Amy M. Kwok

Person

Shrewsbury, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Photoresist compositions and methods
- Patent number 11,829,069
- Issue date Nov 28, 2023
- Rohm and Haas Electronic Materials LLC
- Joshua Kaitz
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pattern treatment methods
- Patent number 10,162,265
- Issue date Dec 25, 2018
- Rohm and Haas Electronic Materials LLC
- Jong Keun Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer comprising repeat units with photoacid-generating functiona...
- Patent number 9,606,434
- Issue date Mar 28, 2017
- Rohm and Haas Electronic Materials, LLC
- Paul J. LaBeaume
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and associated method of forming an electro...
- Patent number 9,557,642
- Issue date Jan 31, 2017
- Rohm and Haas Electronic Materials LLC
- Paul J. LaBeaume
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and associated method of forming an electro...
- Patent number 9,551,930
- Issue date Jan 24, 2017
- Rohm and Haas Electronic Materials LLC
- Paul J. LaBeaume
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer comprising repeat units with photoacid-generating functiona...
- Patent number 9,527,936
- Issue date Dec 27, 2016
- Rohm and Haas Electronic Materials LLC
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer comprising repeat units with photoacid-generating functiona...
- Patent number 9,469,705
- Issue date Oct 18, 2016
- Rohm and Haas Electronic Materials LLC
- Vipul Jain
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition and associated method of forming an electro...
- Patent number 9,470,976
- Issue date Oct 18, 2016
- Rohm and Haas Electronic Materials LLC
- Paul J. LaBeaume
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Antireflective hard mask compositions
- Patent number 8,373,241
- Issue date Feb 12, 2013
- Rohm and Haas Electronic Materials LLC
- Dana A. Gronbeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective hard mask compositions
- Patent number 7,605,439
- Issue date Oct 20, 2009
- Rohm and Haas Electronic Materials LLC
- Dana A. Gronbeck
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR PREPARING THICK FILM PHOTOREST, THICK FILM PHOTORES...
- Publication number 20200209743
- Publication date Jul 2, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS
- Publication number 20190204743
- Publication date Jul 4, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Joshua Kaitz
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN TREATMENT METHODS
- Publication number 20170170008
- Publication date Jun 15, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Jong Keun Park
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONA...
- Publication number 20160102158
- Publication date Apr 14, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Paul J. LaBeaume
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRO...
- Publication number 20160103392
- Publication date Apr 14, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Paul J. LaBeaume
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONA...
- Publication number 20160102157
- Publication date Apr 14, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Vipul Jain
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRO...
- Publication number 20160103391
- Publication date Apr 14, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Paul J. LaBeaume
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTIREFLECTIVE HARD MASK COMPOSITIONS
- Publication number 20100297539
- Publication date Nov 25, 2010
- Rohm and Haas Electronic Materials, L.L.C.
- Dana A. Gronbeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective hard mask compositions
- Publication number 20070057253
- Publication date Mar 15, 2007
- Rohm and Haas Electronic Materials L.L.C.
- Dana A. Gronbeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Amy M. Kwok

Person

Patents Grantslast 30 patents

Photoresist compositions and methods

Pattern treatment methods

Polymer comprising repeat units with photoacid-generating functiona...

Photoresist composition and associated method of forming an electro...

Photoresist composition and associated method of forming an electro...

Polymer comprising repeat units with photoacid-generating functiona...

Polymer comprising repeat units with photoacid-generating functiona...

Photoresist composition and associated method of forming an electro...

Antireflective hard mask compositions

Antireflective hard mask compositions

Patents Applicationslast 30 patents

COMPOSITION FOR PREPARING THICK FILM PHOTOREST, THICK FILM PHOTORES...

PHOTORESIST COMPOSITIONS AND METHODS

PATTERN TREATMENT METHODS

POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONA...

PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRO...

POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONA...

PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRO...

ANTIREFLECTIVE HARD MASK COMPOSITIONS

Antireflective hard mask compositions