Alexandra Pazidis

Person

Essingen-Lauterburg, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for forming nanostructures on a surface and optical element
- Patent number 11,982,788
- Issue date May 14, 2024
- Carl Zeiss SMT GmbH
- Vitaliy Shklover
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical element
- Patent number 11,520,087
- Issue date Dec 6, 2022
- Carl Zeiss SMT GmbH
- Konstantin Forcht
- G02 - OPTICS
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 9,733,395
- Issue date Aug 15, 2017
- Carl Zeiss SMT GmbH
- Vladimir Kamenov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element with an antireflection coating, projection objectiv...
- Patent number 9,684,252
- Issue date Jun 20, 2017
- Carl Zeiss SMT GmbH
- Christoph Zaczek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of lithographically transferring a pattern on a light sensit...
- Patent number 9,581,910
- Issue date Feb 28, 2017
- Carl Zeiss SMT GmbH
- Frank Schlesener
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror with dielectric coating
- Patent number 9,297,936
- Issue date Mar 29, 2016
- Carl Zeiss Laser Optics GmbH
- Jeffrey Erxmeyer
- G02 - OPTICS
Information Patent Grant
Micromirror arrangement having a coating and method for the product...
- Patent number 8,928,980
- Issue date Jan 6, 2015
- Carl Zeiss SMT GmbH
- Karl-Stefan Weissenrieder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection system with compensation of intensity variations and com...
- Patent number 8,605,257
- Issue date Dec 10, 2013
- Carl Zeiss SMT GmbH
- Patrick Scheible
- G02 - OPTICS
Information Patent Grant
Optical element for reflection of UV radiation, method for manufact...
- Patent number 8,488,103
- Issue date Jul 16, 2013
- Carl Zeiss SMT GmbH
- Alexandra Pazidis
- G02 - OPTICS
Information Patent Grant
Method of processing an optical element and an optical element, in...
- Patent number 8,435,726
- Issue date May 7, 2013
- Carl Zeiss SMT GmbH
- Alexandra Pazidis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 8,395,753
- Issue date Mar 12, 2013
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Off-axis objectives with rotatable optical element
- Patent number 8,339,575
- Issue date Dec 25, 2012
- Carl Zeiss SMT GmbH
- Alexandra Pazidis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element with an antireflection coating, projection objectiv...
- Patent number 8,049,964
- Issue date Nov 1, 2011
- Carl Zeiss SMT GmbH
- Christoph Zaczek
- G02 - OPTICS
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 7,817,250
- Issue date Oct 19, 2010
- Carl Zeiss SMT AG
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element, projection lens and associated projection exposure...
- Patent number 7,738,187
- Issue date Jun 15, 2010
- Carl Zeiss SMT AG
- Alexandra Pazidis
- G02 - OPTICS
Information Patent Grant
Microlithographic exposure apparatus
- Patent number 7,518,797
- Issue date Apr 14, 2009
- Carl Zeiss SMT AG
- Alexandra Pazidis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective for immersion lithography
- Patent number 7,460,206
- Issue date Dec 2, 2008
- Carl Zeiss SMT AG
- Karl-Stefan Weissenrieder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Objective with crystal lenses
- Patent number 7,239,447
- Issue date Jul 3, 2007
- Carl Zeiss SMT AG
- Aksel Goehnermeier
- G02 - OPTICS
Information Patent Grant
Method and device for decontaminating optical surfaces
- Patent number 6,796,664
- Issue date Sep 28, 2004
- Carl Zeiss SMT AG
- Jens Luedecke
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR DEPOSITION OF AT LEAST ONE LAYER, OPTICAL...
- Publication number 20240035163
- Publication date Feb 1, 2024
- Carl Zeiss SMT GMBH
- Felix LANGE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MIRROR ASSEMBLY HAVING A HYDROGEN BARRIER AND OPTICAL ASSEMBLY
- Publication number 20220206401
- Publication date Jun 30, 2022
- Carl Zeiss SMT GMBH
- Alexandra PAZIDIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR ASSEMBLY AND OPTICAL ASSEMBLY COMPRISING SAME
- Publication number 20220187516
- Publication date Jun 16, 2022
- Carl Zeiss SMT GMBH
- Alexandra PAZIDIS
- G02 - OPTICS
Information Patent Application
METHOD FOR FORMING NANOSTRUCTURES ON A SURFACE AND OPTICAL ELEMENT
- Publication number 20210293996
- Publication date Sep 23, 2021
- Carl Zeiss SMT GMBH
- Vitaliy SHKLOVER
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT
- Publication number 20210132269
- Publication date May 6, 2021
- Carl Zeiss SMT GMBH
- Konstantin FORCHT
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20170322343
- Publication date Nov 9, 2017
- Carl Zeiss SMT GMBH
- Vladimir Kamenov
- G02 - OPTICS
Information Patent Application
METHOD OF LITHOGRAPHICALLY TRANSFERRING A PATTERN ON A LIGHT SENSIT...
- Publication number 20150301455
- Publication date Oct 22, 2015
- Carl Zeiss SMT GMBH
- Frank Schlesener
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20140320955
- Publication date Oct 30, 2014
- Vladimir Kamenov
- G02 - OPTICS
Information Patent Application
MIRROR WITH DIELECTRIC COATING
- Publication number 20130083411
- Publication date Apr 4, 2013
- CARL ZEISS LASER OPTICS GmbH
- Jeffrey ERXMEYER
- G02 - OPTICS
Information Patent Application
MICROMIRROR ARRANGEMENT HAVING A COATING AND METHOD FOR THE PRODUCT...
- Publication number 20120182606
- Publication date Jul 19, 2012
- Carl Zeiss SMT GMBH
- Karl-Stefan WEISSENRIEDER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Element With An Antireflection Coating, Projection Objectiv...
- Publication number 20120038897
- Publication date Feb 16, 2012
- Christoph Zaczek
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20110222043
- Publication date Sep 15, 2011
- Carl Zeiss SMT GMBH
- Vladimir Kamenov
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20110007293
- Publication date Jan 13, 2011
- Carl Zeiss SMT AG
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT FOR REFLECTION OF UV RADIATION, METHOD FOR MANUFACT...
- Publication number 20100290021
- Publication date Nov 18, 2010
- Carl Zeiss SMT AG
- Alexandra PAZIDIS
- G02 - OPTICS
Information Patent Application
OFF-AXIS OBJECTIVES WITH ROTATABLE OPTICAL ELEMENT
- Publication number 20090073412
- Publication date Mar 19, 2009
- Carl Zeiss SMT AG
- Alexandra Pazidis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR USE IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS
- Publication number 20090059189
- Publication date Mar 5, 2009
- Carl Zeiss SMT AG
- Aksel Goehnermeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20090021719
- Publication date Jan 22, 2009
- Carl Zeiss SMT AG
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PROCESSING AN OPTICAL ELEMENT AND AN OPTICAL ELEMENT, IN...
- Publication number 20080309905
- Publication date Dec 18, 2008
- Carl Zeiss SMT AG
- Alexandra PAZIDIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT, PROJECTION LENS AND ASSOCIATED PROJECTION EXPOSURE...
- Publication number 20080304035
- Publication date Dec 11, 2008
- Carl Zeiss SMT AG
- Alexandra Pazidis
- G02 - OPTICS
Information Patent Application
Microlithographic projection exposure apparatus
- Publication number 20080297754
- Publication date Dec 4, 2008
- Carl Zeiss SMT AG
- Vladimir Kamenov
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY
- Publication number 20080291419
- Publication date Nov 27, 2008
- Carl Zeiss SMT AG
- Karl-Stefan Weissenrieder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Element with an Antireflection Coating, Projection Objectiv...
- Publication number 20080192335
- Publication date Aug 14, 2008
- Carl Zeiss SMT AG
- Christoph Zaczek
- G02 - OPTICS
Information Patent Application
Projection System with Compensation of Intensity Variations and Com...
- Publication number 20080094599
- Publication date Apr 24, 2008
- Carl Zeiss SMT AG
- Patrick Scheible
- G02 - OPTICS
Information Patent Application
Objective with crystal lenses
- Publication number 20070242250
- Publication date Oct 18, 2007
- Carl Zeiss SMT AG
- Aksel Goehnermeier
- G02 - OPTICS
Information Patent Application
Microlithographic exposure apparatus
- Publication number 20070128453
- Publication date Jun 7, 2007
- Alexandra Pazidis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection objective for immersion lithography
- Publication number 20050225737
- Publication date Oct 13, 2005
- Carl Zeiss SMT AG
- Karl-Stefan Weissenrieder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Objective with crystal lenses
- Publication number 20050157401
- Publication date Jul 21, 2005
- Aksel Goehnermeier
- G02 - OPTICS
Information Patent Application
Method and device for decontaminating optical surfaces
- Publication number 20030210458
- Publication date Nov 13, 2003
- Carl Zeiss SMT AG
- Jens Luedecke
- B08 - CLEANING

