Alexandre Likhanskii

Person

Malden, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Device to control uniformity of extracted ion beam
- Patent number 12,154,753
- Issue date Nov 26, 2024
- Applied Materials, Inc.
- Jay T. Scheuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single-slot tubular cathode
- Patent number D1051838
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Bon-Woong Koo
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Ion extraction assembly having variable electrode thickness for bea...
- Patent number 12,125,680
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable thickness ion source extraction plate
- Patent number 11,810,746
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for directional processing
- Patent number 11,791,126
- Issue date Oct 17, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mismatched optics for angular control of extracted ion beam
- Patent number 11,651,932
- Issue date May 16, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source with single-slot tubular cathode
- Patent number 11,631,567
- Issue date Apr 18, 2023
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source with biased extraction plate
- Patent number 11,600,473
- Issue date Mar 7, 2023
- Applied Materials, Inc.
- Svetlana B. Radovanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrodynamic mass analysis with RF biased ion source
- Patent number 11,587,778
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme edge uniformity control
- Patent number 11,574,800
- Issue date Feb 7, 2023
- Varian Semiconductor Equipment Associates, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 11,495,434
- Issue date Nov 8, 2022
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Grant
Electrostatic filter providing reduced particle generation
- Patent number 11,437,215
- Issue date Sep 6, 2022
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shaped electrode
- Patent number D956005
- Issue date Jun 28, 2022
- Applied Materials, Inc.
- Robert C. Lindberg
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Ion source with single-slot tubular cathode
- Patent number 11,127,557
- Issue date Sep 21, 2021
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 11,037,758
- Issue date Jun 15, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Grant
High-current ion implanter and method for controlling ion beam usin...
- Patent number 11,011,343
- Issue date May 18, 2021
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for controlling ion beam using electrostatic f...
- Patent number 10,937,624
- Issue date Mar 2, 2021
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source with biased extraction plate
- Patent number 10,923,306
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Svetlana B. Radovanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic filter and ion implanter having asymmetric electrosta...
- Patent number 10,886,098
- Issue date Jan 5, 2021
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electostatic filter and method for controlling ion beam properties...
- Patent number 10,804,068
- Issue date Oct 13, 2020
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electostatic filter and method for controlling ion beam using elect...
- Patent number 10,790,116
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus, system and techniques for mass analyzed ion beam
- Patent number 10,763,072
- Issue date Sep 1, 2020
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conductive beam optics for reducing particles in ion implanter
- Patent number 10,714,301
- Issue date Jul 14, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for controlling ion beam properties using elec...
- Patent number 10,665,415
- Issue date May 26, 2020
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme edge uniformity control
- Patent number 10,665,433
- Issue date May 26, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 10,522,330
- Issue date Dec 31, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Grant
Conductive beam optic containing internal heating element
- Patent number 10,504,682
- Issue date Dec 10, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF clean system for electrostatic elements
- Patent number 10,410,844
- Issue date Sep 10, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High brightness ion beam extraction using bias electrodes and magne...
- Patent number 10,290,462
- Issue date May 14, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency extraction system for charge neutralized ion beam
- Patent number 10,224,181
- Issue date Mar 5, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Heated Plasma Flood Gun Sweeper
- Publication number 20240371602
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
- Publication number 20240339287
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
- Publication number 20240339288
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SHAPER TO CONTROL ION FLUX DISTRIBUTION OF PLASMA SOURCE
- Publication number 20230282449
- Publication date Sep 7, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION EXTRACTION ASSEMBLY HAVING VARIABLE ELECTRODE THICKNESS FOR BEA...
- Publication number 20230125435
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mismatched Optics for Angular Control of Extracted Ion Beam
- Publication number 20230131410
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORM PLASMA LINEAR ION SOURCE
- Publication number 20230083497
- Publication date Mar 16, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device To Control Uniformity Of Extraction Ion Beam
- Publication number 20230082224
- Publication date Mar 16, 2023
- Applied Materials, Inc.
- Jay T. Scheuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Variable Thickness Ion Source Extraction Plate
- Publication number 20230080083
- Publication date Mar 16, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODYNAMIC MASS ANALYSIS WITH RF BIASED ION SOURCE
- Publication number 20220139691
- Publication date May 5, 2022
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE WITH SINGLE-SLOT TUBULAR CATHODE
- Publication number 20210383995
- Publication date Dec 9, 2021
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE WITH SINGLE-SLOT TUBULAR CATHODE
- Publication number 20210287872
- Publication date Sep 16, 2021
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC FILTER PROVIDING REDUCED PARTICLE GENERATION
- Publication number 20210183609
- Publication date Jun 17, 2021
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLING ION BEAM USING ELECTOSTATIC FI...
- Publication number 20210159043
- Publication date May 27, 2021
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Source With Biased Extraction Plate
- Publication number 20210134569
- Publication date May 6, 2021
- Applied Materials, Inc.
- Svetlana B. Radovanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC FILTER WITH SHAPED ELECTRODES
- Publication number 20210090845
- Publication date Mar 25, 2021
- Applied Materials, Inc.
- Robert C. Lindberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus For Directional Processing
- Publication number 20210066023
- Publication date Mar 4, 2021
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-CURRENT ION IMPLANTER AND METHOD FOR CONTROLLING ION BEAM USIN...
- Publication number 20210020399
- Publication date Jan 21, 2021
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS
- Publication number 20210013001
- Publication date Jan 14, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Application
Ion Source With Biased Extraction Plate
- Publication number 20200294750
- Publication date Sep 17, 2020
- Applied Materials, Inc.
- Svetlana B. Radovanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
- Publication number 20200294755
- Publication date Sep 17, 2020
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extreme Edge Uniformity Control
- Publication number 20200243308
- Publication date Jul 30, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTOSTATIC FILTER AND METHOD FOR CONTROLLING ION BEAM USING ELECT...
- Publication number 20200161089
- Publication date May 21, 2020
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTOSTATIC FILTER AND METHOD FOR CONTROLLING ION BEAM PROPERTIES...
- Publication number 20200161076
- Publication date May 21, 2020
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC FILTER AND ION IMPLANTER HAVING ASYMMETRIC ELECTROSTA...
- Publication number 20200161077
- Publication date May 21, 2020
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLING ION BEAM USING ELECTOSTATIC FI...
- Publication number 20200161078
- Publication date May 21, 2020
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLING ION BEAM PROPERTIES USING ELEC...
- Publication number 20200144017
- Publication date May 7, 2020
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS
- Publication number 20200126757
- Publication date Apr 23, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Application
CONDUCTIVE BEAM OPTIC CONTAINING INTERNAL HEATING ELEMENT
- Publication number 20190259560
- Publication date Aug 22, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrodynamic Mass Analysis
- Publication number 20180286653
- Publication date Oct 4, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS

Alexandre Likhanskii

Person

Patents Grantslast 30 patents

Device to control uniformity of extracted ion beam

Single-slot tubular cathode

Ion extraction assembly having variable electrode thickness for bea...

Variable thickness ion source extraction plate

Apparatus for directional processing

Mismatched optics for angular control of extracted ion beam

Ion source with single-slot tubular cathode

Ion source with biased extraction plate

Electrodynamic mass analysis with RF biased ion source

Extreme edge uniformity control

In-situ plasma cleaning of process chamber components

Electrostatic filter providing reduced particle generation

Shaped electrode

Ion source with single-slot tubular cathode

In-situ plasma cleaning of process chamber components

High-current ion implanter and method for controlling ion beam usin...

Apparatus and method for controlling ion beam using electrostatic f...

Ion source with biased extraction plate

Electrostatic filter and ion implanter having asymmetric electrosta...

Electostatic filter and method for controlling ion beam properties...

Electostatic filter and method for controlling ion beam using elect...

Apparatus, system and techniques for mass analyzed ion beam

Conductive beam optics for reducing particles in ion implanter

Apparatus and method for controlling ion beam properties using elec...

Extreme edge uniformity control

In-situ plasma cleaning of process chamber components

Conductive beam optic containing internal heating element

RF clean system for electrostatic elements

High brightness ion beam extraction using bias electrodes and magne...

Radio frequency extraction system for charge neutralized ion beam

Patents Applicationslast 30 patents

Heated Plasma Flood Gun Sweeper

APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM

HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM

PLASMA SHAPER TO CONTROL ION FLUX DISTRIBUTION OF PLASMA SOURCE

ION EXTRACTION ASSEMBLY HAVING VARIABLE ELECTRODE THICKNESS FOR BEA...

Mismatched Optics for Angular Control of Extracted Ion Beam

UNIFORM PLASMA LINEAR ION SOURCE

Device To Control Uniformity Of Extraction Ion Beam

Variable Thickness Ion Source Extraction Plate

ELECTRODYNAMIC MASS ANALYSIS WITH RF BIASED ION SOURCE

ION SOURCE WITH SINGLE-SLOT TUBULAR CATHODE

ION SOURCE WITH SINGLE-SLOT TUBULAR CATHODE

ELECTROSTATIC FILTER PROVIDING REDUCED PARTICLE GENERATION

APPARATUS AND METHOD FOR CONTROLLING ION BEAM USING ELECTOSTATIC FI...

Ion Source With Biased Extraction Plate

ELECTROSTATIC FILTER WITH SHAPED ELECTRODES

Apparatus For Directional Processing

HIGH-CURRENT ION IMPLANTER AND METHOD FOR CONTROLLING ION BEAM USIN...

IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS

Ion Source With Biased Extraction Plate

APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM

Extreme Edge Uniformity Control

ELECTOSTATIC FILTER AND METHOD FOR CONTROLLING ION BEAM USING ELECT...

ELECTOSTATIC FILTER AND METHOD FOR CONTROLLING ION BEAM PROPERTIES...

ELECTROSTATIC FILTER AND ION IMPLANTER HAVING ASYMMETRIC ELECTROSTA...

APPARATUS AND METHOD FOR CONTROLLING ION BEAM USING ELECTOSTATIC FI...

APPARATUS AND METHOD FOR CONTROLLING ION BEAM PROPERTIES USING ELEC...

IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS

CONDUCTIVE BEAM OPTIC CONTAINING INTERNAL HEATING ELEMENT

Electrodynamic Mass Analysis