Alexander William Simpson

Person

Hillsboro, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Polishing pad having polishing surface with continuous protrusions
- Patent number 10,293,459
- Issue date May 21, 2019
- Cabot Microelectronics Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad having polishing surface with continuous protrusions...
- Patent number 10,160,092
- Issue date Dec 25, 2018
- Cabot Microelectronics Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with foundation layer and polishing surface layer
- Patent number 9,931,728
- Issue date Apr 3, 2018
- Cabot Microelectronics Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad having polishing surface with continuous protrusions
- Patent number 9,649,742
- Issue date May 16, 2017
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with polishing surface layer having an aperture or op...
- Patent number 9,597,769
- Issue date Mar 21, 2017
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Homogeneous polishing pad for eddy current end-point detection
- Patent number 9,597,777
- Issue date Mar 21, 2017
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with concentric or approximately concentric polygon g...
- Patent number 9,211,628
- Issue date Dec 15, 2015
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with foundation layer and polishing surface layer
- Patent number 9,067,297
- Issue date Jun 30, 2015
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad for eddy current end-point detection
- Patent number 9,028,302
- Issue date May 12, 2015
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Homogeneous polishing pad for eddy current end-point detection
- Patent number 8,657,653
- Issue date Feb 25, 2014
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad for eddy current end-point detection
- Patent number 8,628,384
- Issue date Jan 14, 2014
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Method of fabricating a polishing pad with an end-point detection r...
- Patent number 8,439,994
- Issue date May 14, 2013
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS
- Publication number 20170203409
- Publication date Jul 20, 2017
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH CONCENTRIC OR APPROXIMATELY CONCENTRIC POLYGON G...
- Publication number 20160023322
- Publication date Jan 28, 2016
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER
- Publication number 20150273656
- Publication date Oct 1, 2015
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER
- Publication number 20150273655
- Publication date Oct 1, 2015
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS...
- Publication number 20140273777
- Publication date Sep 18, 2014
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS
- Publication number 20140206268
- Publication date Jul 24, 2014
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
HOMOGENEOUS POLISHING PAD FOR EDDY CURRENT END-POINT DETECTION
- Publication number 20140123563
- Publication date May 8, 2014
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
Polishing Pad for Eddy Current End-Point Detection
- Publication number 20140102010
- Publication date Apr 17, 2014
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH POLISHING SURFACE LAYER HAVING AN APERTURE OR OP...
- Publication number 20130324020
- Publication date Dec 5, 2013
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER
- Publication number 20130137350
- Publication date May 30, 2013
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH CONCENTRIC OR APPROXIMATELY CONCENTRIC POLYGON G...
- Publication number 20120190281
- Publication date Jul 26, 2012
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD FOR EDDY CURRENT END-POINT DETECTION
- Publication number 20120083191
- Publication date Apr 5, 2012
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
HOMOGENEOUS POLISHING PAD FOR EDDY CURRENT END-POINT DETECTION
- Publication number 20120083192
- Publication date Apr 5, 2012
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF FABRICATING A POLISHING PAD WITH AN END-POINT DETECTION R...
- Publication number 20120079773
- Publication date Apr 5, 2012
- William C. Allison
- B24 - GRINDING POLISHING

Alexander William Simpson

Person

Patents Grantslast 30 patents

Polishing pad having polishing surface with continuous protrusions

Polishing pad having polishing surface with continuous protrusions...

Polishing pad with foundation layer and polishing surface layer

Polishing pad having polishing surface with continuous protrusions

Polishing pad with polishing surface layer having an aperture or op...

Homogeneous polishing pad for eddy current end-point detection

Polishing pad with concentric or approximately concentric polygon g...

Polishing pad with foundation layer and polishing surface layer

Polishing pad for eddy current end-point detection

Homogeneous polishing pad for eddy current end-point detection

Polishing pad for eddy current end-point detection

Method of fabricating a polishing pad with an end-point detection r...

Patents Applicationslast 30 patents

POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS

POLISHING PAD WITH CONCENTRIC OR APPROXIMATELY CONCENTRIC POLYGON G...

POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER

POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER

POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS...

POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS

HOMOGENEOUS POLISHING PAD FOR EDDY CURRENT END-POINT DETECTION

Polishing Pad for Eddy Current End-Point Detection

POLISHING PAD WITH POLISHING SURFACE LAYER HAVING AN APERTURE OR OP...

POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER

POLISHING PAD WITH CONCENTRIC OR APPROXIMATELY CONCENTRIC POLYGON G...

POLISHING PAD FOR EDDY CURRENT END-POINT DETECTION

HOMOGENEOUS POLISHING PAD FOR EDDY CURRENT END-POINT DETECTION

METHOD OF FABRICATING A POLISHING PAD WITH AN END-POINT DETECTION R...