Anagnostis Tsiatmas

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus to determine a patterning process parameter us...
- Patent number 12,142,535
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology method and apparatus, computer program and lithographic s...
- Patent number 12,124,174
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Paul Jonathan Turner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,947,269
- Issue date Apr 2, 2024
- ASML Netherlands B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,784,098
- Issue date Oct 10, 2023
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,728,224
- Issue date Aug 15, 2023
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,710,668
- Issue date Jul 25, 2023
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of determining information about a patterning process, metho...
- Patent number 11,604,419
- Issue date Mar 14, 2023
- ASML Netherlands B.V.
- Joannes Jitse Venselaar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,143,972
- Issue date Oct 12, 2021
- ASML Netherlands B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,145,557
- Issue date Oct 12, 2021
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,101,185
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,101,184
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for measuring a parameter of a lithographic pr...
- Patent number 11,092,900
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G01 - MEASURING TESTING
Information Patent Grant
Method of determining information about a patterning process, metho...
- Patent number 11,022,897
- Issue date Jun 1, 2021
- ASML Netherlands B.V.
- Joannes Jitse Venselaar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for measuring a parameter of interest using im...
- Patent number 10,983,445
- Issue date Apr 20, 2021
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Substrate, metrology apparatus and associated methods for a lithogr...
- Patent number 10,871,367
- Issue date Dec 22, 2020
- ASML Netherlands B.V.
- Alok Verma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 10,811,323
- Issue date Oct 20, 2020
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of determining a value of a parameter of interest, method of...
- Patent number 10,795,269
- Issue date Oct 6, 2020
- ASML Netherlands B.V.
- Zili Zhou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 10,782,617
- Issue date Sep 22, 2020
- ASML Netherlands B.V.
- Anagnostis Tsiatmas
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring a parameter of a device manufacturing process,...
- Patent number 10,747,122
- Issue date Aug 18, 2020
- ASML Netherlands B.V.
- Anagnostis Tsiatmas
- G01 - MEASURING TESTING
Information Patent Grant
Substrate, metrology apparatus and associated methods for a lithogr...
- Patent number 10,677,589
- Issue date Jun 9, 2020
- ASML Netherlands B.V.
- Alok Verma
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter, a...
- Patent number 10,615,084
- Issue date Apr 7, 2020
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- G01 - MEASURING TESTING
Information Patent Grant
Method of determining a value of a parameter of interest of a targe...
- Patent number 10,585,048
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Samee Ur Rehman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of optimizing a metrology process
- Patent number 10,585,354
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Anagnostis Tsiatmas
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining an optimal focus height for a metrology appar...
- Patent number 10,571,363
- Issue date Feb 25, 2020
- ASML Netherlands B.V.
- Mariya Vyacheslavivna Medvedyeva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 10,546,790
- Issue date Jan 28, 2020
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beat patterns for alignment on small metrology targets
- Patent number 10,488,768
- Issue date Nov 26, 2019
- ASML Netherlands B.V.
- Bastiaan Onne Fagginger Auer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for measuring a parameter of a lithographic pr...
- Patent number 10,481,503
- Issue date Nov 19, 2019
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter us...
- Patent number 10,453,758
- Issue date Oct 22, 2019
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20240361702
- Publication date Oct 31, 2024
- ASML NETHERLANDS B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20240014078
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY METHOD AND APPARATUS, COMPUTER PROGRAM AND LITHOGRAPHIC S...
- Publication number 20220155694
- Publication date May 19, 2022
- ASML NETHERLANDS B.V.
- Paul Jonathan TURNER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR METROLOGY OPTIMIZATION
- Publication number 20220082944
- Publication date Mar 17, 2022
- ASML NETHERLANDS B.V.
- Samee Ur REHMAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20220066330
- Publication date Mar 3, 2022
- ASML NETHERLANDS B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20210384086
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20210335678
- Publication date Oct 28, 2021
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DETERMINING INFORMATION ABOUT A PATTERNING PROCESS, METHO...
- Publication number 20210255552
- Publication date Aug 19, 2021
- ASML NETHERLANDS B.V.
- Joannes Jitse VENSELAAR
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20210035871
- Publication date Feb 4, 2021
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE, METROLOGY APPARATUS AND ASSOCIATED METHODS FOR A LITHOGR...
- Publication number 20200284578
- Publication date Sep 10, 2020
- ASML NETHERLANDS B.V.
- Alok Verma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20200185281
- Publication date Jun 11, 2020
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20200126872
- Publication date Apr 23, 2020
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Measuring a Parameter of a Lithographic Pr...
- Publication number 20200073254
- Publication date Mar 5, 2020
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF MEASURING A PARAMETER OF A DEVICE MANUFACTURING PROCESS,...
- Publication number 20190354024
- Publication date Nov 21, 2019
- ASML NETHERLANDS B.V.
- Anagnostis TSIATMAS
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF DETERMINING A VALUE OF A PARAMETER OF INTEREST OF A TARGE...
- Publication number 20190323972
- Publication date Oct 24, 2019
- ASML NETHERLANDS B.V.
- Samee Ur REHMAN
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR MEASURING A PARAMETER OF INTEREST USING IM...
- Publication number 20190250094
- Publication date Aug 15, 2019
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING AN OPTIMAL FOCUS HEIGHT FOR A METROLOGY APPAR...
- Publication number 20190242782
- Publication date Aug 8, 2019
- ASML NETHERLANDS B.V.
- Mariya Vyacheslavivna MEDVEDYEVA
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF OPTIMIZING A METROLOGY PROCESS
- Publication number 20190243253
- Publication date Aug 8, 2019
- ASML NETHERLANDS B.V.
- Anagnostis TSIATMAS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING INFORMATION ABOUT A PATTERNING PROCESS, METHO...
- Publication number 20190171115
- Publication date Jun 6, 2019
- ASML NETHERLANDS B.V.
- Joannes Jitse VENSELAAR
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20190155173
- Publication date May 23, 2019
- ASML NETHERLANDS B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method Of Determining A Value Of A Parameter Of Interest, Method Of...
- Publication number 20190129316
- Publication date May 2, 2019
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BEAT PATTERNS FOR ALIGNMENT ON SMALL METROLOGY TARGETS
- Publication number 20190072860
- Publication date Mar 7, 2019
- ASML NETHERLANDS B.V.
- Bastiaan Onne FAGGINGER AUER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE, METROLOGY APPARATUS AND ASSOCIATED METHODS FOR A LITHOGR...
- Publication number 20190063911
- Publication date Feb 28, 2019
- ASML NETHERLANDS B.V.
- Alok Verma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20190049859
- Publication date Feb 14, 2019
- ASML NETHERLANDS B.V.
- Anagnostis TSIATMAS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20170255738
- Publication date Sep 7, 2017
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20170255736
- Publication date Sep 7, 2017
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20170256465
- Publication date Sep 7, 2017
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20170255737
- Publication date Sep 7, 2017
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20170255112
- Publication date Sep 7, 2017
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G01 - MEASURING TESTING
Information Patent Application
Method And Apparatus for Measuring a Parameter of a Lithographic Pr...
- Publication number 20170059999
- Publication date Mar 2, 2017
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G01 - MEASURING TESTING

