Amnon Manassen

Person

Haifa, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for correction of impact of wafer tilt on misre...
- Patent number 12,170,215
- Issue date Dec 17, 2024
- KLA Corporation
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adaptive modeling misregistration measurement system and method
- Patent number 12,165,930
- Issue date Dec 10, 2024
- KLA Corporation
- Amnon Manassen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems and methods for improved metrology for semiconductor device...
- Patent number 12,131,959
- Issue date Oct 29, 2024
- KLA Corporation
- Liran Yerushalmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical metrology utilizing short-wave infrared wavelengths
- Patent number 12,111,580
- Issue date Oct 8, 2024
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Device feature specific edge placement error (EPE)
- Patent number 12,092,966
- Issue date Sep 17, 2024
- KLA Corporation
- Amnon Manassen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Universal metrology model
- Patent number 12,078,601
- Issue date Sep 3, 2024
- KLA Corporation
- Nireekshan K. Reddy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Single grab overlay measurement of tall targets
- Patent number 12,066,322
- Issue date Aug 20, 2024
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Imaging overlay with mutually coherent oblique illumination
- Patent number 12,032,300
- Issue date Jul 9, 2024
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Grant
Enhancing performance of overlay metrology
- Patent number 12,001,148
- Issue date Jun 4, 2024
- KLA Corporation
- Amnon Manassen
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
On-product overlay targets
- Patent number 11,967,535
- Issue date Apr 23, 2024
- KLA Corporation
- Amnon Manassen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sensitive optical metrology in scanning and static modes
- Patent number 11,933,717
- Issue date Mar 19, 2024
- KLA Corporation
- Andrew V. Hill
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for determining target feature focus in image-bas...
- Patent number 11,921,825
- Issue date Mar 5, 2024
- KLA Corporation
- Etay Lavert
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Massive overlay metrology sampling with multiple measurement columns
- Patent number 11,899,375
- Issue date Feb 13, 2024
- KLA Corporation
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of measuring misregistration in the manufacture of topograph...
- Patent number 11,880,141
- Issue date Jan 23, 2024
- KLA Corporation
- Daria Negri
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems and methods for metrology with layer-specific illumination...
- Patent number 11,852,590
- Issue date Dec 26, 2023
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Moiré scatterometry overlay
- Patent number 11,841,621
- Issue date Dec 12, 2023
- KLA Corporation CA
- Andrew V. Hill
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical near-field metrology
- Patent number 11,815,347
- Issue date Nov 14, 2023
- KLA-Tencor Corporation
- Yuri Paskover
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-directional overlay metrology using multiple illumination par...
- Patent number 11,800,212
- Issue date Oct 24, 2023
- KLA Corporation
- Yonatan Vaknin
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Measurement of overlay error using device inspection system
- Patent number 11,784,097
- Issue date Oct 10, 2023
- KLA-Tencor Corporation
- Choon Hoong Hoo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-resolution overlay metrology targets
- Patent number 11,726,410
- Issue date Aug 15, 2023
- KLA Corporation
- Eitan Hajaj
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modulation of scanning velocity during overlay metrology
- Patent number 11,719,533
- Issue date Aug 8, 2023
- KLA Corporation
- David L. Brown
- G01 - MEASURING TESTING
Information Patent Grant
Overlay metrology using spectroscopic phase
- Patent number 11,713,959
- Issue date Aug 1, 2023
- KLA Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Device-like metrology targets
- Patent number 11,709,433
- Issue date Jul 25, 2023
- KLA-Tencor Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement of properties of patterned photoresist
- Patent number 11,644,419
- Issue date May 9, 2023
- KLA Corporation
- Roie Volkovich
- G01 - MEASURING TESTING
Information Patent Grant
Fab management with dynamic sampling plans, optimized wafer measure...
- Patent number 11,615,974
- Issue date Mar 28, 2023
- KLA Corporation
- Amnon Manassen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Enhancing performance of overlay metrology
- Patent number 11,592,755
- Issue date Feb 28, 2023
- KLA Corporation
- Amnon Manassen
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
System and method for measuring misregistration of semiconductor de...
- Patent number 11,573,497
- Issue date Feb 7, 2023
- KLA Corporation
- Daria Negri
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for determining target feature focus in image-bas...
- Patent number 11,556,738
- Issue date Jan 17, 2023
- KLA Corporation
- Etay Lavert
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Parallel scatterometry overlay metrology
- Patent number 11,531,275
- Issue date Dec 20, 2022
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Grant
Multi-field scanning overlay metrology
- Patent number 11,526,086
- Issue date Dec 13, 2022