Alexandra Pazidis

Person

Patents Grantslast 30 patents

Method for forming nanostructures on a surface and optical element

Reflective optical element

Microlithographic projection exposure apparatus

Optical element with an antireflection coating, projection objectiv...

Method of lithographically transferring a pattern on a light sensit...

Mirror with dielectric coating

Micromirror arrangement having a coating and method for the product...

Projection system with compensation of intensity variations and com...

Optical element for reflection of UV radiation, method for manufact...

Method of processing an optical element and an optical element, in...

Microlithographic projection exposure apparatus

Off-axis objectives with rotatable optical element

Optical element with an antireflection coating, projection objectiv...

Microlithographic projection exposure apparatus

Optical element, projection lens and associated projection exposure...

Microlithographic exposure apparatus

Projection objective for immersion lithography

Objective with crystal lenses

Method and device for decontaminating optical surfaces

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR DEPOSITION OF AT LEAST ONE LAYER, OPTICAL...

MIRROR ASSEMBLY HAVING A HYDROGEN BARRIER AND OPTICAL ASSEMBLY

MIRROR ASSEMBLY AND OPTICAL ASSEMBLY COMPRISING SAME

METHOD FOR FORMING NANOSTRUCTURES ON A SURFACE AND OPTICAL ELEMENT

REFLECTIVE OPTICAL ELEMENT

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

METHOD OF LITHOGRAPHICALLY TRANSFERRING A PATTERN ON A LIGHT SENSIT...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

MIRROR WITH DIELECTRIC COATING

MICROMIRROR ARRANGEMENT HAVING A COATING AND METHOD FOR THE PRODUCT...

Optical Element With An Antireflection Coating, Projection Objectiv...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

OPTICAL ELEMENT FOR REFLECTION OF UV RADIATION, METHOD FOR MANUFACT...

OFF-AXIS OBJECTIVES WITH ROTATABLE OPTICAL ELEMENT

PELLICLE FOR USE IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

METHOD OF PROCESSING AN OPTICAL ELEMENT AND AN OPTICAL ELEMENT, IN...

OPTICAL ELEMENT, PROJECTION LENS AND ASSOCIATED PROJECTION EXPOSURE...

Microlithographic projection exposure apparatus

PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY

Optical Element with an Antireflection Coating, Projection Objectiv...

Projection System with Compensation of Intensity Variations and Com...

Objective with crystal lenses

Microlithographic exposure apparatus

Projection objective for immersion lithography

Objective with crystal lenses

Method and device for decontaminating optical surfaces