Amit Jain

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Fremont, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Etching carbon layer using doped carbon as a hard mask
- Patent number 11,270,890
- Issue date Mar 8, 2022
- Lam Research Corporation
- Amit Jain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch with pulsed bias
- Patent number 9,059,116
- Issue date Jun 16, 2015
- Lam Research Corporation
- Amit Jain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spacer formation for array double patterning
- Patent number 8,986,492
- Issue date Mar 24, 2015
- Lam Research Corporation
- S. M. Reza Sadjadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spacer formation for array double patterning
- Patent number 8,138,092
- Issue date Mar 20, 2012
- Lam Research Corporation
- S. M. Reza Sadjadi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCHING CARBON LAYER USING DOPED CARBON AS A HARD MASK
- Publication number 20200194272
- Publication date Jun 18, 2020
- LAM RESEARCH CORPORATION
- Amit Jain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH WITH PULSED BIAS
- Publication number 20130084708
- Publication date Apr 4, 2013
- LAM RESEARCH CORPORATION
- Amit JAIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPACER FORMATION FOR ARRAY DOUBLE PATTERNING
- Publication number 20120138227
- Publication date Jun 7, 2012
- LAM RESEARCH CORPORATION
- S. M. Reza Sadjadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPACER FORMATION FOR ARRAY DOUBLE PATTERNING
- Publication number 20100178769
- Publication date Jul 15, 2010
- LAM RESEARCH CORPORATION
- S. M. Reza Sadjadi
- H01 - BASIC ELECTRIC ELEMENTS