Membership
Tour
Register
Log in
Alexander Sohmer
Follow
Person
Aalen, DE
People
Overview
Industries
Organizations
People
Information
Impact
Patents Grants
last 30 patents
Information
Patent Grant
Illumination system for a microlithgraphic exposure apparatus
Patent number
8,873,151
Issue date
Oct 28, 2014
Carl Zeiss SMT GmbH
Alexander Sohmer
G02 - OPTICS
Information
Patent Grant
Reticle-masking objective with aspherical lenses
Patent number
7,372,634
Issue date
May 13, 2008
Carl Zeiss SMT AG
Johannes Wangler
G02 - OPTICS
Information
Patent Grant
Reticle-masking objective with aspherical lenses
Patent number
7,130,129
Issue date
Oct 31, 2006
Carl Zeiss SMT AG
Jorg Schultz
G02 - OPTICS
Information
Patent Grant
Illumination system with reduced energy loading
Patent number
6,683,728
Issue date
Jan 27, 2004
Carl-Zeiss-Stiftung
Jess Köhler
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Partial objective in an illuminating systems
Patent number
6,680,803
Issue date
Jan 20, 2004
Carl Zeiss SMT AG
Jörg Schultz
G02 - OPTICS
Patents Applications
last 30 patents
Information
Patent Application
Illumination System for a Microlithgraphic Exposure Apparatus
Publication number
20080192359
Publication date
Aug 14, 2008
Carl Zeiss SMT AG
Alexander Sohmer
G02 - OPTICS
Information
Patent Application
RETICLE-MASKING OBJECTIVE WITH ASPHERICAL LENSES
Publication number
20070014028
Publication date
Jan 18, 2007
Carl Zeiss SMT AG
Johannes Wangler
G02 - OPTICS
Information
Patent Application
Reticle-masking objective with aspherical lenses
Publication number
20040207928
Publication date
Oct 21, 2004
Jorg Schultz
G02 - OPTICS
Information
Patent Application
Illumination system with reduced energy loading
Publication number
20020163737
Publication date
Nov 7, 2002
Jess Kohler
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY