Alok Jain

Follow

Person

Singapore, SG

People

Patents Grantslast 30 patents

Information Patent Grant
Dual damascene etch processes
- Patent number 7,253,115
- Issue date Aug 7, 2007
- Applied Materials, Inc.
- Hiroya Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etching of low-k dielectrics
- Patent number 7,229,930
- Issue date Jun 12, 2007
- Applied Materials, Inc.
- Alok Jain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High density plasma CVD process for gapfill into high aspect ratio...
- Patent number 6,802,944
- Issue date Oct 12, 2004
- Applied Materials, Inc.
- Farhan Ahmad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etching a trench having rounded top corners in a silicon...
- Patent number 6,180,533
- Issue date Jan 30, 2001
- Applied Materials, Inc.
- Alok Jain
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MODIFIED STACKS FOR 3D NAND
- Publication number 20210040607
- Publication date Feb 11, 2021
- Applied Materials, Inc.
- Xinhai Han
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dual damascene etch processes
- Publication number 20040157460
- Publication date Aug 12, 2004
- APPLIED MATERIALS, INC.
- Hiroya Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective etching of low-k dielectrics
- Publication number 20040137748
- Publication date Jul 15, 2004
- APPLIED MATERIALS, INC.
- Alok Jain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High density plasma CVD process for gapfill into high aspect ratio...
- Publication number 20040079632
- Publication date Apr 29, 2004
- Applied Materials, Inc.
- Farhan Ahmad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...