Allen H. Gabor

Person

Katonah, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Litho-etch-litho-etch with self-aligned blocks
- Patent number 11,239,077
- Issue date Feb 1, 2022
- International Business Machines Corporation
- Chi-Chun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for calculating non-correctable EUV blank flatness for blank...
- Patent number 10,552,569
- Issue date Feb 4, 2020
- GLOBALFOUNDRIES Inc.
- Christina Turley
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Registration mark formation during sidewall image transfer process
- Patent number 10,242,952
- Issue date Mar 26, 2019
- International Business Machines Corporation
- David J. Conklin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Registration mark formation during sidewall image transfer process
- Patent number 10,043,760
- Issue date Aug 7, 2018
- International Business Machines Corporation
- David J. Conklin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Registration mark formation during sidewall image transfer process
- Patent number 9,859,224
- Issue date Jan 2, 2018
- International Business Machines Corporation
- David J. Conklin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Registration mark formation during sidewall image transfer process
- Patent number 9,472,506
- Issue date Oct 18, 2016
- International Business Machines Corporation
- David J. Conklin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment data based process control system
- Patent number 9,360,858
- Issue date Jun 7, 2016
- GLOBALFOUNDRIES INC.
- Christopher P. Ausschnitt
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method for monitoring focus on an integrated wafer
- Patent number 9,046,788
- Issue date Jun 2, 2015
- International Business Machines Corporation
- Allen H. Gabor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-layer chip overlay target and measurement
- Patent number 8,847,416
- Issue date Sep 30, 2014
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sidewall image transfer process with multiple critical dimensions
- Patent number 8,673,165
- Issue date Mar 18, 2014
- International Business Machines Corporation
- Sudharshanan Raghunathan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process of making a lithographic structure using antireflective mat...
- Patent number 8,609,322
- Issue date Dec 17, 2013
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Alignment marks for multi-exposure lithography
- Patent number 8,592,110
- Issue date Nov 26, 2013
- International Business Machines Corporation
- Allen H. Gabor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a semiconductor device having a cut-way hole to e...
- Patent number 8,507,346
- Issue date Aug 13, 2013
- International Business Machines Corporation
- Martin Burkhardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure resulting from chemical shrink process over BARC (bottom...
- Patent number 8,491,984
- Issue date Jul 23, 2013
- International Business Machines Corporation
- Todd Christopher Bailey
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Alignment marks for multi-exposure lithography
- Patent number 8,455,162
- Issue date Jun 4, 2013
- International Business Machines Corporation
- Allen H. Gabor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-layer chip overlay target and measurement
- Patent number 8,361,683
- Issue date Jan 29, 2013
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process of making a lithographic structure using antireflective mat...
- Patent number 8,293,454
- Issue date Oct 23, 2012
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods for forming a composite pattern including printed resolutio...
- Patent number 8,158,334
- Issue date Apr 17, 2012
- International Business Machines Corporation
- Allen H. Gabor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for performing chemical shrink process over BARC (bottom ant...
- Patent number 8,110,496
- Issue date Feb 7, 2012
- International Business Machines Corporation
- Todd Christopher Bailey
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Integrated circuits and methods of design and manufacture thereof
- Patent number 8,039,203
- Issue date Oct 18, 2011
- Infineon Technologies AG
- Helen Wang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Line ends forming
- Patent number 7,993,815
- Issue date Aug 9, 2011
- International Business Machines Corporation
- Matthew E. Colburn
- G11 - INFORMATION STORAGE
Information Patent Grant
Process of making a semiconductor device using multiple antireflect...
- Patent number 7,968,270
- Issue date Jun 28, 2011
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple exposure lithography method incorporating intermediate lay...
- Patent number 7,914,975
- Issue date Mar 29, 2011
- International Business Machines Corporation
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite structures to prevent pattern collapse
- Patent number 7,799,503
- Issue date Sep 21, 2010
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyconductor line end formation and related mask
- Patent number 7,727,825
- Issue date Jun 1, 2010
- International Business Machines Corporation
- Shahid A. Butt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for reducing within chip device parameter variations
- Patent number 7,541,613
- Issue date Jun 2, 2009
- International Business Machines Corporation
- Brent Alan Anderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and algorithm for the control of critical dimensions in a th...
- Patent number 7,493,186
- Issue date Feb 17, 2009
- International Business Machines Corporation
- Colin J. Brodsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process of making a semiconductor device using multiple antireflect...
- Patent number 7,485,573
- Issue date Feb 3, 2009
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask design for enhancing line end resolution
- Patent number 7,479,355
- Issue date Jan 20, 2009
- International Business Machines Corporation
- Zheng G. Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyconductor line end formation and related mask
- Patent number 7,465,615
- Issue date Dec 16, 2008
- International Business Machines Corporation
- Shahid A. Butt
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
OPTIMAL SCANNER MAPS AND FIELD LAYOUTS
- Publication number 20240319579
- Publication date Sep 26, 2024
