Alexei Marakhtanov

Person

Albany, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for extracting process control information from...
- Patent number 12,131,886
- Issue date Oct 29, 2024
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Impedance match with an elongated RF strap
- Patent number 12,080,518
- Issue date Sep 3, 2024
- Lam Research Corporation
- Felix Leib Kozakevich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High speed synchronization of plasma source/bias power delivery
- Patent number 11,935,726
- Issue date Mar 19, 2024
- MKS Instruments, Inc.
- Aaron T. Radomski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for cleaning an edge ring pocket
- Patent number 11,935,730
- Issue date Mar 19, 2024
- Lam Research Corporation
- Eric Hudson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for optimizing power delivery to an electrode o...
- Patent number 11,908,660
- Issue date Feb 20, 2024
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed plasma chamber in dual chamber configuration
- Patent number 11,670,486
- Issue date Jun 6, 2023
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic Chuck design for cooling-gas light-up prevention
- Patent number 11,651,991
- Issue date May 16, 2023
- Lam Research Corporation
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi zone gas injection upper electrode system
- Patent number 11,594,400
- Issue date Feb 28, 2023
- Lam Research Corporation
- Ryan Bise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for optimizing power delivery to an electrode o...
- Patent number 11,335,539
- Issue date May 17, 2022
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving a pre-determined factor associate...
- Patent number 11,195,706
- Issue date Dec 7, 2021
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High speed synchronization of plasma source/bias power delivery
- Patent number 11,158,488
- Issue date Oct 26, 2021
- MKS Instruments, Inc.
- Aaron T. Radomski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with features for preventing electrical arcing...
- Patent number 11,069,553
- Issue date Jul 20, 2021
- Lam Research Corporation
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck design for cooling-gas light-up prevention
- Patent number 11,024,532
- Issue date Jun 1, 2021
- Lam Research Corporation
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active control of radial etch uniformity
- Patent number 10,916,409
- Issue date Feb 9, 2021
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three or more states for achieving high aspect ratio dielectric etch
- Patent number 10,861,708
- Issue date Dec 8, 2020
- Lam Research Corporation
- Takumi Yanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for controlling directionality of ions in an ed...
- Patent number 10,825,656
- Issue date Nov 3, 2020
- Lam Research Corporation
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion energy control by RF pulse shape
- Patent number 10,755,895
- Issue date Aug 25, 2020
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for controlling a plasma edge region
- Patent number 10,622,190
- Issue date Apr 14, 2020
- Lam Research Corporation
- Alexei Marakhtanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multi zone gas injection upper electrode system
- Patent number 10,622,195
- Issue date Apr 14, 2020
- Lam Research Corporation
- Ryan Bise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for controlling directionality of ions in an ed...
- Patent number 10,615,003
- Issue date Apr 7, 2020
- Lam Research Corporation
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-radiofrequency impedance control for plasma uniformity tuning
- Patent number 10,593,516
- Issue date Mar 17, 2020
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed plasma chamber in dual chamber configuration
- Patent number 10,553,399
- Issue date Feb 4, 2020
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three or more states for achieving high aspect ratio dielectric etch
- Patent number 10,504,744
- Issue date Dec 10, 2019
- Lam Research Corporation
- Takumi Yanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of etch rate using modeling, feedback and impedance match
- Patent number 10,381,201
- Issue date Aug 13, 2019
- Lam Research Corporation
- Bradford J. Lyndaker
- G05 - CONTROLLING REGULATING
Information Patent Grant
Systems and methods for tailoring ion energy distribution function...
- Patent number 10,340,122
- Issue date Jul 2, 2019
- Lam Research Corporation
- Zhigang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi regime plasma wafer processing to increase directionality of...
- Patent number 10,304,662
- Issue date May 28, 2019
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving a pre-determined factor associate...
- Patent number 10,283,330
- Issue date May 7, 2019
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for a hybrid capacitively-coupled and an indu...
- Patent number 10,276,348
- Issue date Apr 30, 2019
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of impedance of RF return path
- Patent number 10,249,476
- Issue date Apr 2, 2019
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative ion control for dielectric etch
- Patent number 10,181,412
- Issue date Jan 15, 2019
- Lam Research Corporation
- Alexei Marakhtanov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