- KLA Corporation
- Andrew V. Hill
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
GRATING-OVER-GRATING OVERLAY MEASUREMENT WITH PARALLEL COLOR PER LAYER
- Publication number 20240427252
- Publication date Dec 26, 2024
- KLA Corporation
- Amnon Manassen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION
- Publication number 20240329543
- Publication date Oct 3, 2024
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Application
SCANNING OVERLAY METROLOGY WITH HIGH SIGNAL TO NOISE RATIO
- Publication number 20240280914
- Publication date Aug 22, 2024
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
DEVICE FEATURE SPECIFIC EDGE PLACEMENT ERROR (EPE)
- Publication number 20240168391
- Publication date May 23, 2024
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
SINGLE GRAB OVERLAY MEASUREMENT OF TALL TARGETS
- Publication number 20240159585
- Publication date May 16, 2024
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
Overlay Estimation Based on Optical Inspection and Machine Learning
- Publication number 20240142883
- Publication date May 2, 2024
- KLA Corporation
- Nireekshan K. Reddy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCATTEROMETRY OVERLAY METROLOGY WITH ORTHOGONAL FINE-PITCH SEGMENTA...
- Publication number 20240053687
- Publication date Feb 15, 2024
- KLA Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
3D PROFILOMETRY WITH A LINNIK INTERFEROMETER
- Publication number 20240035810
- Publication date Feb 1, 2024
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS
- Publication number 20240027919
- Publication date Jan 25, 2024
- KLA Corporation
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR DETERMINING TARGET FEATURE FOCUS IN IMAGE-BAS...
- Publication number 20240020353
- Publication date Jan 18, 2024
- KLA Corporation
- Etay Lavert
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ENHANCING PERFORMANCE OF OVERLAY METROLOGY
- Publication number 20230400780
- Publication date Dec 14, 2023
- KLA Corporation
- Amnon Manassen
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
UNIVERSAL METROLOGY MODEL
- Publication number 20230384237
- Publication date Nov 30, 2023
- KLA Corporation
- Nireekshan K. Reddy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS
- Publication number 20230359129
- Publication date Nov 9, 2023
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-DIRECTIONAL OVERLAY METROLOGY USING MULTIPLE ILLUMINATION PAR...
- Publication number 20230328351
- Publication date Oct 12, 2023
- Yonatan Vaknin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXTRA TALL TARGET METROLOGY
- Publication number 20230324809
- Publication date Oct 12, 2023
- Yoram Uziel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCANNING SCATTEROMETRY OVERLAY METROLOGY
- Publication number 20230314319
- Publication date Oct 5, 2023
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION
- Publication number 20230259040
- Publication date Aug 17, 2023
- Andrew V. Hill
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR CORRECTION OF IMPACT OF WAFER TILT ON MISRE...
- Publication number 20230197483
- Publication date Jun 22, 2023
- KLA Corporation
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOIRÉ SCATTEROMETRY OVERLAY
- Publication number 20230133640
- Publication date May 4, 2023
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Application
SYSTEMS AND METHODS FOR ROTATIONAL CALIBRATION OF METROLOGY TOOLS
- Publication number 20230068016
- Publication date Mar 2, 2023
- KLA Corporation
- Alexander Novikov
- G01 - MEASURING TESTING
Information Patent Application
ADAPTIVE MODELING MISREGISTRATION MEASUREMENT SYSTEM AND METHOD
- Publication number 20220392809
- Publication date Dec 8, 2022
- KLA Corporation
- Amnon Manassen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OBLIQUE ILLUMINATION FOR OVERLAY METROLOGY
- Publication number 20220357674
- Publication date Nov 10, 2022
- Andrew V. Hill
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR IMPROVED METROLOGY FOR SEMICONDUCTOR DEVICE...
- Publication number 20220344218
- Publication date Oct 27, 2022
- KLA Corporation
- Liran Yerushalmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR ABSOLUTE SAMPLE POSITIONING
- Publication number 20220344192
- Publication date Oct 27, 2022
- KLA Corporation
- Yoav Grauer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-RESOLUTION OVERLAY METROLOGY TARGETS
- Publication number 20220334501
- Publication date Oct 20, 2022
- KLA Corporation
- Eitan Hajaj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ON-PRODUCT OVERLAY TARGETS
- Publication number 20220328365
- Publication date Oct 13, 2022
- KLA Corporation
- Amnon Manassen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCING PERFORMANCE OF OVERLAY METROLOGY
- Publication number 20220317577
- Publication date Oct 6, 2022
- KLA Corporation
- Amnon Manassen
- G02 - OPTICS
Information Patent Application
Systems and Methods for Measurement of Misregistration and Ameliora...
- Publication number 20220307824
- Publication date Sep 29, 2022
- KLA Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Modulation Of Scanning Velocity During Overlay Metrology
- Publication number 20220307825
- Publication date Sep 29, 2022
- KLA Corporation
- David L. Brown
- G01 - MEASURING TESTING
Information Patent Application
OVERLAY METROLOGY USING SPECTROSCOPIC PHASE
- Publication number 20220299308
- Publication date Sep 22, 2022
- Andrei V. Shchegrov
- G01 - MEASURING TESTING

