Amitabh SABHARWAL

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for improving CD micro-loading in photomask plasma etching
- Patent number 10,199,224
- Issue date Feb 5, 2019
- Applied Materials, Inc.
- Zhigang Mao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for dry etch with edge, side and back protection
- Patent number 10,170,277
- Issue date Jan 1, 2019
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Direct lift process apparatus
- Patent number 9,978,632
- Issue date May 22, 2018
- Applied Materials, Inc.
- Khiem Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrodes for etch
- Patent number 9,754,765
- Issue date Sep 5, 2017
- Applied Materials, Inc.
- Banqiu Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improving CD micro-loading in photomask plasma etching
- Patent number 9,425,062
- Issue date Aug 23, 2016
- Applied Materials, Inc.
- Zhigang Mao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etching EUV material layers utilized to form a photomask
- Patent number 8,778,574
- Issue date Jul 15, 2014
- Applied Materials, Inc.
- Keven Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for photomask plasma etching
- Patent number 8,568,553
- Issue date Oct 29, 2013
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for photomask etching
- Patent number 7,964,818
- Issue date Jun 21, 2011
- Applied Materials, Inc.
- Elmira Ryabova
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Method and apparatus for photomask plasma etching
- Patent number 7,943,005
- Issue date May 17, 2011
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for photomask plasma etching
- Patent number 7,909,961
- Issue date Mar 22, 2011
- Applied Materials, Inc.
- Ajay Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHODS FOR DRY ETCH WITH EDGE, SIDE AND BACK PROTECTION
- Publication number 20190096634
- Publication date Mar 28, 2019
- Applied Materials, Inc.
- Saravjeet SINGH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IMPROVING CD MICRO-LOADING IN PHOTOMASK PLASMA ETCHING
- Publication number 20160329210
- Publication date Nov 10, 2016
- Applied Materials, Inc.
- Zhigang MAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECT LIFT PROCESS APPARATUS
- Publication number 20150364347
- Publication date Dec 17, 2015
- Applied Materials, Inc.
- Khiem NGUYEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOVEL ELECTRODES FOR ETCH
- Publication number 20150090401
- Publication date Apr 2, 2015
- Banqiu Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED BEAM PLASMA APPARATUS FOR PHOTOMASK MANUFACTURE APPLICATIONS
- Publication number 20140356768
- Publication date Dec 4, 2014
- Banqiu WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR IMPROVING CD MICRO-LOADING IN PHOTOMASK PLASMA ETCHING
- Publication number 20140273490
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Zhigang MAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR ETCHING EUV MATERIAL LAYERS UTILIZED TO FORM A PHOTOMASK
- Publication number 20140154615
- Publication date Jun 5, 2014
- Keven Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ETCHING AN EUV REFLECTIVE MULTI-MATERIAL LAYERS UTILIZED...
- Publication number 20130092655
- Publication date Apr 18, 2013
- Keven Yu
- B44 - DECORATIVE ARTS
Information Patent Application
METHODS FOR IN-SITU CHAMBER DRY CLEAN IN PHOTOMASK PLASMA ETCHING P...
- Publication number 20130048606
- Publication date Feb 28, 2013
- Zhigang Mao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHODS FOR DRY ETCH WITH EDGE, SIDE AND BACK PROTECTION
- Publication number 20120305185
- Publication date Dec 6, 2012
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20110162797
- Publication date Jul 7, 2011
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA REACTOR HAVING RF PHASE CONTROL AND METH...
- Publication number 20100276391
- Publication date Nov 4, 2010
- Applied Materials, Inc.
- MICHAEL N. GRIMBERGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BACKSIDE CLEANING OF SUBSTRATE
- Publication number 20100028813
- Publication date Feb 4, 2010
- Banqiu Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK ETCH PROCESS
- Publication number 20080179282
- Publication date Jul 31, 2008
- Madhavi R. Chandrachood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20080099431
- Publication date May 1, 2008
- APPLIED MATERIALS, INC.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20080099426
- Publication date May 1, 2008
- Ajay Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK ETCHING
- Publication number 20080101978
- Publication date May 1, 2008
- Elmira Ryabova
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES

Amitabh SABHARWAL

Person

Patents Grantslast 30 patents

Method for improving CD micro-loading in photomask plasma etching

Apparatus and methods for dry etch with edge, side and back protection

Direct lift process apparatus

Electrodes for etch

Method for improving CD micro-loading in photomask plasma etching

Method for etching EUV material layers utilized to form a photomask

Method and apparatus for photomask plasma etching

Method and apparatus for photomask etching

Method and apparatus for photomask plasma etching

Method and apparatus for photomask plasma etching

Patents Applicationslast 30 patents

APPARATUS AND METHODS FOR DRY ETCH WITH EDGE, SIDE AND BACK PROTECTION

METHOD FOR IMPROVING CD MICRO-LOADING IN PHOTOMASK PLASMA ETCHING

DIRECT LIFT PROCESS APPARATUS

NOVEL ELECTRODES FOR ETCH

CHARGED BEAM PLASMA APPARATUS FOR PHOTOMASK MANUFACTURE APPLICATIONS

METHOD FOR IMPROVING CD MICRO-LOADING IN PHOTOMASK PLASMA ETCHING

METHOD FOR ETCHING EUV MATERIAL LAYERS UTILIZED TO FORM A PHOTOMASK

METHOD FOR ETCHING AN EUV REFLECTIVE MULTI-MATERIAL LAYERS UTILIZED...

METHODS FOR IN-SITU CHAMBER DRY CLEAN IN PHOTOMASK PLASMA ETCHING P...

APPARATUS AND METHODS FOR DRY ETCH WITH EDGE, SIDE AND BACK PROTECTION

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

INDUCTIVELY COUPLED PLASMA REACTOR HAVING RF PHASE CONTROL AND METH...

BACKSIDE CLEANING OF SUBSTRATE

MASK ETCH PROCESS

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

METHOD AND APPARATUS FOR PHOTOMASK ETCHING