LAM RESEARCH CORPORATION
- Alexander MATYUSHKIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT WITH UNIFORM TEMPERATURE ACROSS A SUBSTRATE
- Publication number 20230253193
- Publication date Aug 10, 2023
- LAM RESEARCH CORPORATION
- Jeremy George SMITH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COOLED EDGE RING WITH INTEGRATED SEALS
- Publication number 20230133798
- Publication date May 4, 2023
- LAM RESEARCH CORPORATION
- Adam Christopher MACE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COOLANT CHANNEL WITH INTERNAL FINS FOR SUBSTRATE PROCESSING PEDESTALS
- Publication number 20230087913
- Publication date Mar 23, 2023
- LAM RESEARCH CORPORATION
- Feng WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC EDGE RING MOUNTING SYSTEM FOR SUBSTRATE PROCESSING
- Publication number 20230075462
- Publication date Mar 9, 2023
- LAM RESEARCH CORPORATION
- Alexander MATYUSHKIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER ELECTROSTATIC CHUCK WITH FEATURES PREVENTING HE HOLE LIG...
- Publication number 20220223387
- Publication date Jul 14, 2022
- Alexander MATYUSHKIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK DESIGN FOR COOLING-GAS LIGHT-UP PREVENTION
- Publication number 20210296099
- Publication date Sep 23, 2021
- LAM RESEARCH CORPORATION
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCKS WITH COOLANT GAS ZONES AND CORRESPONDING GROOV...
- Publication number 20210005494
- Publication date Jan 7, 2021
- LAM RESEARCH CORPORATION
- Alexander MATYUSHKIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ring Structures and Systems for Use in a Plasma Chamber
- Publication number 20200365378
- Publication date Nov 19, 2020
- LAM RESEARCH CORPORATION
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK DESIGN FOR COOLING-GAS LIGHT-UP PREVENTION
- Publication number 20190006225
- Publication date Jan 3, 2019
- LAM RESEARCH CORPORATION
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK WITH FLEXIBLE WAFER TEMPERATURE CONTROL
- Publication number 20180286642
- Publication date Oct 4, 2018
- LAM RESEARCH CORPORATION
- Alexander MATYUSHKIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATIC CHUCK ASSEMBLY INCORPORATING A GASKET FOR DISTRIBUTIN...
- Publication number 20180277412
- Publication date Sep 27, 2018
- Christopher KIMBALL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT ASSEMBLY
- Publication number 20180103508
- Publication date Apr 12, 2018
- Applied Materials, Inc.
- Alexander Matyushkin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
ELECTROSTATIC CHUCK WITH FEATURES FOR PREVENTING ELECTRICAL ARCING...
- Publication number 20180012785
- Publication date Jan 11, 2018
- LAM RESEARCH CORPORATION
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK DESIGN FOR COOLING-GAS LIGHT-UP PREVENTION
- Publication number 20170110356
- Publication date Apr 20, 2017
- LAM RESEARCH CORPORATION
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT ASSEMBLY HAVING RAPID TEMPERATURE CONTROL
- Publication number 20160135252
- Publication date May 12, 2016
- Applied Materials, Inc.
- Alexander MATYUSHKIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ESC ASSEMBLY INCLUDING AN ELECTRICALLY CONDUCTIVE GASKET FOR UNIFOR...
- Publication number 20160111314
- Publication date Apr 21, 2016
- Lam Research Corporation
- Christopher Kimball
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK HAVING A PLURALITY OF HEATER COILS
- Publication number 20120285619
- Publication date Nov 15, 2012
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH REACTOR SUITABLE FOR ETCHING HIGH ASPECT RATIO FEATURES
- Publication number 20100099266
- Publication date Apr 22, 2010
- Applied Materials, Inc.
- Manfred Oswald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE CATHODE FOR PLASMA ETCHING
- Publication number 20090014323
- Publication date Jan 15, 2009
- Boris Yendler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING WITH RAPID TEMPERATURE GRADIENT CONTROL
- Publication number 20080017104
- Publication date Jan 24, 2008
- APPLIED MATERIALS, INC.
- Alexander Matyushkin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE SUPPORT WITH ELECTROSTATIC CHUCK HAVING DUAL TEMPERATURE...
- Publication number 20070258186
- Publication date Nov 8, 2007
- APPLIED MATERIALS, INC.
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual plasma source process using a variable frequency capacitively...
- Publication number 20070245961
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor apparatus with a toroidal plasma source and a VHF ca...
- Publication number 20070246161
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process using combined capacitively and inductively coupled plasma...
- Publication number 20070246443
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS

Alexander Matyushkin

Person

Patents Grantslast 30 patents

Electrostatic chucks with coolant gas zones and corresponding groov...

