Alok VAID

Person

Ballston Lake, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for non-destructive metrology of thin layers
- Patent number 11,906,451
- Issue date Feb 20, 2024
- Nova Ltd.
- Wei Ti Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process control of semiconductor fabrication based on spectra quali...
- Patent number 11,300,948
- Issue date Apr 12, 2022
- Nova Ltd.
- Taher Kagalwala
- G05 - CONTROLLING REGULATING
Information Patent Grant
Measuring complex structures in semiconductor fabrication
- Patent number 10,664,638
- Issue date May 26, 2020
- GLOBALFOUNDRIES Inc.
- Taher Kagalwala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Three-dimensional scatterometry for measuring dielectric thickness
- Patent number 10,508,900
- Issue date Dec 17, 2019
- GLOBALFOUNDRIES Inc.
- Padraig Timoney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scatterometry method and system
- Patent number 10,302,414
- Issue date May 28, 2019
- Nova Measuring Instruments Ltd.
- Gilad Wainreb
- G01 - MEASURING TESTING
Information Patent Grant
Planar metrology pad adjacent a set of fins of a fin field effect t...
- Patent number 10,121,711
- Issue date Nov 6, 2018
- GLOBALFOUNDRIES Inc.
- Sipeng Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement system and method for measuring in thin films
- Patent number 10,030,971
- Issue date Jul 24, 2018
- Globalfoundries, Inc.
- Cornel Bozdog
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of controlling a manufacturing process for a mi...
- Patent number 9,995,692
- Issue date Jun 12, 2018
- GLOBALFOUNDRIES, INC.
- Givantha Iddawela
- G05 - CONTROLLING REGULATING
Information Patent Grant
Three-dimensional scatterometry for measuring dielectric thickness
- Patent number 9,903,707
- Issue date Feb 27, 2018
- GLOBALFOUNDRIES Inc.
- Padraig Timoney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated hybrid metrology for semiconductor device fabrication
- Patent number 9,330,985
- Issue date May 3, 2016
- GLOBALFOUNDRIES, INC.
- Alok Vaid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Decoupling measurement of layer thicknesses of a plurality of layer...
- Patent number 9,281,249
- Issue date Mar 8, 2016
- GLOBALFOUNDRIES Inc.
- Alok Vaid
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for fabricating semiconductor device structures
- Patent number 9,177,873
- Issue date Nov 3, 2015
- GLOBALFOUNDRIES, INC.
- Alok Vaid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Planar metrology pad adjacent a set of fins of a fin field effect t...
- Patent number 9,129,905
- Issue date Sep 8, 2015
- GLOBALFOUNDRIES Inc.
- Xiang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planar metrology pad adjacent a set of fins of a fin field effect t...
- Patent number 9,121,890
- Issue date Sep 1, 2015
- GLOBALFOUNDRIES Inc.
- Sipeng Gu
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for fabricating semiconductor device structures...
- Patent number 8,892,237
- Issue date Nov 18, 2014
- GLOBALFOUNDRIES, INC.
- Alok Vaid
- G01 - MEASURING TESTING
Information Patent Grant
Automating integrated circuit device library generation in model ba...
- Patent number 8,869,081
- Issue date Oct 21, 2014
- International Business Machines Corporation
- Nedal Saleh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Etching system and method for forming multiple porous semiconductor...
- Patent number 8,157,978
- Issue date Apr 17, 2012
- International Business Machines Corporation
- Matthew J. Sendelbach
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method of controlling embedded material/gate proximity
- Patent number 7,838,308
- Issue date Nov 23, 2010
- Advanced Micro Devices, Inc.
- Rohit Pal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for calibrating a process for growing an epitaxial silicon...
- Patent number 7,682,845
- Issue date Mar 23, 2010
- GlobalFoundries Inc.
- Rohit Pal
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM FOR NON-DESTRUCTIVE METROLOGY OF THIN LAYERS
- Publication number 20220074878
- Publication date Mar 10, 2022
- NOVA LTD
- Wei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CONTROL OF SEMICONDUCTOR FABRICATION BASED ON SPECTRA QUALI...
- Publication number 20200409345
- Publication date Dec 31, 2020
- GLOBALFOUNDRIES INC.
- TAHER KAGALWALA
- G05 - CONTROLLING REGULATING
Information Patent Application
PROCESS CONTROL OF SEMICONDUCTOR FABRICATION BASED ON LINKAGE BETWE...
- Publication number 20200279783
- Publication date Sep 3, 2020
- GLOBALFOUNDRIES INC.
- PADRAIG TIMONEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASURING COMPLEX STRUCTURES IN SEMICONDUCTOR FABRICATION
- Publication number 20200192987
- Publication date Jun 18, 2020
- GLOBALFOUNDRIES INC.
- TAHER KAGALWALA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR NON-DESTRUCTIVE METROLOGY OF THIN LAYERS
- Publication number 20180172609
- Publication date Jun 21, 2018
- NOVA MEASURING INSTRUMENTS LTD.
- Wei Ti LEE
- G01 - MEASURING TESTING
Information Patent Application
THREE-DIMENSIONAL SCATTEROMETRY FOR MEASURING DIELECTRIC THICKNESS
- Publication number 20180135967
- Publication date May 17, 2018
- GLOBALFOUNDRIES INC.
- Padraig TIMONEY
- G01 - MEASURING TESTING
Information Patent Application
SIGNAL DETECTION METHOLODOGY FOR FABRICATION CONTROL
- Publication number 20170199511
- Publication date Jul 13, 2017
- GLOBALFOUNDRIES INC.
- Dongsuk PARK
- G05 - CONTROLLING REGULATING
Information Patent Application
THREE-DIMENSIONAL SCATTEROMETRY FOR MEASURING DIELECTRIC THICKNESS
- Publication number 20170082423
- Publication date Mar 23, 2017
- GLOBALFOUNDRIES INC.
- Padraig TIMONEY
- G01 - MEASURING TESTING
Information Patent Application
MEASUREMENT SYSTEM AND METHOD FOR MEASURING IN THIN FILMS
- Publication number 20170038201
- Publication date Feb 9, 2017
- GLOBALFOUNDRIES, INC.
- Cornel Bozdog
- G01 - MEASURING TESTING
Information Patent Application
HYBRID METROLOGY TECHNIQUE
- Publication number 20170018069
- Publication date Jan 19, 2017
- Alok Vaid
- G01 - MEASURING TESTING
Information Patent Application
SYSTEMS AND METHODS OF CONTROLLING A MANUFACTURING PROCESS FOR A MI...
- Publication number 20160239012
- Publication date Aug 18, 2016
- GLOBALFOUNDRIES, Inc.
- Givantha Iddawela
- G05 - CONTROLLING REGULATING
Information Patent Application
SCATTEROMETRY METHOD AND SYSTEM
- Publication number 20160076876
- Publication date Mar 17, 2016
- NOVA MEASURING INSTRUMENTS LTD.
- Gilad WAINREB
- G01 - MEASURING TESTING
Information Patent Application
PLANAR METROLOGY PAD ADJACENT A SET OF FINS IN A FIN FIELD EFFECT T...
- Publication number 20150348913
- Publication date Dec 3, 2015
- GLOBALFOUNDRIES INC.
- Xiang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLANAR METROLOGY PAD ADJACENT A SET OF FINS OF A FIN FIELD EFFECT T...
- Publication number 20150340296
- Publication date Nov 26, 2015
- GLOBALFOUNDRIES INC.
- Sipeng Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DECOUPLING MEASUREMENT OF LAYER THICKNESSES OF A PLURALITY OF LAYER...
- Publication number 20150198435
- Publication date Jul 16, 2015
- GLOBALFOUNDRIES INC.
- Alok VAID
- G01 - MEASURING TESTING
Information Patent Application
PLANAR METROLOGY PAD ADJACENT A SET OF FINS OF A FIN FIELD EFFECT T...
- Publication number 20150123212
- Publication date May 7, 2015
- GLOBALFOUNDRIES INC.
- Xiang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLANAR METROLOGY PAD ADJACENT A SET OF FINS OF A FIN FIELD EFFECT T...
- Publication number 20150115267
- Publication date Apr 30, 2015
- GLOBALFOUNDRIES INC.
- Sipeng Gu
- G01 - MEASURING TESTING
Information Patent Application
SYSTEMS AND METHODS FOR FABRICATING SEMICONDUCTOR DEVICE STRUCTURES
- Publication number 20150033201
- Publication date Jan 29, 2015
- GLOBALFOUNDRIES, Inc.
- Alok Vaid
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEMS AND METHODS FOR FABRICATING SEMICONDUCTOR DEVICE STRUCTURES...
- Publication number 20140273299
- Publication date Sep 18, 2014
- GLOBALFOUNDRIES, Inc.
- Alok Vaid
- G01 - MEASURING TESTING
Information Patent Application
AUTOMATING INTEGRATED CIRCUIT DEVICE LIBRARY GENERATION IN MODEL BA...
- Publication number 20140201693
- Publication date Jul 17, 2014
- GLOBALFOUNDRIES INC.
- Nedal Saleh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU ACTIVE WAFER CHARGE SCREENING BY CONFORMAL GROUNDING
- Publication number 20140073114
- Publication date Mar 13, 2014
- GLOBALFOUNDRIES INC.
- Cheng Cen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTOMATED HYBRID METROLOGY FOR SEMICONDUCTOR DEVICE FABRICATION
- Publication number 20130245806
- Publication date Sep 19, 2013
- International Business Machines Corporation
- Alok Vaid
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU ACTIVE WAFER CHARGE SCREENING BY CONFORMAL GROUNDING
- Publication number 20130200501
- Publication date Aug 8, 2013
- GLOBALFOUNDRIES INC.
- Cheng Cen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID METROLOGY FOR SEMICONDUCTOR DEVICES
- Publication number 20130203188
- Publication date Aug 8, 2013
- GLOBALFOUNDRIES INC.
- Alok Vaid
- G01 - MEASURING TESTING
Information Patent Application
ETCHING SYSTEM AND METHOD FOR FORMING MULTIPLE POROUS SEMICONDUCTOR...
- Publication number 20100187126
- Publication date Jul 29, 2010
- International Business Machines Corporation
- Matthew J. Sendelbach
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHOD OF CONTROLLING EMBEDDED MATERIAL/GATE PROXIMITY
- Publication number 20090280579
- Publication date Nov 12, 2009
- Advanced Micro Devices, Inc.
- Rohit Pal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING STRESSED LAYER GATE PROXIMITY
- Publication number 20090228132
- Publication date Sep 10, 2009
- Kevin R. Lensing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR CALIBRATING A PROCESS FOR GROWING AN EPITAXIAL SILICON...
- Publication number 20090170223
- Publication date Jul 2, 2009
- Advanced Micro Devices, Inc.
- Rohit PAL
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING CHARACTERISTICS OF A STRESSED...
- Publication number 20080248598
- Publication date Oct 9, 2008
- Rohit Pal
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Method and system for non-destructive metrology of thin layers

