Alfred K. Wong

Person

Beacon, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Asymmetric halftone biasing for sub-grid pattern adjustment
- Patent number 6,596,442
- Issue date Jul 22, 2003
- International Business Machines Corporation
- Alfred K. Wong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay alignment system using polarization schemes
- Patent number 6,525,818
- Issue date Feb 25, 2003
- Infineon Technologies AG
- Xiaoming Yin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Intelligent photomask disposition
- Patent number 6,526,164
- Issue date Feb 25, 2003
- International Business Machines Corporation
- Scott Marshall Mansfield
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multiple exposure process for formation of dense rectangular arrays
- Patent number 6,511,791
- Issue date Jan 28, 2003
- International Business Machines Corporation
- Scott J. Bukofsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimized alternating phase shifted mask design
- Patent number 6,338,922
- Issue date Jan 15, 2002
- International Business Machines Corporation
- Lars W. Liebmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detection of phase defects on photomasks by differential imaging
- Patent number 6,327,033
- Issue date Dec 4, 2001
- International Business Machines Corporation
- Richard A. Ferguson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Kernel-based fast aerial image computation for a large scale design...
- Patent number 6,223,139
- Issue date Apr 24, 2001
- International Business Machines Corporation
- Alfred K. Wong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shifted mask design system, phase shifted mask and VLSI circu...
- Patent number 6,057,063
- Issue date May 2, 2000
- International Business Machines Corporation
- Lars W. Liebmann
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of determining the printability of photomask defects
- Patent number 5,965,306
- Issue date Oct 12, 1999
- International Business Machines Corporation
- Scott Marshall Mansfield
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exact transmission balanced alternating phase-shifting mask for pho...
- Patent number 5,932,377
- Issue date Aug 3, 1999
- International Business Machines Corporation
- Richard A. Ferguson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Alfred K. Wong

Person

Patents Grantslast 30 patents

Asymmetric halftone biasing for sub-grid pattern adjustment

Overlay alignment system using polarization schemes

Intelligent photomask disposition

Multiple exposure process for formation of dense rectangular arrays

Optimized alternating phase shifted mask design

Detection of phase defects on photomasks by differential imaging

Kernel-based fast aerial image computation for a large scale design...

Phase shifted mask design system, phase shifted mask and VLSI circu...

Method of determining the printability of photomask defects

Exact transmission balanced alternating phase-shifting mask for pho...