Alexey Sergeevich KUZNETSOV

Person

Zaltbommel, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,846,887
- Issue date Dec 19, 2023
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,340,532
- Issue date May 24, 2022
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for repairing reflective optical elements for EUV lithography
- Patent number 11,099,484
- Issue date Aug 24, 2021
- Carl Zeiss SMT GmbH
- Robert Meier
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Optical element and optical system for EUV lithography, and method...
- Patent number 10,690,812
- Issue date Jun 23, 2020
- Carl Zeiss SMT GmbH
- Hermanus Hendricus Petrus Theodorus Bekman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Membranes for use within a lithographic apparatus and a lithographi...
- Patent number 10,228,615
- Issue date Mar 12, 2019
- ASML Netherlands B.V.
- Andrey Alexandrovich Nikipelov
- G02 - OPTICS
Information Patent Grant
Radiation source-collector and method for manufacture
- Patent number 9,773,578
- Issue date Sep 26, 2017
- ASML Netherlands B.V.
- Alexey Sergeevich Kuznetsov
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20220291591
- Publication date Sep 15, 2022
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY
- Publication number 20220035239
- Publication date Feb 3, 2022
- ASML NETHERLANDS B.V.
- Pieter-Jan VAN ZWOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20210109452
- Publication date Apr 15, 2021
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REPAIRING REFLECTIVE OTPICAL ELEMENTS FOR EUV LITHOGRAPHY
- Publication number 20190302628
- Publication date Oct 3, 2019
- Carl Zeiss SMT GMBH
- Robert MEIER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEMBRANES FOR USE WITHIN A LITHOGRAPHIC APPARATUS AND A LITHOGRAPHI...
- Publication number 20170205704
- Publication date Jul 20, 2017
- ASML NETHERLANDS B.V.
- Andrey Alexandrovich NIKIPELOV
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY, AND METHOD...
- Publication number 20160187543
- Publication date Jun 30, 2016
- Carl Zeiss SMT GMBH
- Hermanus Hendricus Petrus Theodorus BEKMAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Radiation Source-Collector and Method for Manufacture
- Publication number 20160012929
- Publication date Jan 14, 2016
- ASML NETHERLANDS B.V.
- Alexey Sergeevich KUZNETSOV
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Alexey Sergeevich KUZNETSOV

Person

Patents Grantslast 30 patents

Prolonging optical element lifetime in an EUV lithography system

Prolonging optical element lifetime in an EUV lithography system

Method for repairing reflective optical elements for EUV lithography

Optical element and optical system for EUV lithography, and method...

Membranes for use within a lithographic apparatus and a lithographi...

Radiation source-collector and method for manufacture

Patents Applicationslast 30 patents

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

METHOD FOR REPAIRING REFLECTIVE OTPICAL ELEMENTS FOR EUV LITHOGRAPHY

MEMBRANES FOR USE WITHIN A LITHOGRAPHIC APPARATUS AND A LITHOGRAPHI...

OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY, AND METHOD...

Radiation Source-Collector and Method for Manufacture