RING STRUCTURES AND SYSTEMS FOR USE IN A PLASMA CHAMBER
- Publication number 20240266151
- Publication date Aug 8, 2024
- LAM RESEARCH CORPORATION
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-SECTIONAL PLASMA CONFINEMENT RING STRUCTURE
- Publication number 20240234104
- Publication date Jul 11, 2024
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE O...
- Publication number 20240186112
- Publication date Jun 6, 2024
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RING STRUCTURES AND SYSTEMS FOR USE IN A PLASMA CHAMBER
- Publication number 20240162015
- Publication date May 16, 2024
- LAM RESEARCH CORPORATION
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Use of Low Frequency Harmonics in Bias Radi...
- Publication number 20230317414
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED PLASMA CHAMBER IN DUAL CHAMBER CONFIGURATION
- Publication number 20230317412
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Extracting Process Control Information from...
- Publication number 20230298857
- Publication date Sep 21, 2023
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNIFORMITY CONTROL USING A STATIC MAGNETIC FIELD
- Publication number 20230298866
- Publication date Sep 21, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW FREQUENCY RF GENERATOR AND ASSOCIATED ELECTROSTATIC CHUCK
- Publication number 20230274914
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DISCHARGE UNIFORMITY CONTROL USING MAGNETIC FIELDS
- Publication number 20230260768
- Publication date Aug 17, 2023
- LAM RESEARCH CORPORATION
- Theodoros Panagopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORMITY CONTROL CIRCUIT FOR IMPEDANCE MATCH
- Publication number 20230253184
- Publication date Aug 10, 2023
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Radiofrequency Signal Generator-Based Contr...
- Publication number 20230253185
- Publication date Aug 10, 2023
- LAM RESEARCH CORPORATION
- Bradford J. Lyndaker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CONTROLLING A PLASMA SHEATH CHARACTERISTIC
- Publication number 20230245874
- Publication date Aug 3, 2023
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CONTROL FOR ION ENERGY DELIVERY USING MULTIPLE GENERATORS A...
- Publication number 20230230804
- Publication date Jul 20, 2023
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNIFORMITY CONTROL USING A PULSED MAGNETIC FIELD
- Publication number 20230223242
- Publication date Jul 13, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUTY CYCLE CONTROL TO ACHIEVE UNIFORMITY
- Publication number 20230215694
- Publication date Jul 6, 2023
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MINIMIZING REFLECTED POWER IN A TUNABLE EDGE SHEATH SYSTEM
- Publication number 20230102487
- Publication date Mar 30, 2023
- LAM RESEARCH CORPORATION
- David Hopkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNING VOLTAGE SETPOINT IN A PULSED RF SIGNAL FOR A TUNABLE EDGE SH...
- Publication number 20230092887
- Publication date Mar 23, 2023
- LAM RESEARCH CORPORATION
- David Hopkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE MATCH WITH AN ELONGATED RF STRAP
- Publication number 20230081542
- Publication date Mar 16, 2023
- LAM RESEARCH CORPORATION
- Felix Leib Kozakevich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC EDGE RING MOUNTING SYSTEM FOR SUBSTRATE PROCESSING
- Publication number 20230075462
- Publication date Mar 9, 2023
- LAM RESEARCH CORPORATION
- Alexander MATYUSHKIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Radiofrequency Signal Filter Arrangement for Plasma Processing System
- Publication number 20230054699
- Publication date Feb 23, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optimization of Radiofrequency Signal Ground Return in Plasma Proce...
- Publication number 20230059495
- Publication date Feb 23, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR USING BINNING TO INCREASE POWER DURING A LO...
- Publication number 20230007885
- Publication date Jan 12, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CLEANING AN EDGE RING POCKET
- Publication number 20220254616
- Publication date Aug 11, 2022
- LAM RESEARCH CORPORATION
- Eric Hudson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE O...
- Publication number 20220199366
- Publication date Jun 23, 2022
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Speed Synchronization Of Plasma Source/Bias Power Delivery
- Publication number 20220005674
- Publication date Jan 6, 2022
- MKS Instruments, Inc.
- Aaron T. RADOMSKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE O...
- Publication number 20210319980
- Publication date Oct 14, 2021
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK DESIGN FOR COOLING-GAS LIGHT-UP PREVENTION
- Publication number 20210296099
- Publication date Sep 23, 2021
- LAM RESEARCH CORPORATION
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Speed Synchronization Of Plasma Source/Bias Power Delivery
- Publication number 20200411289
- Publication date Dec 31, 2020
- MKS Instruments, Inc.
- Aaron T. RADOMSKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ring Structures and Systems for Use in a Plasma Chamber
- Publication number 20200365378
- Publication date Nov 19, 2020
- LAM RESEARCH CORPORATION
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS

Alexei Marakhtanov

Person

Patents Grantslast 30 patents

Systems and methods for extracting process control information from...

