Alexei Marakhatanov

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Albany, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Confinement ring for use in a plasma processing system
- Patent number 11,791,140
- Issue date Oct 17, 2023
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Confinement ring for use in a plasma processing system
- Patent number 11,342,166
- Issue date May 24, 2022
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Confinement ring for use in a plasma processing system
- Patent number 10,720,314
- Issue date Jul 21, 2020
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-radiofrequency impedance control for plasma uniformity tuning
- Patent number 9,881,772
- Issue date Jan 30, 2018
- Lam Research Corporation
- Alexei Marakhatanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative ion control for dielectric etch
- Patent number 9,117,767
- Issue date Aug 25, 2015
- Lam Research Corporation
- Alexei Marakhatanov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Confinement Ring for Use in a Plasma Processing System
- Publication number 20220254614
- Publication date Aug 11, 2022
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Confinement Ring for Use in a Plasma Processing System
- Publication number 20200303171
- Publication date Sep 24, 2020
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Confinement Ring for Use in a Plasma Processing System
- Publication number 20170330735
- Publication date Nov 16, 2017
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS