An-Ren Zi

Person

Hsinchu City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Photoresist underlayer and method of manufacturing a semiconductor...
- Patent number 12,222,650
- Issue date Feb 11, 2025
- TAIWAN SEMICONDUCTOR MANUFACURING COMPANY, LTD.
- An-Ren Zi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for forming semiconductor structure
- Patent number 12,222,653
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Hui Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal-compound-removing solvent and method in lithography
- Patent number 12,210,286
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV photoresist with low-activation-energy ligands or high-develope...
- Patent number 12,210,283
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet photolithography method with developer composition
- Patent number 12,181,798
- Issue date Dec 31, 2024
- TAIWAIN SEMICONDUCTOR MANUFACTURING CO., LTD.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,174,540
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Humidity control or aqueous treatment for EUV metallic resist
- Patent number 12,106,961
- Issue date Oct 1, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist developer and method of developing photoresist
- Patent number 12,074,025
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Hui Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist with polar-acid-labile-group
- Patent number 12,050,404
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive material and method of lithography
- Patent number 12,019,375
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,009,210
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist developer and method of developing photoresist
- Patent number 11,971,657
- Issue date Apr 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor devices and pattern formation...
- Patent number 11,942,322
- Issue date Mar 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 11,934,101
- Issue date Mar 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet photolithography method with developer composition
- Patent number 11,822,238
- Issue date Nov 21, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist with polar-acid-labile-group
- Patent number 11,822,251
- Issue date Nov 21, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Underlayer material for photoresist
- Patent number 11,796,918
- Issue date Oct 24, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus of patterning a semiconductor device
- Patent number 11,762,296
- Issue date Sep 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist developer and method of developing photoresist
- Patent number 11,694,896
- Issue date Jul 4, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ming-Hui Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV photoresist with low-activation-energy ligands or high-develope...
- Patent number 11,681,221
- Issue date Jun 20, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal-compound-removing solvent and method in lithography
- Patent number 11,681,226
- Issue date Jun 20, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 11,626,285
- Issue date Apr 11, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protective composition and method of forming photoresist pattern
- Patent number 11,605,538
- Issue date Mar 14, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming semiconductor structure by patterning resist lay...
- Patent number 11,495,460
- Issue date Nov 8, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus of patterning a semiconductor device
- Patent number 11,460,776
- Issue date Oct 4, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning solution and method of cleaning wafer
- Patent number 11,456,170
- Issue date Sep 27, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Humidity control in EUV lithography
- Patent number 11,307,504
- Issue date Apr 19, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist developer and method of developing photoresist
- Patent number 11,300,878
- Issue date Apr 12, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 11,287,740
- Issue date Mar 29, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Underlayer material for photoresist
- Patent number 11,269,256
- Issue date Mar 8, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20250068075
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS
- Publication number 20240419069
- Publication date Dec 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION
- Publication number 20240377731
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV METALLIC RESIST PERFORMANCE ENHANCEMENT VIA ADDITIVES
- Publication number 20240377735
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST DEVELOPER AND METHOD OF DEVELOPING PHOTORESIST
- Publication number 20240371638
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Hui WENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADDITIVE FOR LITHOGRAPHY
- Publication number 20240345485
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Yu CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOSE REDUCTION BOTTOM ANTI-REFLECTIVE COATING FOR METALLIC PHOTORESIST
- Publication number 20240329535
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Yu KUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING S...
- Publication number 20240297040
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING SOLUTION AND METHOD OF CLEANING WAFER
- Publication number 20240297036
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren Zi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
METHODS AND MATERIALS FOR METALLIC PHOTORESIST
- Publication number 20240288767
- Publication date Aug 29, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST DEVELOPER AND METHOD OF DEVELOPING PHOTORESIST
- Publication number 20240264526
- Publication date Aug 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SWITCHABLE SUBSTRATE FOR EXTREME ULTRAVIOLET OR E-BEAM METALLIC RESIST
- Publication number 20240210822
- Publication date Jun 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADDITIVES FOR METALLIC PHOTORESIST
- Publication number 20240201587
- Publication date Jun 20, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20240168374
- Publication date May 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION
- Publication number 20240045327
- Publication date Feb 8, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST UNDERLAYER AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
- Publication number 20230393474
- Publication date Dec 7, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20230384679
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST WITH POLAR-ACID-LABILE-GROUP
- Publication number 20230384683
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD FOR MANUFACTURING A SEMICONDUCTO...
- Publication number 20230384668
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND PATTERN FORMATION...
- Publication number 20230386840
- Publication date Nov 30, 2023
- TAIWAN SEMICONDUCTOR MANUFACTRING COMPANY, LTD.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20230384670
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Metallic Resist Performance Enhancement Via Additives
- Publication number 20230375924
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION WITH NOVEL SOLVENT
- Publication number 20230341773
- Publication date Oct 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20230333477
- Publication date Oct 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Yu CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal-Compound-Removing Solvent And Method In Lithography
- Publication number 20230324806
- Publication date Oct 12, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Euv Photoresist With Low-Activation-Energy Ligands Or High-Develope...
- Publication number 20230305396
- Publication date Sep 28, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST, METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND MET...
- Publication number 20230288807
- Publication date Sep 14, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTIVE COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20230268178
- Publication date Aug 24, 2023
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY,N LTD.
- An-Ren ZI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20230245889
- Publication date Aug 3, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HUMIDITY CONTROL OR AQUEOUS TREATMENT FOR EUV METALLIC RESIST
- Publication number 20230012705
- Publication date Jan 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren ZI
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Photoresist underlayer and method of manufacturing a semiconductor...

Method for forming semiconductor structure

Metal-compound-removing solvent and method in lithography

EUV photoresist with low-activation-energy ligands or high-develope...

Extreme ultraviolet photolithography method with developer composition

Method of manufacturing a semiconductor device

Humidity control or aqueous treatment for EUV metallic resist

Photoresist developer and method of developing photoresist

Photoresist with polar-acid-labile-group

Photosensitive material and method of lithography

Method of manufacturing a semiconductor device

Photoresist developer and method of developing photoresist

Method of manufacturing semiconductor devices and pattern formation...

Photoresist composition and method of forming photoresist pattern

Extreme ultraviolet photolithography method with developer composition

Photoresist with polar-acid-labile-group

Underlayer material for photoresist

Method and apparatus of patterning a semiconductor device

Photoresist developer and method of developing photoresist

EUV photoresist with low-activation-energy ligands or high-develope...

Metal-compound-removing solvent and method in lithography

Method of manufacturing a semiconductor device

Protective composition and method of forming photoresist pattern

Method for forming semiconductor structure by patterning resist lay...

Method and apparatus of patterning a semiconductor device

Cleaning solution and method of cleaning wafer

Humidity control in EUV lithography

Photoresist developer and method of developing photoresist

Photoresist composition and method of forming photoresist pattern

Underlayer material for photoresist

Patents Applicationslast 30 patents

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS

EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION

EUV METALLIC RESIST PERFORMANCE ENHANCEMENT VIA ADDITIVES

PHOTORESIST DEVELOPER AND METHOD OF DEVELOPING PHOTORESIST

ADDITIVE FOR LITHOGRAPHY

DOSE REDUCTION BOTTOM ANTI-REFLECTIVE COATING FOR METALLIC PHOTORESIST

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING S...

CLEANING SOLUTION AND METHOD OF CLEANING WAFER

METHODS AND MATERIALS FOR METALLIC PHOTORESIST

PHOTORESIST DEVELOPER AND METHOD OF DEVELOPING PHOTORESIST

SWITCHABLE SUBSTRATE FOR EXTREME ULTRAVIOLET OR E-BEAM METALLIC RESIST

ADDITIVES FOR METALLIC PHOTORESIST

PHOTORESIST COMPOSITION

EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION

PHOTORESIST UNDERLAYER AND METHOD OF MANUFACTURING A SEMICONDUCTOR...

PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN

PHOTORESIST WITH POLAR-ACID-LABILE-GROUP

PHOTORESIST COMPOSITION AND METHOD FOR MANUFACTURING A SEMICONDUCTO...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND PATTERN FORMATION...

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

EUV Metallic Resist Performance Enhancement Via Additives

PHOTORESIST COMPOSITION WITH NOVEL SOLVENT

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

Metal-Compound-Removing Solvent And Method In Lithography

Euv Photoresist With Low-Activation-Energy Ligands Or High-Develope...

PHOTORESIST, METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND MET...

PROTECTIVE COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

HUMIDITY CONTROL OR AQUEOUS TREATMENT FOR EUV METALLIC RESIST