Impedance match with an elongated RF strap

High speed synchronization of plasma source/bias power delivery

Systems and methods for cleaning an edge ring pocket

Systems and methods for optimizing power delivery to an electrode o...

Pulsed plasma chamber in dual chamber configuration

Electrostatic Chuck design for cooling-gas light-up prevention

Multi zone gas injection upper electrode system

Systems and methods for optimizing power delivery to an electrode o...

Systems and methods for achieving a pre-determined factor associate...

High speed synchronization of plasma source/bias power delivery

Electrostatic chuck with features for preventing electrical arcing...

Electrostatic chuck design for cooling-gas light-up prevention

Active control of radial etch uniformity

Three or more states for achieving high aspect ratio dielectric etch

Systems and methods for controlling directionality of ions in an ed...

Ion energy control by RF pulse shape

Systems and methods for controlling a plasma edge region

Multi zone gas injection upper electrode system

Systems and methods for controlling directionality of ions in an ed...

Multi-radiofrequency impedance control for plasma uniformity tuning

Pulsed plasma chamber in dual chamber configuration

Three or more states for achieving high aspect ratio dielectric etch

Control of etch rate using modeling, feedback and impedance match

Systems and methods for tailoring ion energy distribution function...

Multi regime plasma wafer processing to increase directionality of...

Systems and methods for achieving a pre-determined factor associate...

Methods and apparatus for a hybrid capacitively-coupled and an indu...

Control of impedance of RF return path

Negative ion control for dielectric etch

Patents Applicationslast 30 patents

RING STRUCTURES AND SYSTEMS FOR USE IN A PLASMA CHAMBER

MULTI-SECTIONAL PLASMA CONFINEMENT RING STRUCTURE

SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE O...

RING STRUCTURES AND SYSTEMS FOR USE IN A PLASMA CHAMBER

Systems and Methods for Use of Low Frequency Harmonics in Bias Radi...

PULSED PLASMA CHAMBER IN DUAL CHAMBER CONFIGURATION

Systems and Methods for Extracting Process Control Information from...

PLASMA UNIFORMITY CONTROL USING A STATIC MAGNETIC FIELD

LOW FREQUENCY RF GENERATOR AND ASSOCIATED ELECTROSTATIC CHUCK

PLASMA DISCHARGE UNIFORMITY CONTROL USING MAGNETIC FIELDS

UNIFORMITY CONTROL CIRCUIT FOR IMPEDANCE MATCH

Systems and Methods for Radiofrequency Signal Generator-Based Contr...

SYSTEMS AND METHODS FOR CONTROLLING A PLASMA SHEATH CHARACTERISTIC

PROCESS CONTROL FOR ION ENERGY DELIVERY USING MULTIPLE GENERATORS A...

PLASMA UNIFORMITY CONTROL USING A PULSED MAGNETIC FIELD

DUTY CYCLE CONTROL TO ACHIEVE UNIFORMITY

MINIMIZING REFLECTED POWER IN A TUNABLE EDGE SHEATH SYSTEM

TUNING VOLTAGE SETPOINT IN A PULSED RF SIGNAL FOR A TUNABLE EDGE SH...

IMPEDANCE MATCH WITH AN ELONGATED RF STRAP

ELECTROSTATIC EDGE RING MOUNTING SYSTEM FOR SUBSTRATE PROCESSING

Radiofrequency Signal Filter Arrangement for Plasma Processing System

Optimization of Radiofrequency Signal Ground Return in Plasma Proce...

SYSTEMS AND METHODS FOR USING BINNING TO INCREASE POWER DURING A LO...

SYSTEMS AND METHODS FOR CLEANING AN EDGE RING POCKET

SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE O...

High Speed Synchronization Of Plasma Source/Bias Power Delivery

SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE O...

ELECTROSTATIC CHUCK DESIGN FOR COOLING-GAS LIGHT-UP PREVENTION

High Speed Synchronization Of Plasma Source/Bias Power Delivery

Ring Structures and Systems for Use in a Plasma Chamber