Amnon Manassen

Person

Patents Grantslast 30 patents

Systems and methods for correction of impact of wafer tilt on misre...

Adaptive modeling misregistration measurement system and method

Systems and methods for improved metrology for semiconductor device...

Optical metrology utilizing short-wave infrared wavelengths

Device feature specific edge placement error (EPE)

Universal metrology model

Single grab overlay measurement of tall targets

Imaging overlay with mutually coherent oblique illumination

Enhancing performance of overlay metrology

On-product overlay targets

Sensitive optical metrology in scanning and static modes

System and method for determining target feature focus in image-bas...

Massive overlay metrology sampling with multiple measurement columns

Method of measuring misregistration in the manufacture of topograph...

Systems and methods for metrology with layer-specific illumination...

Moiré scatterometry overlay

Optical near-field metrology

Multi-directional overlay metrology using multiple illumination par...

Measurement of overlay error using device inspection system

Multi-resolution overlay metrology targets

Modulation of scanning velocity during overlay metrology

Overlay metrology using spectroscopic phase

Device-like metrology targets

Measurement of properties of patterned photoresist

Fab management with dynamic sampling plans, optimized wafer measure...

Enhancing performance of overlay metrology

System and method for measuring misregistration of semiconductor de...

System and method for determining target feature focus in image-bas...

Parallel scatterometry overlay metrology

Multi-field scanning overlay metrology

Patents Applicationslast 30 patents

GRATING-OVER-GRATING OVERLAY MEASUREMENT WITH PARALLEL COLOR PER LAYER

IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION

SCANNING OVERLAY METROLOGY WITH HIGH SIGNAL TO NOISE RATIO

DEVICE FEATURE SPECIFIC EDGE PLACEMENT ERROR (EPE)

SINGLE GRAB OVERLAY MEASUREMENT OF TALL TARGETS

Overlay Estimation Based on Optical Inspection and Machine Learning

SCATTEROMETRY OVERLAY METROLOGY WITH ORTHOGONAL FINE-PITCH SEGMENTA...

3D PROFILOMETRY WITH A LINNIK INTERFEROMETER

MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS

SYSTEM AND METHOD FOR DETERMINING TARGET FEATURE FOCUS IN IMAGE-BAS...

ENHANCING PERFORMANCE OF OVERLAY METROLOGY

UNIVERSAL METROLOGY MODEL

MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS

MULTI-DIRECTIONAL OVERLAY METROLOGY USING MULTIPLE ILLUMINATION PAR...

EXTRA TALL TARGET METROLOGY

SCANNING SCATTEROMETRY OVERLAY METROLOGY

IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION

SYSTEMS AND METHODS FOR CORRECTION OF IMPACT OF WAFER TILT ON MISRE...

MOIRÉ SCATTEROMETRY OVERLAY

SYSTEMS AND METHODS FOR ROTATIONAL CALIBRATION OF METROLOGY TOOLS

ADAPTIVE MODELING MISREGISTRATION MEASUREMENT SYSTEM AND METHOD

OBLIQUE ILLUMINATION FOR OVERLAY METROLOGY

SYSTEMS AND METHODS FOR IMPROVED METROLOGY FOR SEMICONDUCTOR DEVICE...

SYSTEMS AND METHODS FOR ABSOLUTE SAMPLE POSITIONING

MULTI-RESOLUTION OVERLAY METROLOGY TARGETS

ON-PRODUCT OVERLAY TARGETS

ENHANCING PERFORMANCE OF OVERLAY METROLOGY

Systems and Methods for Measurement of Misregistration and Ameliora...

Modulation Of Scanning Velocity During Overlay Metrology

OVERLAY METROLOGY USING SPECTROSCOPIC PHASE