Electrostatic chucks with coolant gas zones and corresponding groov...

Electrostatic Chuck design for cooling-gas light-up prevention

Electrostatic chuck with features for preventing electrical arcing...

Electrostatic chuck design for cooling-gas light-up prevention

Electrostatic chuck assembly incorporation a gasket for distributin...

Substrate support assembly

Electrostatic chuck design for cooling-gas light-up prevention

ESC assembly including an electrically conductive gasket for unifor...

Substrate support assembly having rapid temperature control

Substrate processing with rapid temperature gradient control

Electrostatic chuck having a plurality of heater coils

Substrate support with electrostatic chuck having dual temperature...

Heat transfer assembly

Process using combined capacitively and inductively coupled plasma...

Dual plasma source process using a variable frequency capacitively...

Plasma reactor apparatus with a VHF capacitively coupled plasma sou...

Method and apparatus for controlling temperature of a substrate

Plasma reactor apparatus with independent capacitive and toroidal p...

Patents Applicationslast 30 patents

HIGH POWER ELECTROSTATIC CHUCK WITH FEATURES PREVENTING HE HOLE LIG...

ELECTROSTATIC CHUCKS WITH COOLANT GAS ZONES AND CORRESPONDING GROOV...

RING STRUCTURES AND SYSTEMS FOR USE IN A PLASMA CHAMBER

RING STRUCTURES AND SYSTEMS FOR USE IN A PLASMA CHAMBER

LOW FREQUENCY RF GENERATOR AND ASSOCIATED ELECTROSTATIC CHUCK

ELECTROSTATIC CHUCKS WITH COOLANT GAS ZONES AND CORRESPONDING GROOV...

SUBSTRATE SUPPORT WITH UNIFORM TEMPERATURE ACROSS A SUBSTRATE

COOLED EDGE RING WITH INTEGRATED SEALS

COOLANT CHANNEL WITH INTERNAL FINS FOR SUBSTRATE PROCESSING PEDESTALS

ELECTROSTATIC EDGE RING MOUNTING SYSTEM FOR SUBSTRATE PROCESSING

HIGH POWER ELECTROSTATIC CHUCK WITH FEATURES PREVENTING HE HOLE LIG...

ELECTROSTATIC CHUCK DESIGN FOR COOLING-GAS LIGHT-UP PREVENTION

ELECTROSTATIC CHUCKS WITH COOLANT GAS ZONES AND CORRESPONDING GROOV...

Ring Structures and Systems for Use in a Plasma Chamber

ELECTROSTATIC CHUCK DESIGN FOR COOLING-GAS LIGHT-UP PREVENTION

ELECTROSTATIC CHUCK WITH FLEXIBLE WAFER TEMPERATURE CONTROL

ELECTROSTATIC CHUCK ASSEMBLY INCORPORATING A GASKET FOR DISTRIBUTIN...

SUBSTRATE SUPPORT ASSEMBLY

ELECTROSTATIC CHUCK WITH FEATURES FOR PREVENTING ELECTRICAL ARCING...

ELECTROSTATIC CHUCK DESIGN FOR COOLING-GAS LIGHT-UP PREVENTION

SUBSTRATE SUPPORT ASSEMBLY HAVING RAPID TEMPERATURE CONTROL

ESC ASSEMBLY INCLUDING AN ELECTRICALLY CONDUCTIVE GASKET FOR UNIFOR...

ELECTROSTATIC CHUCK HAVING A PLURALITY OF HEATER COILS

ETCH REACTOR SUITABLE FOR ETCHING HIGH ASPECT RATIO FEATURES

HIGH TEMPERATURE CATHODE FOR PLASMA ETCHING

SUBSTRATE PROCESSING WITH RAPID TEMPERATURE GRADIENT CONTROL

SUBSTRATE SUPPORT WITH ELECTROSTATIC CHUCK HAVING DUAL TEMPERATURE...

Dual plasma source process using a variable frequency capacitively...

Plasma reactor apparatus with a toroidal plasma source and a VHF ca...

Process using combined capacitively and inductively coupled plasma...