Anagnostis Tsiatmas

Person

Patents Grantslast 30 patents

Method and apparatus to determine a patterning process parameter us...

Metrology method and apparatus, computer program and lithographic s...

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Method of determining information about a patterning process, metho...

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Method and apparatus for measuring a parameter of a lithographic pr...

Method of determining information about a patterning process, metho...

Method and apparatus for measuring a parameter of interest using im...

Substrate, metrology apparatus and associated methods for a lithogr...

Method and apparatus to determine a patterning process parameter

Method of determining a value of a parameter of interest, method of...

Method and apparatus to determine a patterning process parameter

Method of measuring a parameter of a device manufacturing process,...

Substrate, metrology apparatus and associated methods for a lithogr...

Method and apparatus to determine a patterning process parameter, a...

Method of determining a value of a parameter of interest of a targe...

Method of optimizing a metrology process

Method of determining an optimal focus height for a metrology appar...

Method and apparatus to determine a patterning process parameter

Beat patterns for alignment on small metrology targets

Method and apparatus for measuring a parameter of a lithographic pr...

Method and apparatus to determine a patterning process parameter us...

Patents Applicationslast 30 patents

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METROLOGY METHOD AND APPARATUS, COMPUTER PROGRAM AND LITHOGRAPHIC S...

METHOD FOR METROLOGY OPTIMIZATION

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD OF DETERMINING INFORMATION ABOUT A PATTERNING PROCESS, METHO...

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

SUBSTRATE, METROLOGY APPARATUS AND ASSOCIATED METHODS FOR A LITHOGR...

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

Method and Apparatus for Measuring a Parameter of a Lithographic Pr...

METHOD OF MEASURING A PARAMETER OF A DEVICE MANUFACTURING PROCESS,...

METHOD OF DETERMINING A VALUE OF A PARAMETER OF INTEREST OF A TARGE...

METHOD AND APPARATUS FOR MEASURING A PARAMETER OF INTEREST USING IM...

METHOD OF DETERMINING AN OPTIMAL FOCUS HEIGHT FOR A METROLOGY APPAR...

METHOD OF OPTIMIZING A METROLOGY PROCESS

METHOD OF DETERMINING INFORMATION ABOUT A PATTERNING PROCESS, METHO...

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

Method Of Determining A Value Of A Parameter Of Interest, Method Of...

BEAT PATTERNS FOR ALIGNMENT ON SMALL METROLOGY TARGETS

SUBSTRATE, METROLOGY APPARATUS AND ASSOCIATED METHODS FOR A LITHOGR...

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

Method And Apparatus for Measuring a Parameter of a Lithographic Pr...