- International Business Machines Corporation
- Allen Gabor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING CONTINUOUS LINE-END TO LINE-END SPACES WITH SPAC...
- Publication number 20230314952
- Publication date Oct 5, 2023
- International Business Machines Corporation
- Allen GABOR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHO-ETCH-LITHO-ETCH WITH SELF-ALIGNED BLOCKS
- Publication number 20210143013
- Publication date May 13, 2021
- International Business Machines Corporation
- Chi-Chun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CALCULATING NON-CORRECTABLE EUV BLANK FLATNESS FOR BLANK...
- Publication number 20190080038
- Publication date Mar 14, 2019
- GLOBALFOUNDRIES INC.
- Christina TURLEY
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
REGISTRATION MARK FORMATION DURING SIDEWALL IMAGE TRANSFER PROCESS
- Publication number 20180331047
- Publication date Nov 15, 2018
- International Business Machines Corporation
- David J. Conklin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REGISTRATION MARK FORMATION DURING SIDEWALL IMAGE TRANSFER PROCESS
- Publication number 20180061773
- Publication date Mar 1, 2018
- International Business Machines Corporation
- David J. Conklin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REGISTRATION MARK FORMATION DURING SIDEWALL IMAGE TRANSFER PROCESS
- Publication number 20160358861
- Publication date Dec 8, 2016
- International Business Machines Corporation
- David J. Conklin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REGISTRATION MARK FORMATION DURING SIDEWALL IMAGE TRANSFER PROCESS
- Publication number 20160247766
- Publication date Aug 25, 2016
- International Business Machines Corporation
- David J. Conklin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER FILL PATTERNS AND USES
- Publication number 20130181267
- Publication date Jul 18, 2013
- International Business Machines Corporation
- Martin Burkhardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALIGNMENT MARKS FOR MULTI-EXPOSURE LITHOGRAPHY
- Publication number 20130177840
- Publication date Jul 11, 2013
- International Business Machines Corporation
- Allen H. Gabor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SIDEWALL IMAGE TRANSFER PROCESS WITH MULTIPLE CRITICAL DIMENSIONS
- Publication number 20130089984
- Publication date Apr 11, 2013
- International Business Machines Corporation
- Sudharshanan Raghunathan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LAYER CHIP OVERLAY TARGET AND MEASUREMENT
- Publication number 20130075871
- Publication date Mar 28, 2013
- International Business Machines Corporation
- Christopher P. Ausschnitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALIGNMENT DATA BASED PROCESS CONTROL SYSTEM
- Publication number 20130041494
- Publication date Feb 14, 2013
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G05 - CONTROLLING REGULATING
Information Patent Application
PROCESS OF MAKING A LITHOGRAPHIC STRUCTURE USING ANTIREFLECTIVE MAT...
- Publication number 20130017486
- Publication date Jan 17, 2013
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
ALIGNMENT MARKS FOR MULTI-EXPOSURE LITHOGRAPHY
- Publication number 20130001193
- Publication date Jan 3, 2013
- International Business Machines Corporation
- Allen H. Gabor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER FILL PATTERNS AND USES
- Publication number 20120126294
- Publication date May 24, 2012
- International Business Machines Corporation
- Martin Burkhardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE RESULTING FROM CHEMICAL SHRINK PROCESS OVER BARC (BOTTOM...
- Publication number 20120076982
- Publication date Mar 29, 2012
- International Business Machines Corporation
- Todd Christopher Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LAYER CHIP OVERLAY TARGET AND MEASUREMENT
- Publication number 20110248388
- Publication date Oct 13, 2011
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MONITORING FOCUS ON AN INTEGRATED WAFER
- Publication number 20090284722
- Publication date Nov 19, 2009
- International Business Machines Corporation
- Allen H. Gabor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR FORMING A COMPOSITE PATTERN INCLUDING PRINTED RESOLUTIO...
- Publication number 20090181330
- Publication date Jul 16, 2009
- International Business Machines Corporation
- Allen H. Gabor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYCONDUCTOR LINE END FORMATION AND RELATED MASK
- Publication number 20090117737
- Publication date May 7, 2009
- Shahid A. Butt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Integrated Circuits and Methods of Design and Manufacture Thereof
- Publication number 20090081563
- Publication date Mar 26, 2009
- Helen Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEMORY CELL
- Publication number 20090065956
- Publication date Mar 12, 2009
- International Business Machines Corporation
- Matthew E. Colburn
- G11 - INFORMATION STORAGE
Information Patent Application
LINE ENDS FORMING
- Publication number 20090068837
- Publication date Mar 12, 2009
- International Business Machines Corporation
- Matthew E. Colburn
- G11 - INFORMATION STORAGE
Information Patent Application
PROCESS OF MAKING A LITHOGRAPHIC STRUCTURE USING ANTIREFLECTIVE MAT...
- Publication number 20090061355
- Publication date Mar 5, 2009
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS OF MAKING A SEMICONDUCTOR DEVICE USING MULTIPLE ANTIREFLECT...
- Publication number 20080311508
- Publication date Dec 18, 2008
- INTERNATION BUSINESS MACHINES CORPORATION
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITE STRUCTURES TO PREVENT PATTERN COLLAPSE
- Publication number 20080286683
- Publication date Nov 20, 2008
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE EXPOSURE LITHOGRAPHY METHOD INCORPORATING INTERMEDIATE LAY...
- Publication number 20080254633
- Publication date Oct 16, 2008
- International Business Machines Corporation
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REDUCING WITHIN CHIP DEVICE PARAMETER VARIATIONS
- Publication number 20080246097
- Publication date Oct 9, 2008
- Brent Alan Anderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND ALGORITHM FOR THE CONTROL OF CRITICAL DIMENSIONS IN A TH...
- Publication number 20080154420
- Publication date Jun 26, 2008
- International Business Machines Corporation
- Colin J. Brodsky
- G05 - CONTROLLING REGULATING

