Amit S. Kelkar

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Castle Rock, CO, US

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Patents Grantslast 30 patents

Information Patent Grant
Method for fabrication of a high capacitance interpoly dielectric
- Patent number 6,709,990
- Issue date Mar 23, 2004
- Atmel Corporation
- Mark A. Good
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabrication of a high capacitance interpoly dielectric
- Patent number 6,495,475
- Issue date Dec 17, 2002
- Atmel Corporation
- Mark A. Good
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming pre-metal dielectric film on a semiconductor subs...
- Patent number 6,489,254
- Issue date Dec 3, 2002
- Atmel Corporation
- Amit S. Kelkar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing a selected thickness of an interlevel dielect...
- Patent number 6,291,367
- Issue date Sep 18, 2001
- Atmel Corporation
- Amit S. Kelkar
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method for fabrication of a high capacitance interpoly dielectric
- Publication number 20030045123
- Publication date Mar 6, 2003
- Mark A. Good
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabrication of a high capacitance interpoly dielectric
- Publication number 20020142570
- Publication date Oct 3, 2002
- Mark A. Good
- H01 - BASIC ELECTRIC ELEMENTS