Process control of semiconductor fabrication based on spectra quali...

Measuring complex structures in semiconductor fabrication

Three-dimensional scatterometry for measuring dielectric thickness

Scatterometry method and system

Planar metrology pad adjacent a set of fins of a fin field effect t...

Measurement system and method for measuring in thin films

Systems and methods of controlling a manufacturing process for a mi...

Three-dimensional scatterometry for measuring dielectric thickness

Automated hybrid metrology for semiconductor device fabrication

Decoupling measurement of layer thicknesses of a plurality of layer...

Systems and methods for fabricating semiconductor device structures

Planar metrology pad adjacent a set of fins of a fin field effect t...

Planar metrology pad adjacent a set of fins of a fin field effect t...

Systems and methods for fabricating semiconductor device structures...

Automating integrated circuit device library generation in model ba...

Etching system and method for forming multiple porous semiconductor...

Method of controlling embedded material/gate proximity

Methods for calibrating a process for growing an epitaxial silicon...

Patents Applicationslast 30 patents

METHOD AND SYSTEM FOR NON-DESTRUCTIVE METROLOGY OF THIN LAYERS

PROCESS CONTROL OF SEMICONDUCTOR FABRICATION BASED ON SPECTRA QUALI...

PROCESS CONTROL OF SEMICONDUCTOR FABRICATION BASED ON LINKAGE BETWE...

MEASURING COMPLEX STRUCTURES IN SEMICONDUCTOR FABRICATION

METHOD AND SYSTEM FOR NON-DESTRUCTIVE METROLOGY OF THIN LAYERS

THREE-DIMENSIONAL SCATTEROMETRY FOR MEASURING DIELECTRIC THICKNESS

SIGNAL DETECTION METHOLODOGY FOR FABRICATION CONTROL

THREE-DIMENSIONAL SCATTEROMETRY FOR MEASURING DIELECTRIC THICKNESS

MEASUREMENT SYSTEM AND METHOD FOR MEASURING IN THIN FILMS

HYBRID METROLOGY TECHNIQUE

SYSTEMS AND METHODS OF CONTROLLING A MANUFACTURING PROCESS FOR A MI...

SCATTEROMETRY METHOD AND SYSTEM

PLANAR METROLOGY PAD ADJACENT A SET OF FINS IN A FIN FIELD EFFECT T...

PLANAR METROLOGY PAD ADJACENT A SET OF FINS OF A FIN FIELD EFFECT T...

DECOUPLING MEASUREMENT OF LAYER THICKNESSES OF A PLURALITY OF LAYER...

PLANAR METROLOGY PAD ADJACENT A SET OF FINS OF A FIN FIELD EFFECT T...

PLANAR METROLOGY PAD ADJACENT A SET OF FINS OF A FIN FIELD EFFECT T...

SYSTEMS AND METHODS FOR FABRICATING SEMICONDUCTOR DEVICE STRUCTURES

SYSTEMS AND METHODS FOR FABRICATING SEMICONDUCTOR DEVICE STRUCTURES...

AUTOMATING INTEGRATED CIRCUIT DEVICE LIBRARY GENERATION IN MODEL BA...

IN-SITU ACTIVE WAFER CHARGE SCREENING BY CONFORMAL GROUNDING

AUTOMATED HYBRID METROLOGY FOR SEMICONDUCTOR DEVICE FABRICATION

IN-SITU ACTIVE WAFER CHARGE SCREENING BY CONFORMAL GROUNDING

HYBRID METROLOGY FOR SEMICONDUCTOR DEVICES

ETCHING SYSTEM AND METHOD FOR FORMING MULTIPLE POROUS SEMICONDUCTOR...

METHOD OF CONTROLLING EMBEDDED MATERIAL/GATE PROXIMITY

METHOD AND APPARATUS FOR CONTROLLING STRESSED LAYER GATE PROXIMITY

METHODS FOR CALIBRATING A PROCESS FOR GROWING AN EPITAXIAL SILICON...

METHOD AND APPARATUS FOR DETERMINING CHARACTERISTICS OF A STRESSED...