Allen H. Gabor

Person

Patents Grantslast 30 patents

Litho-etch-litho-etch with self-aligned blocks

Method for calculating non-correctable EUV blank flatness for blank...

Registration mark formation during sidewall image transfer process

Registration mark formation during sidewall image transfer process

Registration mark formation during sidewall image transfer process

Registration mark formation during sidewall image transfer process

Alignment data based process control system

Method for monitoring focus on an integrated wafer

Multi-layer chip overlay target and measurement

Sidewall image transfer process with multiple critical dimensions

Process of making a lithographic structure using antireflective mat...

Alignment marks for multi-exposure lithography

Method of forming a semiconductor device having a cut-way hole to e...

Structure resulting from chemical shrink process over BARC (bottom...

Alignment marks for multi-exposure lithography

Multi-layer chip overlay target and measurement

Process of making a lithographic structure using antireflective mat...

Methods for forming a composite pattern including printed resolutio...

Method for performing chemical shrink process over BARC (bottom ant...

Integrated circuits and methods of design and manufacture thereof

Line ends forming

Process of making a semiconductor device using multiple antireflect...

Multiple exposure lithography method incorporating intermediate lay...

Composite structures to prevent pattern collapse

Polyconductor line end formation and related mask

Methods for reducing within chip device parameter variations

Method and algorithm for the control of critical dimensions in a th...

Process of making a semiconductor device using multiple antireflect...

Mask design for enhancing line end resolution

Polyconductor line end formation and related mask

Patents Applicationslast 30 patents

OPTIMAL SCANNER MAPS AND FIELD LAYOUTS

METHOD FOR FORMING CONTINUOUS LINE-END TO LINE-END SPACES WITH SPAC...

LITHO-ETCH-LITHO-ETCH WITH SELF-ALIGNED BLOCKS

METHOD FOR CALCULATING NON-CORRECTABLE EUV BLANK FLATNESS FOR BLANK...

REGISTRATION MARK FORMATION DURING SIDEWALL IMAGE TRANSFER PROCESS

REGISTRATION MARK FORMATION DURING SIDEWALL IMAGE TRANSFER PROCESS

REGISTRATION MARK FORMATION DURING SIDEWALL IMAGE TRANSFER PROCESS

REGISTRATION MARK FORMATION DURING SIDEWALL IMAGE TRANSFER PROCESS

WAFER FILL PATTERNS AND USES

ALIGNMENT MARKS FOR MULTI-EXPOSURE LITHOGRAPHY

SIDEWALL IMAGE TRANSFER PROCESS WITH MULTIPLE CRITICAL DIMENSIONS

MULTI-LAYER CHIP OVERLAY TARGET AND MEASUREMENT

ALIGNMENT DATA BASED PROCESS CONTROL SYSTEM

PROCESS OF MAKING A LITHOGRAPHIC STRUCTURE USING ANTIREFLECTIVE MAT...

ALIGNMENT MARKS FOR MULTI-EXPOSURE LITHOGRAPHY

WAFER FILL PATTERNS AND USES

STRUCTURE RESULTING FROM CHEMICAL SHRINK PROCESS OVER BARC (BOTTOM...

MULTI-LAYER CHIP OVERLAY TARGET AND MEASUREMENT

METHOD FOR MONITORING FOCUS ON AN INTEGRATED WAFER

METHODS FOR FORMING A COMPOSITE PATTERN INCLUDING PRINTED RESOLUTIO...

POLYCONDUCTOR LINE END FORMATION AND RELATED MASK

Integrated Circuits and Methods of Design and Manufacture Thereof

MEMORY CELL

LINE ENDS FORMING

PROCESS OF MAKING A LITHOGRAPHIC STRUCTURE USING ANTIREFLECTIVE MAT...

PROCESS OF MAKING A SEMICONDUCTOR DEVICE USING MULTIPLE ANTIREFLECT...

COMPOSITE STRUCTURES TO PREVENT PATTERN COLLAPSE

MULTIPLE EXPOSURE LITHOGRAPHY METHOD INCORPORATING INTERMEDIATE LAY...

METHODS FOR REDUCING WITHIN CHIP DEVICE PARAMETER VARIATIONS

METHOD AND ALGORITHM FOR THE CONTROL OF CRITICAL DIMENSIONS IN A TH...